JPH11510560A5 - - Google Patents

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Publication number
JPH11510560A5
JPH11510560A5 JP1997501952A JP50195297A JPH11510560A5 JP H11510560 A5 JPH11510560 A5 JP H11510560A5 JP 1997501952 A JP1997501952 A JP 1997501952A JP 50195297 A JP50195297 A JP 50195297A JP H11510560 A5 JPH11510560 A5 JP H11510560A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1997501952A
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English (en)
Japanese (ja)
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JP4219401B2 (ja
Publication date
Priority claimed from US08/481,801 external-priority patent/US5798137A/en
Application filed filed Critical
Priority claimed from PCT/US1996/009690 external-priority patent/WO1996041036A2/en
Publication of JPH11510560A5 publication Critical patent/JPH11510560A5/ja
Application granted granted Critical
Publication of JP4219401B2 publication Critical patent/JP4219401B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP50195297A 1995-06-07 1996-06-07 流動床反応炉におけるシリコン沈積方法及び装置 Expired - Fee Related JP4219401B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/481,801 US5798137A (en) 1995-06-07 1995-06-07 Method for silicon deposition
US08/487,008 US5810934A (en) 1995-06-07 1995-06-07 Silicon deposition reactor apparatus
PCT/US1996/009690 WO1996041036A2 (en) 1995-06-07 1996-06-07 Method and apparatus for silicon deposition in a fluidized-bed reactor

Publications (2)

Publication Number Publication Date
JPH11510560A5 true JPH11510560A5 (enExample) 2004-07-08
JP4219401B2 JP4219401B2 (ja) 2009-02-04

Family

ID=23913451

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50195297A Expired - Fee Related JP4219401B2 (ja) 1995-06-07 1996-06-07 流動床反応炉におけるシリコン沈積方法及び装置

Country Status (3)

Country Link
US (2) US5810934A (enExample)
JP (1) JP4219401B2 (enExample)
KR (1) KR100416629B1 (enExample)

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