JPH10214783A5 - - Google Patents

Info

Publication number
JPH10214783A5
JPH10214783A5 JP1997343740A JP34374097A JPH10214783A5 JP H10214783 A5 JPH10214783 A5 JP H10214783A5 JP 1997343740 A JP1997343740 A JP 1997343740A JP 34374097 A JP34374097 A JP 34374097A JP H10214783 A5 JPH10214783 A5 JP H10214783A5
Authority
JP
Japan
Prior art keywords
stage
substrate
projection
sensitive substrate
positional relationship
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997343740A
Other languages
English (en)
Japanese (ja)
Other versions
JP4029183B2 (ja
JPH10214783A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP34374097A priority Critical patent/JP4029183B2/ja
Priority claimed from JP34374097A external-priority patent/JP4029183B2/ja
Publication of JPH10214783A publication Critical patent/JPH10214783A/ja
Publication of JPH10214783A5 publication Critical patent/JPH10214783A5/ja
Application granted granted Critical
Publication of JP4029183B2 publication Critical patent/JP4029183B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP34374097A 1996-11-28 1997-11-28 投影露光装置及び投影露光方法 Expired - Lifetime JP4029183B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34374097A JP4029183B2 (ja) 1996-11-28 1997-11-28 投影露光装置及び投影露光方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8-332843 1996-11-28
JP33284396 1996-11-28
JP34374097A JP4029183B2 (ja) 1996-11-28 1997-11-28 投影露光装置及び投影露光方法

Publications (3)

Publication Number Publication Date
JPH10214783A JPH10214783A (ja) 1998-08-11
JPH10214783A5 true JPH10214783A5 (cg-RX-API-DMAC7.html) 2005-08-11
JP4029183B2 JP4029183B2 (ja) 2008-01-09

Family

ID=26574314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34374097A Expired - Lifetime JP4029183B2 (ja) 1996-11-28 1997-11-28 投影露光装置及び投影露光方法

Country Status (1)

Country Link
JP (1) JP4029183B2 (cg-RX-API-DMAC7.html)

