JPH11315883A - 除振装置、露光装置およびデバイス製造方法 - Google Patents

除振装置、露光装置およびデバイス製造方法

Info

Publication number
JPH11315883A
JPH11315883A JP10134240A JP13424098A JPH11315883A JP H11315883 A JPH11315883 A JP H11315883A JP 10134240 A JP10134240 A JP 10134240A JP 13424098 A JP13424098 A JP 13424098A JP H11315883 A JPH11315883 A JP H11315883A
Authority
JP
Japan
Prior art keywords
stage
exposure apparatus
air
vibration
reaction force
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10134240A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11315883A5 (enExample
Inventor
Hiromichi Hara
浩通 原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP10134240A priority Critical patent/JPH11315883A/ja
Priority to US09/300,521 priority patent/US6512571B2/en
Publication of JPH11315883A publication Critical patent/JPH11315883A/ja
Priority to US10/263,311 priority patent/US6862077B2/en
Publication of JPH11315883A5 publication Critical patent/JPH11315883A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
JP10134240A 1998-04-30 1998-04-30 除振装置、露光装置およびデバイス製造方法 Pending JPH11315883A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP10134240A JPH11315883A (ja) 1998-04-30 1998-04-30 除振装置、露光装置およびデバイス製造方法
US09/300,521 US6512571B2 (en) 1998-04-30 1999-04-28 Anti-vibration system for exposure apparatus
US10/263,311 US6862077B2 (en) 1998-04-30 2002-10-03 Anti-vibration system for exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10134240A JPH11315883A (ja) 1998-04-30 1998-04-30 除振装置、露光装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JPH11315883A true JPH11315883A (ja) 1999-11-16
JPH11315883A5 JPH11315883A5 (enExample) 2004-11-18

Family

ID=15123692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10134240A Pending JPH11315883A (ja) 1998-04-30 1998-04-30 除振装置、露光装置およびデバイス製造方法

Country Status (2)

Country Link
US (2) US6512571B2 (enExample)
JP (1) JPH11315883A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005085671A1 (ja) * 2004-03-08 2005-09-15 Nikon Corporation 防振装置、露光装置、及び防振方法

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US6885430B2 (en) * 2000-11-16 2005-04-26 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
US6958808B2 (en) * 2000-11-16 2005-10-25 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
JP2002305140A (ja) * 2001-04-06 2002-10-18 Nikon Corp 露光装置及び基板処理システム
US6828890B2 (en) * 2001-09-26 2004-12-07 Engineering Matters, Inc. High intensity radial field magnetic array and actuator
US6784978B2 (en) * 2002-03-12 2004-08-31 Asml Holding N.V. Method, system, and apparatus for management of reaction loads in a lithography system
SG108317A1 (en) * 2002-06-07 2005-01-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1369745B1 (en) 2002-06-07 2013-02-27 ASML Netherlands B.V. Lihographic apparatus and device manufaturing method
US6876284B2 (en) 2002-09-26 2005-04-05 Engineering Matters, Inc. High intensity radial field magnetic array and actuator
US7352268B2 (en) * 2002-09-26 2008-04-01 Engineering Matters, Inc. High intensity radial field magnetic actuator
EP1403713A1 (en) * 2002-09-30 2004-03-31 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
SG126732A1 (en) * 2002-09-30 2006-11-29 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US20040119964A1 (en) * 2002-12-18 2004-06-24 Nikon Corporation Double isolation fine stage
WO2004107416A1 (ja) * 2003-05-27 2004-12-09 Nikon Corporation 露光装置及びデバイスの製造方法
US7248339B2 (en) * 2003-07-04 2007-07-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005227717A (ja) * 2004-02-16 2005-08-25 Fuji Photo Film Co Ltd 画像形成装置の固定構造
JP2005224532A (ja) * 2004-02-16 2005-08-25 Fuji Photo Film Co Ltd 画像形成装置の防振構造
US7256866B2 (en) * 2004-10-12 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1806610B1 (en) * 2004-10-26 2011-12-21 Nikon Corporation Optical system, lens barrel, exposure system, and production method for a device
JP4614386B2 (ja) * 2005-02-04 2011-01-19 キヤノン株式会社 位置決め装置、露光装置およびそれを用いたデバイス製造方法
KR101494115B1 (ko) * 2005-03-29 2015-02-16 가부시키가이샤 니콘 노광 장치, 노광 장치의 제조 방법 및 마이크로 디바이스 제조 방법
US7835011B2 (en) * 2006-01-20 2010-11-16 General Electric Company Systems and methods for determining a position of a support
DE502006008851D1 (de) * 2006-11-08 2011-03-17 Integrated Dynamics Eng Gmbh Kombiniertes Motion-Control-System
US8085119B2 (en) * 2007-11-08 2011-12-27 Engineering Matters Inc. Flexible electromagnetic valve actuator modeling and performance
DE102009013173A1 (de) * 2008-04-17 2009-10-22 Heidelberger Druckmaschinen Ag Verpackungsmaschine für Waren in mit einer Blisterfolie zu verschließende Blisterformschalen
US8387945B2 (en) * 2009-02-10 2013-03-05 Engineering Matters, Inc. Method and system for a magnetic actuator
US8474782B2 (en) * 2010-04-26 2013-07-02 Baker Hughes Incorporated System and method for effective isolation of an interferometer
JP5641878B2 (ja) * 2010-10-29 2014-12-17 キヤノン株式会社 振動制御装置、リソグラフィー装置、および、物品の製造方法
DE102011075316A1 (de) * 2011-05-05 2012-11-08 Carl Zeiss Smt Gmbh Optisches Modul mit einer Messeinrichtung
US9435642B2 (en) * 2012-04-20 2016-09-06 Canon Kabushiki Kaisha Position measuring apparatus, pattern transfer apparatus, and method for manufacturing a device
JP6218459B2 (ja) * 2013-07-02 2017-10-25 キヤノン株式会社 除振装置、除振方法、リソグラフィ装置及びデバイスの製造方法
US10948043B2 (en) * 2018-10-02 2021-03-16 Hiroshi Kurabayashi Damping device for structure
JP7444257B2 (ja) * 2020-07-02 2024-03-06 株式会社島津製作所 欠陥検査装置

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JPH01188241A (ja) 1988-01-22 1989-07-27 Canon Inc 移動案内装置
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JP2673321B2 (ja) 1989-07-24 1997-11-05 特許機器株式会社 除振台の水平位置の維持と水平振動の除振方法並びにその回路
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JP2974535B2 (ja) 1993-03-11 1999-11-10 キヤノン株式会社 位置決め装置
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JPH0835537A (ja) 1994-07-26 1996-02-06 Kawai Musical Instr Mfg Co Ltd 電子制御振動インシュレータ
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JP3337906B2 (ja) * 1996-04-02 2002-10-28 キヤノン株式会社 空圧式振動絶縁除去装置、投影露光装置及びこれを用いたデバイス製造方法
KR980006398A (ko) * 1996-06-21 1998-03-30 마에다 시게루 진동 감쇄장치
JPH1089403A (ja) * 1996-09-10 1998-04-07 Nikon Corp 防振装置
US6170622B1 (en) * 1997-03-07 2001-01-09 Canon Kabushiki Kaisha Anti-vibration apparatus and anti-vibration method thereof
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005085671A1 (ja) * 2004-03-08 2005-09-15 Nikon Corporation 防振装置、露光装置、及び防振方法

Also Published As

Publication number Publication date
US6512571B2 (en) 2003-01-28
US20030030779A1 (en) 2003-02-13
US6862077B2 (en) 2005-03-01
US20020012108A1 (en) 2002-01-31

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