JPH057704B2 - - Google Patents
Info
- Publication number
- JPH057704B2 JPH057704B2 JP59074405A JP7440584A JPH057704B2 JP H057704 B2 JPH057704 B2 JP H057704B2 JP 59074405 A JP59074405 A JP 59074405A JP 7440584 A JP7440584 A JP 7440584A JP H057704 B2 JPH057704 B2 JP H057704B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- polymer
- photosensitive
- diazo
- diazo compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000008049 diazo compounds Chemical class 0.000 claims description 22
- 229920000642 polymer Polymers 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 20
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Substances OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 13
- 239000011347 resin Substances 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 230000003014 reinforcing effect Effects 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- -1 diazo resins Chemical class 0.000 description 7
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- RKOOOVKGLHCLTP-UHFFFAOYSA-N 2-methylprop-2-enoic acid;propane-1,2,3-triol Chemical compound CC(=C)C(O)=O.OCC(O)CO RKOOOVKGLHCLTP-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 3
- GHJOIQFPDMIKHT-UHFFFAOYSA-N propane-1,2,3-triol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCC(O)CO GHJOIQFPDMIKHT-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229920006243 acrylic copolymer Polymers 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- NDKBVBUGCNGSJJ-UHFFFAOYSA-M benzyltrimethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)CC1=CC=CC=C1 NDKBVBUGCNGSJJ-UHFFFAOYSA-M 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000000123 paper Substances 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- KCZIUKYAJJEIQG-UHFFFAOYSA-N 1,3,5-triazin-2-amine Chemical compound NC1=NC=NC=N1 KCZIUKYAJJEIQG-UHFFFAOYSA-N 0.000 description 1
- RSZXXBTXZJGELH-UHFFFAOYSA-N 2,3,4-tri(propan-2-yl)naphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(C(C)C)C(C(C)C)=C(C(C)C)C(S(O)(=O)=O)=C21 RSZXXBTXZJGELH-UHFFFAOYSA-N 0.000 description 1
- QRIMLDXJAPZHJE-UHFFFAOYSA-N 2,3-dihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)CO QRIMLDXJAPZHJE-UHFFFAOYSA-N 0.000 description 1
- VXIUJNNTXKAJMU-UHFFFAOYSA-N 2,3-dimethoxy-4-morpholin-4-ylbenzenediazonium Chemical compound COC=1C(=C(C=CC1N1CCOCC1)[N+]#N)OC VXIUJNNTXKAJMU-UHFFFAOYSA-N 0.000 description 1
- CVTWUUJGZIZUTR-UHFFFAOYSA-N 2,5-dimethoxy-4-(4-methylphenyl)sulfanylbenzenediazonium Chemical compound COC1=CC([N+]#N)=C(OC)C=C1SC1=CC=C(C)C=C1 CVTWUUJGZIZUTR-UHFFFAOYSA-N 0.000 description 1
- IRLYGRLEBKCYPY-UHFFFAOYSA-N 2,5-dimethylbenzenesulfonic acid Chemical compound CC1=CC=C(C)C(S(O)(=O)=O)=C1 IRLYGRLEBKCYPY-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- QDWTXRWOKORYQH-UHFFFAOYSA-N 3-bromobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(Br)=C1 QDWTXRWOKORYQH-UHFFFAOYSA-N 0.000 description 1
- IQOJIHIRSVQTJJ-UHFFFAOYSA-N 3-chlorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(Cl)=C1 IQOJIHIRSVQTJJ-UHFFFAOYSA-N 0.000 description 1
- ABSXMLODUTXQDJ-UHFFFAOYSA-N 4-(4-sulfophenyl)benzenesulfonic acid Chemical compound C1=CC(S(=O)(=O)O)=CC=C1C1=CC=C(S(O)(=O)=O)C=C1 ABSXMLODUTXQDJ-UHFFFAOYSA-N 0.000 description 1
- KSOWMDCLEHRQPH-UHFFFAOYSA-N 4-diazocyclohexa-1,5-dien-1-amine Chemical compound NC1=CCC(=[N+]=[N-])C=C1 KSOWMDCLEHRQPH-UHFFFAOYSA-N 0.000 description 1
- YLKCHWCYYNKADS-UHFFFAOYSA-N 5-hydroxynaphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(O)=CC=CC2=C1S(O)(=O)=O YLKCHWCYYNKADS-UHFFFAOYSA-N 0.000 description 1
- HWTDMFJYBAURQR-UHFFFAOYSA-N 80-82-0 Chemical compound OS(=O)(=O)C1=CC=CC=C1[N+]([O-])=O HWTDMFJYBAURQR-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- 206010012442 Dermatitis contact Diseases 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 230000010534 mechanism of action Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 229920000379 polypropylene carbonate Polymers 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000007717 redox polymerization reaction Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 150000005691 triesters Chemical class 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は感光性組成物、さらに詳しくいえば、
特に平版印刷版用として好適に用いられる感光性
組成物に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a photosensitive composition, more specifically,
In particular, it relates to a photosensitive composition suitably used for planographic printing plates.