Families Citing this family (202)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6897963B1 (en) * 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
JP4134406B2 (ja) 1998-12-04 2008-08-20 株式会社ニコン 平面モータ装置及び露光装置
WO2001023933A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
WO2001023935A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
JP2001160530A (ja) 1999-12-01 2001-06-12 Nikon Corp ステージ装置及び露光装置
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
JP2002287023A (ja) 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
US6788385B2 (en) * 2001-06-21 2004-09-07 Nikon Corporation Stage device, exposure apparatus and method
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG157962A1 (en) 2002-12-10 2010-01-29 Nikon Corp Exposure apparatus and method for producing device
CN1717776A (zh) 2002-12-10 2006-01-04 株式会社尼康 光学元件及使用该光学元件的投影曝光装置
EP1571694A4 (en) * 2002-12-10 2008-10-15 Nikon Corp EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING THE DEVICE
JP4525062B2 (ja) * 2002-12-10 2010-08-18 株式会社ニコン 露光装置及びデバイス製造方法、露光システム
EP2945016B1 (en) 2003-02-26 2017-09-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
WO2004090952A1 (ja) 2003-04-09 2004-10-21 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
JP4775256B2 (ja) 2003-04-10 2011-09-21 株式会社ニコン 液浸リソグラフィ装置用の減圧排出を含む環境システム
KR101497289B1 (ko) 2003-04-10 2015-02-27 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
SG139734A1 (en) 2003-04-11 2008-02-29 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
EP2161621B1 (en) 2003-04-11 2018-10-24 Nikon Corporation Cleanup method for optics in an immersion lithography apparatus, and corresponding immersion lithography apparatus
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
EP2722703A3 (en) 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, and exposure apparatus and exposure method
TWI616932B (zh) 2003-05-23 2018-03-01 Nikon Corp Exposure device and component manufacturing method
TWI614794B (zh) 2003-05-23 2018-02-11 Nikon Corp 曝光方法及曝光裝置以及元件製造方法
KR20150036794A (ko) 2003-05-28 2015-04-07 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
KR101528089B1 (ko) 2003-06-13 2015-06-11 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
KR101265454B1 (ko) 2003-06-19 2013-05-16 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
EP2264532B1 (en) 2003-07-09 2012-10-31 Nikon Corporation Exposure apparatus and device manufacturing method
EP1646074A4 (en) 2003-07-09 2007-10-03 Nikon Corp EXPOSURE DEVICE AND METHOD OF MANUFACTURE
WO2005010962A1 (ja) 2003-07-28 2005-02-03 Nikon Corporation 露光装置及びデバイス製造方法、並びに露光装置の制御方法
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
KR20180120816A (ko) 2003-08-21 2018-11-06 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
SG133589A1 (en) 2003-08-26 2007-07-30 Nikon Corp Optical element and exposure device
EP1670039B1 (en) 2003-08-29 2014-06-04 Nikon Corporation Exposure apparatus and device producing method
US6954256B2 (en) 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
WO2005022615A1 (ja) 2003-08-29 2005-03-10 Nikon Corporation 液体回収装置、露光装置、露光方法及びデバイス製造方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
KR101248325B1 (ko) 2003-09-26 2013-03-27 가부시키가이샤 니콘 투영노광장치 및 투영노광장치의 세정방법, 메인터넌스방법 그리고 디바이스의 제조방법
KR101335736B1 (ko) 2003-09-29 2013-12-02 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
KR101319108B1 (ko) 2003-09-29 2013-10-17 가부시키가이샤 니콘 투영 노광 장치, 투영 노광 방법 및 디바이스 제조 방법
TW200514138A (en) 2003-10-09 2005-04-16 Nippon Kogaku Kk Exposure equipment and exposure method, manufacture method of component
EP1677341B1 (en) 2003-10-22 2010-12-01 Nikon Corporation Exposure apparatus, exposure method, and method for manufacturing device
TWI474132B (zh) 2003-10-28 2015-02-21 尼康股份有限公司 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法
KR101121260B1 (ko) 2003-10-28 2012-03-23 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스의 제조 방법
CN100461336C (zh) 2003-10-31 2009-02-11 株式会社尼康 曝光装置以及器件制造方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
CN102163004B (zh) 2003-12-03 2014-04-09 株式会社尼康 曝光装置、曝光方法和器件制造方法
JP4720506B2 (ja) 2003-12-15 2011-07-13 株式会社ニコン ステージ装置、露光装置、及び露光方法
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
KR20180117228A (ko) 2004-01-05 2018-10-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JP5420821B2 (ja) 2004-01-14 2014-02-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射屈折投影対物レンズ
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
JP4710611B2 (ja) 2004-01-15 2011-06-29 株式会社ニコン 露光装置及びデバイスの製造方法並びに露光方法
