FR2389157A1 - IMPROVEMENT OF RADIATION-SENSITIVE COPYING MATERIALS - Google Patents

IMPROVEMENT OF RADIATION-SENSITIVE COPYING MATERIALS

Info

Publication number
FR2389157A1
FR2389157A1 FR7812010A FR7812010A FR2389157A1 FR 2389157 A1 FR2389157 A1 FR 2389157A1 FR 7812010 A FR7812010 A FR 7812010A FR 7812010 A FR7812010 A FR 7812010A FR 2389157 A1 FR2389157 A1 FR 2389157A1
Authority
FR
France
Prior art keywords
radiation
improvement
sensitive copying
copying materials
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7812010A
Other languages
French (fr)
Other versions
FR2389157B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of FR2389157A1 publication Critical patent/FR2389157A1/en
Application granted granted Critical
Publication of FR2389157B1 publication Critical patent/FR2389157B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Abstract

L'invention est relative à une matière sensible aux rayonnements contenant en tant que composé sensible aux rayonnements une s-triazine de formule :The invention relates to a radiation-sensitive material containing as a radiation-sensitive compound an s-triazine of formula:

FR7812010A 1977-04-25 1978-04-24 IMPROVEMENT OF RADIATION-SENSITIVE COPYING MATERIALS Granted FR2389157A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2718259A DE2718259C2 (en) 1977-04-25 1977-04-25 Radiation-sensitive mixture

Publications (2)

Publication Number Publication Date
FR2389157A1 true FR2389157A1 (en) 1978-11-24
FR2389157B1 FR2389157B1 (en) 1980-10-31

Family

ID=6007163

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7812010A Granted FR2389157A1 (en) 1977-04-25 1978-04-24 IMPROVEMENT OF RADIATION-SENSITIVE COPYING MATERIALS

Country Status (16)

Country Link
JP (1) JPS53133428A (en)
AU (1) AU514951B2 (en)
BE (1) BE866306A (en)
BR (1) BR7802525A (en)
CA (1) CA1103508A (en)
CH (1) CH634158A5 (en)
DE (1) DE2718259C2 (en)
DK (1) DK176878A (en)
ES (1) ES469089A1 (en)
FR (1) FR2389157A1 (en)
GB (1) GB1602903A (en)
IE (1) IE46622B1 (en)
IT (1) IT1102622B (en)
NL (1) NL185179C (en)
SE (1) SE423286B (en)
ZA (1) ZA782332B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0458325A1 (en) * 1990-05-25 1991-11-27 Mitsubishi Chemical Corporation Negative photosensitive composition and method for forming a resist pattern
EP0519299A1 (en) * 1991-06-19 1992-12-23 Hoechst Aktiengesellschaft Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith

Families Citing this family (146)

* Cited by examiner, † Cited by third party
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JPS55126235A (en) * 1979-03-22 1980-09-29 Fuji Photo Film Co Ltd Photosensitive composition
US4391687A (en) 1980-02-14 1983-07-05 Minnesota Mining And Manufacturing Company Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-1-triazine
US4329384A (en) * 1980-02-14 1982-05-11 Minnesota Mining And Manufacturing Company Pressure-sensitive adhesive tape produced from photoactive mixture of acrylic monomers and polynuclear-chromophore-substituted halomethyl-2-triazine
US4330590A (en) 1980-02-14 1982-05-18 Minnesota Mining And Manufacturing Company Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine
DE3144480A1 (en) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
JPS58190946A (en) * 1982-04-30 1983-11-08 Sharp Corp Photoresist
DE3337024A1 (en) * 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE COMPOUNDS HAVING TRICHLORMETHYL GROUPS, METHOD FOR THE PRODUCTION THEREOF AND LIGHT SENSITIVE MIXTURE CONTAINING THESE COMPOUNDS
JPS61275747A (en) * 1985-05-30 1986-12-05 Nec Corp Negative type resist material
JPH0766186B2 (en) * 1985-07-02 1995-07-19 富士写真フイルム株式会社 Photosensitive composition
DE3606155A1 (en) * 1986-02-26 1987-08-27 Basf Ag PHOTOPOLYMERIZABLE MIXTURE, THIS CONTAINING LIGHT-SENSITIVE RECORDING ELEMENT, AND METHOD FOR PRODUCING A FLAT PRINT MOLD BY THIS LIGHT-SENSITIVE RECORDING ELEMENT
US4837128A (en) * 1986-08-08 1989-06-06 Fuji Photo Film Co., Ltd. Light-sensitive composition
JPS6358440A (en) * 1986-08-29 1988-03-14 Fuji Photo Film Co Ltd Photosensitive composition
JPS6442645A (en) * 1987-08-11 1989-02-14 Tomoegawa Paper Co Ltd Optical coloring composition
DE3821585A1 (en) * 1987-09-13 1989-03-23 Hoechst Ag POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL FOR HIGH-ENERGY RADIATION
US4934791A (en) * 1987-12-09 1990-06-19 Matsushita Electric Industrial Co., Ltd. Color filter
DE3742275A1 (en) * 1987-12-12 1989-06-22 Hoechst Ag METHOD FOR TREATING DEVELOPED RELIEF PRESSURE FORMS FOR FLEXODRUCK
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DE3912652A1 (en) * 1989-04-18 1990-10-25 Hoechst Ag LIGHT-SENSITIVE BIS-TRICHLORMETHYL-S-TRIAZINE, METHOD FOR THE PRODUCTION THEREOF, AND LIGHT-SENSITIVE MIXTURE CONTAINING THESE COMPOUNDS
JP2538118B2 (en) * 1990-09-28 1996-09-25 東京応化工業株式会社 Negative radiation-sensitive resist composition
TW207009B (en) * 1991-01-31 1993-06-01 Sumitomo Chemical Co
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DE4444669A1 (en) 1994-12-15 1996-06-20 Hoechst Ag Radiation sensitive mixture
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Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1298414B (en) * 1967-11-09 1969-06-26 Kalle Ag Photosensitive mixture

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0458325A1 (en) * 1990-05-25 1991-11-27 Mitsubishi Chemical Corporation Negative photosensitive composition and method for forming a resist pattern
EP0519299A1 (en) * 1991-06-19 1992-12-23 Hoechst Aktiengesellschaft Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith

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DE2718259A1 (en) 1978-11-02
SE7804588L (en) 1978-10-26
AU514951B2 (en) 1981-03-05
BE866306A (en) 1978-10-24
DE2718259C2 (en) 1982-11-25
CH634158A5 (en) 1983-01-14
NL185179C (en) 1990-02-01
IT1102622B (en) 1985-10-07
JPS6244258B2 (en) 1987-09-18
NL185179B (en) 1989-09-01
DK176878A (en) 1978-10-26
IE46622B1 (en) 1983-08-10
CA1103508A (en) 1981-06-23
GB1602903A (en) 1981-11-18
ZA782332B (en) 1979-04-25
BR7802525A (en) 1978-12-05
NL7804304A (en) 1978-10-27
AU3535578A (en) 1979-10-25
FR2389157B1 (en) 1980-10-31
SE423286B (en) 1982-04-26
IE780788L (en) 1978-10-25
JPS53133428A (en) 1978-11-21
IT7849012A0 (en) 1978-04-21
ES469089A1 (en) 1979-09-16

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