(従来の技術)
従来、平版印刷版用感光性組成物としては、主
に公知のジアゾ化合物、例えばp−ジアゾジフエ
ニルアミンのホルムアルデヒド縮合物であるジア
ゾ樹脂が代表的なものとして用いられている。こ
のようなジアゾ化合物をあらかじめ親水化処理を
施した表面を有する支持体上に塗布して得られた
感光層は、ネガフイルムを通して露光すると、露
光部分のジアゾ化合物が分解して不溶性となり、
一方未露光部分は水性溶液に対して可溶性のまま
である。したがつて、このものにアルカリ水溶液
などを用いて現像処理を施すことにより、未露光
部分は溶解除去されて、該支持体上に光分解した
ジアゾ化合物から成る画像を形成することができ
る。この露光部分の不溶化したジアゾ化合物から
成る画像は親油性を示してインキ受容性であり、
一方未露光部分は親水性支持体表面が露出してい
るため水受容性であつてインキを反揆することに
より、このものを平版印刷版として用いることが
できる。(Prior Art) Conventionally, known diazo compounds, such as diazo resins, which are formaldehyde condensates of p-diazodiphenylamine, have been typically used as photosensitive compositions for lithographic printing plates. . When a photosensitive layer obtained by coating such a diazo compound on a support whose surface has been previously subjected to a hydrophilic treatment is exposed to light through a negative film, the diazo compound in the exposed portion decomposes and becomes insoluble.
On the other hand, the unexposed areas remain soluble in aqueous solutions. Therefore, by subjecting this material to a development treatment using an alkaline aqueous solution or the like, the unexposed portions are dissolved and removed, and an image made of the photodecomposed diazo compound can be formed on the support. The image made of the insolubilized diazo compound in the exposed area exhibits lipophilicity and is ink receptive.
On the other hand, in the unexposed areas, since the surface of the hydrophilic support is exposed, it is water-receptive and repels ink, so that it can be used as a lithographic printing plate.
ところで、このような不溶化したジアゾ化合物
のみで形成された画像は強度や耐摩耗性が低く、
耐刷性が不良である。したがつて、画像を補強す
る目的で、露光、現像後、画像にラツカーを定着
したり、あるいは予めジアゾ化合物に補強用樹脂
を混合しておく方法などが用いられる。前者の方
法は工程が多いために、現在では後者の方法が一
般的に用られている。 By the way, images formed only with such insolubilized diazo compounds have low strength and abrasion resistance;
Printing durability is poor. Therefore, for the purpose of reinforcing the image, a method is used in which a lacquer is fixed on the image after exposure and development, or a reinforcing resin is mixed in advance with the diazo compound. Since the former method involves many steps, the latter method is now generally used.
前記のジアゾ化合物に混合する補強用樹脂は、
必要特性として、ジアゾ化合物とともに形成した
感光層が露光前は可溶性であり、露光により不溶
性となつて親油性の画像を形成するということが
要求され、また、現像は通常水性溶液を用いて行
われるので、水性溶液に対してある程度溶解、膨
潤する性質と、ジアゾ化合物とともに不溶性とな
つたのちは親油性となる性質を有することも要求
される。 The reinforcing resin to be mixed with the above diazo compound is
The required characteristics are that the photosensitive layer formed with the diazo compound is soluble before exposure and becomes insoluble upon exposure to form a lipophilic image, and development is usually performed using an aqueous solution. Therefore, it is also required to have the property of dissolving and swelling in an aqueous solution to some extent, and the property of becoming lipophilic after becoming insoluble together with the diazo compound.