WO2005071491A2 (en) 2004-01-20 2005-08-04 Carl Zeiss Smt Ag Exposure apparatus and measuring device for a projection lens
WO2005071717A1 (ja) 2004-01-26 2005-08-04 Nikon Corporation 露光装置及びデバイス製造方法
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
US7990516B2 (en) 2004-02-03 2011-08-02 Nikon Corporation Immersion exposure apparatus and device manufacturing method with liquid detection apparatus
KR20190011830A (ko) 2004-02-04 2019-02-07 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
EP1724815B1 (en) 2004-02-10 2012-06-13 Nikon Corporation Aligner, device manufacturing method, maintenance method and aligning method
KR101106497B1 (ko) 2004-02-20 2012-01-20 가부시키가이샤 니콘 노광 장치, 공급 방법 및 회수 방법, 노광 방법, 및디바이스 제조 방법
DE102004013886A1 (de) 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
JP4525676B2 (ja) 2004-03-25 2010-08-18 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US20070247640A1 (en) * 2004-03-30 2007-10-25 Nikon Corporation Exposure Apparatus, Exposure Method and Device Manufacturing Method, and Surface Shape Detection Unit
US7034917B2 (en) 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
US8488099B2 (en) 2004-04-19 2013-07-16 Nikon Corporation Exposure apparatus and device manufacturing method
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7486381B2 (en) 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005119368A2 (en) 2004-06-04 2005-12-15 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
CN102290365B (zh) 2004-06-09 2015-01-21 尼康股份有限公司 基板保持装置、具备其之曝光装置及方法、元件制造方法
EP2966670B1 (en) 2004-06-09 2017-02-22 Nikon Corporation Exposure apparatus and device manufacturing method
KR101310472B1 (ko) 2004-06-10 2013-09-24 가부시키가이샤 니콘 엔지니어링 노광 장치, 노광 방법 및 디바이스 제조 방법
US8373843B2 (en) 2004-06-10 2013-02-12 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8717533B2 (en) 2004-06-10 2014-05-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP3067750B1 (en) 2004-06-10 2019-01-30 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8508713B2 (en) 2004-06-10 2013-08-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR101228244B1 (ko) 2004-06-21 2013-01-31 가부시키가이샤 니콘 노광 장치 및 그 부재의 세정 방법, 노광 장치의메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조방법
US8698998B2 (en) 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
JP5119666B2 (ja) 2004-06-21 2013-01-16 株式会社ニコン 露光装置、液体除去方法、及びデバイス製造方法
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE602005016429D1 (de) 2004-07-12 2009-10-15 Nippon Kogaku Kk Hren
KR101202231B1 (ko) 2004-07-21 2012-11-16 가부시키가이샤 니콘 노광 방법 및 디바이스 제조 방법
DE602005021653D1 (de) 2004-08-03 2010-07-15 Nippon Kogaku Kk Belichtungsgeräte, belichtungsverfahren und bauelemente-herstellungsverfahren
US20070252970A1 (en) 2004-09-01 2007-11-01 Nikon Corporation Substrate Holder, Stage Apparatus, and Exposure Apparatus
WO2006030684A1 (ja) 2004-09-13 2006-03-23 Nikon Corporation 投影光学系、投影光学系の製造方法、露光装置及び露光方法
SG155927A1 (en) 2004-09-17 2009-10-29 Nikon Corp Substrate holding device, exposure apparatus, and device manufacturing method
TWI506674B (zh) 2004-09-17 2015-11-01 尼康股份有限公司 Exposure apparatus, exposure method, and device manufacturing method
WO2006038563A1 (ja) 2004-10-01 2006-04-13 Nikon Corporation リニアモータ、ステージ装置、及び露光装置
KR101364347B1 (ko) 2004-10-15 2014-02-18 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
CN101866113B (zh) 2004-10-26 2013-04-24 株式会社尼康 衬底处理方法、曝光装置及器件制造方法
TWI416265B (zh) 2004-11-01 2013-11-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
EP1816671A4 (en) 2004-11-11 2010-01-13 Nikon Corp EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND SUBSTRATE
KR101220613B1 (ko) 2004-12-01 2013-01-18 가부시키가이샤 니콘 스테이지 장치 및 노광 장치
US7804576B2 (en) 2004-12-06 2010-09-28 Nikon Corporation Maintenance method, maintenance device, exposure apparatus, and device manufacturing method
JP4752473B2 (ja) 2004-12-09 2011-08-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
JP5181475B2 (ja) 2004-12-15 2013-04-10 株式会社ニコン 基板保持装置、露光装置、及びデバイス製造方法
US7450217B2 (en) 2005-01-12 2008-11-11 Asml Netherlands B.V. Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
EP1863070B1 (en) 2005-01-31 2016-04-27 Nikon Corporation Exposure apparatus and method for manufacturing device
WO2006101024A1 (ja) 2005-03-18 2006-09-28 Nikon Corporation 露光方法及び露光装置、デバイス製造方法、並びに露光装置の評価方法
TWI424260B (zh) 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
US8339614B2 (en) 2005-03-25 2012-12-25 Nikon Corporation Method of measuring shot shape and mask
EP1865539A4 (en) 2005-03-30 2011-09-07 Nikon Corp METHOD FOR DETERMINING EXPOSURE CONDITIONS, EXPOSURE METHOD, EXPOSURE DEVICE, AND DEVICE PRODUCTION APPARATUS
