JPH057704B2 - - Google Patents

Info

Publication number
JPH057704B2
JPH057704B2 JP59074405A JP7440584A JPH057704B2 JP H057704 B2 JPH057704 B2 JP H057704B2 JP 59074405 A JP59074405 A JP 59074405A JP 7440584 A JP7440584 A JP 7440584A JP H057704 B2 JPH057704 B2 JP H057704B2
Authority
JP
Japan
Prior art keywords
acid
polymer
photosensitive
diazo
diazo compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59074405A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60217356A (ja
Inventor
Sukeyuki Tsucha
Ujori Oomori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP7440584A priority Critical patent/JPS60217356A/ja
Publication of JPS60217356A publication Critical patent/JPS60217356A/ja
Publication of JPH057704B2 publication Critical patent/JPH057704B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP7440584A 1984-04-13 1984-04-13 感光性組成物 Granted JPS60217356A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7440584A JPS60217356A (ja) 1984-04-13 1984-04-13 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7440584A JPS60217356A (ja) 1984-04-13 1984-04-13 感光性組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP7328731A Division JP2815332B2 (ja) 1995-12-18 1995-12-18 感光性組成物の製造方法

Publications (2)

Publication Number Publication Date
JPS60217356A JPS60217356A (ja) 1985-10-30
JPH057704B2 true JPH057704B2 (en, 2012) 1993-01-29

Family

ID=13546243

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7440584A Granted JPS60217356A (ja) 1984-04-13 1984-04-13 感光性組成物

Country Status (1)

Country Link
JP (1) JPS60217356A (en, 2012)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63204248A (ja) * 1987-02-20 1988-08-23 Konica Corp 感光性組成物
JP2646579B2 (ja) * 1987-10-06 1997-08-27 三菱化学株式会社 感光性組成物
JPH01274132A (ja) * 1988-04-27 1989-11-01 Tokyo Ohka Kogyo Co Ltd 感光性組成物
JP2671406B2 (ja) * 1988-07-19 1997-10-29 三菱化学株式会社 感光性組成物
JP5403943B2 (ja) * 2008-05-21 2014-01-29 昭和電工株式会社 ポリマー、感光性樹脂組成物及びレジストパターンの形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534929B2 (en, 2012) * 1974-02-28 1980-09-10
JPS5630859B2 (en, 2012) * 1974-04-24 1981-07-17
JPS5196603A (ja) * 1975-02-19 1976-08-25 Hikarikokaseisoseibutsu

Also Published As

Publication number Publication date
JPS60217356A (ja) 1985-10-30

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