このような補強用樹脂として、これまで各種の
ものが提案されているが、必ずしも前記の特性を
十分に満足するものは得られていない。 Various types of reinforcing resins have been proposed so far, but none that fully satisfy the above-mentioned characteristics have yet been obtained.
本発明者らは、このような事情に鑑み、鋭意研
究を重ねた結果、前記の特性を有し、かつジアゾ
化合物との相溶性も良好であり、その上経時安定
性にも優れた補強用樹脂を見出し、本発明を完成
するに至つた。 In view of these circumstances, the present inventors have conducted intensive research and have found a reinforcing material that has the above characteristics, has good compatibility with diazo compounds, and has excellent stability over time. They discovered a resin and completed the present invention.
(問題点を解決するための手段)
すなわち、本発明は、一般式
又は
(式中のRは水素原子又はメチル基である)
で示される構成単位を10〜50重量%含有する重合
体とジアゾ化合物とを感光成分として含有して成
る感光性組成物を提供するものである。(Means for solving the problem) That is, the present invention solves the general formula or (R in the formula is a hydrogen atom or a methyl group) A photosensitive composition comprising a polymer containing 10 to 50% by weight of the structural unit represented by the formula and a diazo compound as photosensitive components. be.
本発明組成物において用いられる重合体は、前
記一般式()又は()で示される構成単位を
含有するものであつて、グリセリンモノアクリレ
ート若しくはグリセリンモノメタクリレートの重
合体、又はこれらと他の付加重合性不飽和化合物
との共重合体である。この共重合体としては、グ
リセリンモノアクリレート単位若しくはグリセリ
ンモノメタクリレート単位又はその両方の単位を
10〜50重量%含有するものが用いられる。このよ
うな共重合体に用いられる他の付加重合性不飽和
化合物としては、例えばアクリロニトリル、メタ
クリロニトリル、アクリル酸、メタクリル酸、ア
クリル酸メチル、メタクリル酸メチル、アクリル
酸エチル、メタクリル酸エチル、アクリル酸ブチ
ル、メタクリル酸ブチルなどが好ましく挙げられ
る。また、前記以外の付加重合性不飽和化合物と
して、例えば各種公知のアクリル酸エステル類や
メタクリル酸エステル類、アクリルアミド類やメ
タクリルアミド類、スチレン類、ビニルエーテル
類、酢酸ビニル、マレイン酸、N−ビニルピロリ
ドン、その他各種のビニル化合物なども好ましく
用いられる。 The polymer used in the composition of the present invention contains a structural unit represented by the above general formula () or (), and is a polymer of glycerin monoacrylate or glycerin monomethacrylate, or a polymer of these and other addition polymers. It is a copolymer with a sexually unsaturated compound. This copolymer contains glycerin monoacrylate units, glycerin monomethacrylate units, or both units.
Those containing 10 to 50% by weight are used. Other addition polymerizable unsaturated compounds used in such copolymers include, for example, acrylonitrile, methacrylonitrile, acrylic acid, methacrylic acid, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, acrylic Preferred examples include butyl acid and butyl methacrylate. In addition, examples of addition polymerizable unsaturated compounds other than those mentioned above include various known acrylic esters, methacrylic esters, acrylamides and methacrylamides, styrenes, vinyl ethers, vinyl acetate, maleic acid, and N-vinylpyrrolidone. , and various other vinyl compounds are also preferably used.
本発明に用いる重合体は、常法に従い、溶液重
合、乳化重合、懸濁重合などによつて製造するこ
とができる。この重合反応においては、過酸化
物、アゾ化合物などの慣用の重合開始剤やレドツ
クス系重合開始剤などを使用してもよい。 The polymer used in the present invention can be produced by solution polymerization, emulsion polymerization, suspension polymerization, etc. according to conventional methods. In this polymerization reaction, conventional polymerization initiators such as peroxides and azo compounds, redox polymerization initiators, and the like may be used.