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
JP4872916B2 (ja) 2005-04-18 2012-02-08 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
CN100555568C (zh) 2005-04-28 2009-10-28 株式会社尼康 曝光方法及曝光装置、以及元件制造方法
KR101544336B1 (ko) 2005-05-12 2015-08-12 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
KR20080007383A (ko) 2005-05-24 2008-01-18 가부시키가이샤 니콘 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법
US7838858B2 (en) 2005-05-31 2010-11-23 Nikon Corporation Evaluation system and method of a search operation that detects a detection subject on an object
JP5045437B2 (ja) 2005-06-21 2012-10-10 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
US7924416B2 (en) 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
US8693006B2 (en) 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
KR20080026082A (ko) 2005-06-30 2008-03-24 가부시키가이샤 니콘 노광장치 및 방법, 노광장치의 메인터넌스 방법 및디바이스 제조방법
EP1909310A4 (en) 2005-07-11 2010-10-06 Nikon Corp EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
WO2007023813A1 (ja) 2005-08-23 2007-03-01 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
US8780326B2 (en) 2005-09-09 2014-07-15 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8111374B2 (en) 2005-09-09 2012-02-07 Nikon Corporation Analysis method, exposure method, and device manufacturing method
KR20080053497A (ko) 2005-09-21 2008-06-13 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
US8681314B2 (en) 2005-10-24 2014-03-25 Nikon Corporation Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
JPWO2007052659A1 (ja) 2005-11-01 2009-04-30 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
WO2007055199A1 (ja) 2005-11-09 2007-05-18 Nikon Corporation 露光装置及び方法、並びにデバイス製造方法
WO2007055237A1 (ja) 2005-11-09 2007-05-18 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
JPWO2007055373A1 (ja) 2005-11-14 2009-04-30 株式会社ニコン 液体回収部材、露光装置、露光方法、及びデバイス製造方法
TWI479271B (zh) 2005-11-15 2015-04-01 尼康股份有限公司 An exposure apparatus and an exposure method, and an element manufacturing method
JP2007165869A (ja) 2005-11-21 2007-06-28 Nikon Corp 露光方法及びそれを用いたデバイス製造方法、露光装置、並びに基板処理方法及び装置
US7803516B2 (en) 2005-11-21 2010-09-28 Nikon Corporation Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus
US8125610B2 (en) 2005-12-02 2012-02-28 ASML Metherlands B.V. Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
US7782442B2 (en) 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
WO2007066679A1 (ja) 2005-12-06 2007-06-14 Nikon Corporation 露光装置、露光方法、投影光学系及びデバイス製造方法
JP5194799B2 (ja) 2005-12-06 2013-05-08 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
JP2007318069A (ja) * 2005-12-06 2007-12-06 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法、投影光学系
KR101539517B1 (ko) 2005-12-08 2015-07-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US8953148B2 (en) 2005-12-28 2015-02-10 Nikon Corporation Exposure apparatus and making method thereof
WO2007077875A1 (ja) 2005-12-28 2007-07-12 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
US8411271B2 (en) 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
WO2007077925A1 (ja) 2005-12-28 2007-07-12 Nikon Corporation パターン形成方法及びパターン形成装置、並びにデバイス製造方法
TWI574305B (zh) 2006-01-19 2017-03-11 尼康股份有限公司 曝光裝置及曝光方法、以及元件製造方法
WO2007094414A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
WO2007094407A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
US7714982B2 (en) 2006-02-16 2010-05-11 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP1986224A4 (en) 2006-02-16 2012-01-25 Nikon Corp EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
US8134681B2 (en) 2006-02-17 2012-03-13 Nikon Corporation Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
CN101385121B (zh) 2006-02-21 2011-04-20 株式会社尼康 图案形成装置及图案形成方法、移动体驱动系统及移动体驱动方法、曝光装置及曝光方法、以及组件制造方法
WO2007097379A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation パターン形成装置、マーク検出装置、露光装置、パターン形成方法、露光方法及びデバイス製造方法
SG170010A1 (en) 2006-02-21 2011-04-29 Nikon Corp Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure appararus and method, and device manufacturing method
JP5077770B2 (ja) 2006-03-07 2012-11-21 株式会社ニコン デバイス製造方法、デバイス製造システム及び測定検査装置
EP1995768A4 (en) 2006-03-13 2013-02-06 Nikon Corp EXPOSURE DEVICE, MAINTENANCE METHOD, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
US20070242254A1 (en) 2006-03-17 2007-10-18 Nikon Corporation Exposure apparatus and device manufacturing method
US8982322B2 (en) 2006-03-17 2015-03-17 Nikon Corporation Exposure apparatus and device manufacturing method