この重合体は、前記一般式()又は()で
示される構成単位を10〜50重量%含有したもので
あれば、本発明の目的は達成されるが、形成され
た画像の物性強化及び感脂性向上のためには、共
重合成分として前記のアクリロニトリル又はメタ
クリロニトリルを用いて得られた共重合体が有用
であり、また現像液としてアルカリ水溶液を用い
ることが多く、共重合成分としてアクリル酸、メ
タクリル酸などの不飽和カルボン酸を用いて得ら
れた共重合体も現像性を良好にする点で好まし
い。 If this polymer contains 10 to 50% by weight of the structural unit represented by the above general formula () or (), the object of the present invention can be achieved, but the physical properties of the formed image can be strengthened and the sensitivity can be improved. In order to improve oiliness, copolymers obtained using acrylonitrile or methacrylonitrile as described above are useful as copolymerization components, and aqueous alkaline solutions are often used as developing solutions, and acrylic acid is used as a copolymerization component. Copolymers obtained using unsaturated carboxylic acids such as methacrylic acid and the like are also preferred in terms of improving developability.
ところで、本発明における重合体に用いるグリ
セリンモノアクリレート又はグリセリンモンメタ
クリレートは、不純物としてジエステルやトリエ
ステルを含有することが多く、重合体の合成時に
架橋ゲル化することがあるため、該重合体の製造
方法として、まずアクリル酸やメタクリル酸など
の不飽和カルボン酸の重合体、又はこれらと他の
付加重合性不飽和化合物との共重合体を作成した
のち、グリシドールを付加させて、次の反応によ
り目的とする重合体を得る方法が有効である。 By the way, glycerin monoacrylate or glycerin monomethacrylate used in the polymer of the present invention often contains diesters and triesters as impurities, and may cross-link and gel during polymer synthesis. The method is to first create a polymer of unsaturated carboxylic acids such as acrylic acid or methacrylic acid, or a copolymer of these and other addition-polymerizable unsaturated compounds, then add glycidol and perform the following reaction. A method for obtaining the desired polymer is effective.
又は
この場合、触媒としてアミン類を使用すること
ができる。 or In this case, amines can be used as catalysts.
本発明に用いる重合体は、前記一般式()又
は()で示される構成単位を、現像性を良好と
するための水性溶液に対する溶解性と露光により
形成された不溶性画像の親油性とのバランスの点
から、10〜60重量%の範囲で含有することが好ま
しく、また、共重合成分として、前記の各種付加
重合性不飽和化合物が用いられる。 The polymer used in the present invention has a structural unit represented by the general formula () or () that has a balance between solubility in an aqueous solution for good developability and lipophilicity of an insoluble image formed by exposure. From this point of view, the content is preferably in the range of 10 to 60% by weight, and the various addition polymerizable unsaturated compounds described above are used as the copolymerization component.
本発明組成物におけるジアゾ化合物としては、
周知の感光性ジアゾ化合物を用いることができ
る。好ましいジアゾ化合物としては、p−ジアゾ
ジフエニルアミンとホルムアルデヒドとの縮合物
の塩、例えばフエノール塩、フルオロカプリン酸
塩、芳香族スルホン酸との塩など、分子中に2個
以上のジアゾ基を含むジアゾ化合物が挙げられ
る。ここで用いられる好ましい芳香族スルホン酸
としては、例えば2−ヒドロキシ−4−メトキシ
−ベンゾフエノン−5−スルホン酸、p−トルエ
ンスルホン酸、1−ナフトール−5−スルホン
酸、トリイソプロピルナフタレンスルホン酸、
4,4′−ビフエニルジスルホン酸、5−ニトロ−
o−トルエンスルホン酸、2,5−ジメチルベン
ゼンスルホン酸、2−ニトロベンゼンスルホン
酸、3−クロロベンゼンスルホン酸、3−ブロモ
ベンゼンスルホン酸などが挙げられる。また、前
記のジアゾ化合物以外に、例えば2,5−ジメト
キシ−4−p−トリルメルカプトベンゼンジアゾ
ニウムとホルムアルデヒドとの縮合物、2,5−
ジメトキシ−4−モルホリノベンゼンジアゾニウ
ムとホルムアルデヒドとの縮合物、2,6−ビス
(4−ジアゾ−2,5−ジメトキシフエニルアミ
ノ)−4−N,N−(ジ−p−ヒドロキシエチル)
アミノ−1,3,5−トリアジンなどの芳香族ス
ルホン酸塩も用いることができる。 The diazo compound in the composition of the present invention includes:
Well-known photosensitive diazo compounds can be used. Preferred diazo compounds include salts of condensates of p-diazodiphenylamine and formaldehyde, such as phenol salts, fluorocapric acid salts, and salts with aromatic sulfonic acids, which contain two or more diazo groups in the molecule. Examples include diazo compounds. Preferred aromatic sulfonic acids used here include, for example, 2-hydroxy-4-methoxy-benzophenone-5-sulfonic acid, p-toluenesulfonic acid, 1-naphthol-5-sulfonic acid, triisopropylnaphthalenesulfonic acid,
4,4'-biphenyldisulfonic acid, 5-nitro-
Examples include o-toluenesulfonic acid, 2,5-dimethylbenzenesulfonic acid, 2-nitrobenzenesulfonic acid, 3-chlorobenzenesulfonic acid, and 3-bromobenzenesulfonic acid. In addition to the above-mentioned diazo compounds, for example, a condensate of 2,5-dimethoxy-4-p-tolylmercaptobenzenediazonium and formaldehyde, 2,5-
Condensate of dimethoxy-4-morpholinobenzenediazonium and formaldehyde, 2,6-bis(4-diazo-2,5-dimethoxyphenylamino)-4-N,N-(di-p-hydroxyethyl)
Aromatic sulfonates such as amino-1,3,5-triazine can also be used.
本発明組成物における前記ジアゾ化合物の含有
量は、補強樹脂として用いられる重合体に対して
1〜40重量%、好ましくは5〜20重量%の範囲で
選ばれる。 The content of the diazo compound in the composition of the present invention is selected in the range of 1 to 40% by weight, preferably 5 to 20% by weight based on the polymer used as the reinforcing resin.
本発明組成物には、必要に応じ、染料、顔料、
安定剤、可塑剤、充填剤などを添加することもで
きる。特に、露光、現像後に形成した画像を見や
すくするために染料を加えることは有用である。 The composition of the present invention may contain dyes, pigments,
Stabilizers, plasticizers, fillers, etc. can also be added. In particular, it is useful to add a dye to make the image formed after exposure and development easier to see.
本発明組成物を平版印刷版用に使用する場合の
1例について説明すると、まず、補強用樹脂とし
ての重合体、ジアゾ化合物及び所望ならば染料や
安定剤などの添加剤を適当な溶媒に溶解して得ら
れた感光液を、親水性表面を有する支持体上に塗
布し乾燥する。この塗布方法としては、通常用い
られている方法、例えば回転塗布機、カーテンコ
ータ、ロールコータ、スプレーコータなどを使用
する枚葉塗布法又はウエブ塗布法などを用いるこ
とができる。塗布量は固形分換算で0.1〜5g/
m2の範囲が好ましい。前記の溶媒としては、重合
体及びジアゾ化合物の両方を溶解するものから選
べば、例えばメチルセロソルブ−メタノール、メ
チルセロソルブ−メタノール−ジクロロエタンな
どの混合溶媒が好適である。 To explain one example of using the composition of the present invention for a lithographic printing plate, first, a polymer as a reinforcing resin, a diazo compound, and if desired, additives such as a dye and a stabilizer are dissolved in a suitable solvent. The resulting photosensitive solution is applied onto a support having a hydrophilic surface and dried. As the coating method, a commonly used method such as a sheet coating method or a web coating method using a spin coater, curtain coater, roll coater, spray coater, etc. can be used. Application amount is 0.1 to 5g/ in terms of solid content.
A range of m 2 is preferred. The above-mentioned solvent is preferably a mixed solvent such as methyl cellosolve-methanol, methyl cellosolve-methanol-dichloroethane, etc., if selected from those that dissolve both the polymer and the diazo compound.