US20080013062A1 (en) 2006-03-23 2008-01-17 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR20090006064A (ko) 2006-04-05 2009-01-14 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 스테이지 제어 방법, 노광 방법및 디바이스 제조 방법
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
TWI439813B (zh) 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
TW200805000A (en) 2006-05-18 2008-01-16 Nikon Corp Exposure method and apparatus, maintenance method and device manufacturing method
US7728462B2 (en) 2006-05-18 2010-06-01 Nikon Corporation Monolithic stage devices providing motion in six degrees of freedom
EP2034514A4 (en) 2006-05-22 2012-01-11 Nikon Corp EXPOSURE METHOD AND APPARATUS, MAINTENANCE METHOD, AND METHOD OF MANUFACTURING THE DEVICE THEREFOR
WO2007136089A1 (ja) 2006-05-23 2007-11-29 Nikon Corporation メンテナンス方法、露光方法及び装置、並びにデバイス製造方法
EP2023379A4 (en) 2006-05-31 2009-07-08 Nikon Corp EXPOSURE APPARATUS AND EXPOSURE METHOD
WO2007142351A1 (ja) 2006-06-09 2007-12-13 Nikon Corporation 移動体装置、露光装置及び露光方法、並びにデバイス製造方法
JPWO2007142350A1 (ja) 2006-06-09 2009-10-29 株式会社ニコン パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法
EP2043134A4 (en) 2006-06-30 2012-01-25 Nikon Corp MAINTENANCE METHOD, EXPOSURE METHOD, AND DEVICE AND DEVICE MANUFACTURING METHOD
US20080073563A1 (en) 2006-07-01 2008-03-27 Nikon Corporation Exposure apparatus that includes a phase change circulation system for movers
KR101236043B1 (ko) 2006-07-14 2013-02-21 가부시키가이샤 니콘 스테이지 장치, 노광 장치 및 디바이스 제조 방법
US8570484B2 (en) 2006-08-30 2013-10-29 Nikon Corporation Immersion exposure apparatus, device manufacturing method, cleaning method, and cleaning member to remove foreign substance using liquid
KR101634893B1 (ko) 2006-08-31 2016-06-29 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI416269B (zh) 2006-08-31 2013-11-21 尼康股份有限公司 Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method
KR101477465B1 (ko) 2006-08-31 2014-12-29 가부시키가이샤 니콘 이동체 구동 시스템 및 이동체 구동 방법, 패턴 형성 장치 및 방법, 노광 장치 및 방법, 디바이스 제조 방법, 그리고 결정 방법
EP2071613B1 (en) 2006-09-01 2019-01-23 Nikon Corporation Exposure method and apparatus
KR101452524B1 (ko) 2006-09-01 2014-10-21 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
WO2008029884A1 (en) 2006-09-08 2008-03-13 Nikon Corporation Cleaning member, cleaning method and device manufacturing method
KR101422298B1 (ko) 2006-09-08 2014-08-13 가부시키가이샤 니콘 마스크, 노광 장치, 노광 방법 및 그 노광 장치 또는 노광 방법을 이용한 디바이스 제조 방법
US7872730B2 (en) 2006-09-15 2011-01-18 Nikon Corporation Immersion exposure apparatus and immersion exposure method, and device manufacturing method
JP5120377B2 (ja) 2006-09-29 2013-01-16 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
KR101549709B1 (ko) 2006-11-09 2015-09-11 가부시키가이샤 니콘 유지 장치, 위치 검출 장치 및 노광 장치, 이동 방법, 위치검출 방법, 노광 방법, 검출계의 조정 방법, 그리고 디바이스 제조 방법
JP5055971B2 (ja) 2006-11-16 2012-10-24 株式会社ニコン 表面処理方法及び表面処理装置、露光方法及び露光装置、並びにデバイス製造方法
US7973910B2 (en) 2006-11-17 2011-07-05 Nikon Corporation Stage apparatus and exposure apparatus
US20080156356A1 (en) 2006-12-05 2008-07-03 Nikon Corporation Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8323855B2 (en) 2007-03-01 2012-12-04 Nikon Corporation Pellicle frame apparatus, mask, exposing method, exposure apparatus, and device fabricating method
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US8098362B2 (en) 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
US8547527B2 (en) 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
JP5177449B2 (ja) 2007-07-24 2013-04-03 株式会社ニコン 移動体駆動方法及び移動体駆動システム、パターン形成方法及び装置、露光方法及び装置、並びにデバイス製造方法
US8194232B2 (en) 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
WO2009013905A1 (ja) 2007-07-24 2009-01-29 Nikon Corporation 位置計測システム、露光装置、位置計測方法、露光方法及びデバイス製造方法、並びに工具及び計測方法
US9304412B2 (en) 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
US8867022B2 (en) 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US8237919B2 (en) 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
US8023106B2 (en) 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8218129B2 (en) 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US8421994B2 (en) 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US20090153824A1 (en) * 2007-12-17 2009-06-18 Kla-Tencor Corporation Multiple chuck scanning stage
US9176393B2 (en) 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
NL2003363A (en) 2008-09-10 2010-03-15 Asml Netherlands Bv Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method.
US8384875B2 (en) 2008-09-29 2013-02-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US9312159B2 (en) 2009-06-09 2016-04-12 Nikon Corporation Transport apparatus and exposure apparatus

Similar Documents

Publication Publication Date Title
JPH10214783A5 (cg-RX-API-DMAC7.html)
JPH10163099A5 (cg-RX-API-DMAC7.html)
JP3203719B2 (ja) 露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法
JPH10163097A5 (cg-RX-API-DMAC7.html)
JPH10209039A5 (cg-RX-API-DMAC7.html)
JPH10163099A (ja) 露光方法及び露光装置
JP3624065B2 (ja) 基板搬送装置、半導体製造装置および露光装置
JPH0950951A (ja) リソグラフィ方法およびリソグラフィ装置
JPH03116816A (ja) 露光装置
JPH09115817A (ja) 露光方法及び装置
JP2002050560A (ja) ステージ装置、計測装置及び計測方法、露光装置及び露光方法
US5440397A (en) Apparatus and method for exposure
JPH10163098A5 (cg-RX-API-DMAC7.html)
JPH0864518A (ja) 露光方法
JP4227402B2 (ja) 走査型露光装置
JP2005101455A (ja) 位置決め装置
JPH1050604A (ja) 位置管理方法及び位置合わせ方法
JPH11143087A (ja) 位置合わせ装置及びそれを用いた投影露光装置
TWI760959B (zh) 對準方法及相關的對準及微影設備
JP2010243413A (ja) 測定装置、露光装置及びデバイスの製造方法
US7782441B2 (en) Alignment method and apparatus of mask pattern
JP3569962B2 (ja) 位置合わせ装置及び位置合わせ方法、それを用いた露光装置及び露光方法
JPH09148236A (ja) 露光装置の基板ステージの移動制御方法及び装置
JP2705778B2 (ja) 投影露光装置
JPH0149007B2 (cg-RX-API-DMAC7.html)