また、支持体としては、従来平版印刷版材とし
て慣用されているもの、例えばアルミニウム板、
亜鉛板、鋼板のような金属板、ポリエチレンテレ
フタレート、ポリアミド、ポリプロピレン、ポリ
カーボネートなどのプラスチツクスシート、紙な
どや、それらの積層体あるいはメツキ処理、電解
処理、その他の化学処理を施したものなどが用い
られる。これらの処理は、支持体表面とジアゾ化
合物との間で相互に悪影響を及ぼすのを防ぐため
に、また親水性を高めかつ画像との接着性を良好
とするために行われる。特にアルミニウム板を砂
目立てし、次いでリン酸、硫酸又はシユウ酸中で
陽極酸化することは有効である。 In addition, the support may be one that has been conventionally used as a lithographic printing plate material, such as an aluminum plate,
Metal plates such as zinc plates and steel plates, plastic sheets such as polyethylene terephthalate, polyamide, polypropylene, and polycarbonate, paper, and their laminates or those that have been subjected to plating, electrolytic treatment, or other chemical treatments are used. It will be done. These treatments are carried out in order to prevent mutual adverse effects between the support surface and the diazo compound, as well as to increase hydrophilicity and improve adhesion to the image. It is particularly effective to grain the aluminum plate and then anodize it in phosphoric acid, sulfuric acid or oxalic acid.
次に、このようにして感光層が形成された平版
印刷版材にネガフイルムを通して露光すると、露
光部分は不溶性となり、一方未露光部分は可溶性
のままであるので、水やアルカリ水溶液などの現
像液を用いて現像することにより、未露光部分が
溶解除去されて、支持体上に画像が形成され、平
版印刷版とすることができる。現像液としては、
アルカリ、例えば水酸化ナトリウム、水酸化カリ
ウム、ケイ酸ナトリウム、ケイ酸カリウム、リン
酸ナトリウム、リン酸カリウム、リン酸アンモニ
ウム、炭酸ナトリウム、アンモニア、トリエタノ
ールアミンなどや、界面活性剤、アルコール類、
例えばイソプロピルアルコール、エチルアルコー
ル、ベンジルアルコール、ダイアセトンアルコー
ルなどを添加した水溶液が用いられる。 Next, when the lithographic printing plate material with the photosensitive layer formed in this way is exposed to light through a negative film, the exposed areas become insoluble, while the unexposed areas remain soluble, so a developer such as water or an alkaline aqueous solution is used. By developing it using a lithographic printing plate, the unexposed portions are dissolved and removed, an image is formed on the support, and a lithographic printing plate can be obtained. As a developer,
Alkali such as sodium hydroxide, potassium hydroxide, sodium silicate, potassium silicate, sodium phosphate, potassium phosphate, ammonium phosphate, sodium carbonate, ammonia, triethanolamine, surfactants, alcohols,
For example, an aqueous solution containing isopropyl alcohol, ethyl alcohol, benzyl alcohol, diacetone alcohol, etc. is used.
本発明の感光性組成物より得られた感光層は、
現像性が良好でかつ得られた画像の強度や耐摩耗
性が高い特徴を有している。これらの特徴は補強
用樹脂として用いる重合体中の前記一般式()
又は()で示される構成単位の効果であり、そ
の作用機構については必ずしも明確ではないが、
近接した2個の水酸基が関与しているものと思わ
れる。 The photosensitive layer obtained from the photosensitive composition of the present invention is
It is characterized by good developability and the resulting images have high strength and abrasion resistance. These characteristics are due to the above general formula () in the polymer used as reinforcing resin.
Or, it is the effect of the structural unit shown in parentheses, and its mechanism of action is not necessarily clear, but
It seems that two adjacent hydroxyl groups are involved.
また、本発明で補強用樹脂として用いる重合体
は、従来公知の補強用樹脂がすべて水以外のもの
でしか現像できないのに対し、水又は類似のもの
でも現像でき、しかも感脂性がよいという特徴を
有している。 In addition, the polymer used as the reinforcing resin in the present invention has the characteristic that it can be developed with water or similar materials, and has good oil sensitivity, whereas all conventionally known reinforcing resins can only be developed with something other than water. have.
次に実施例により本発明をさらに詳細に説明す
るが、本発明はこの実施例によつて何ら限定され
るものではない。 EXAMPLES Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to these Examples in any way.
実施例 1
メタクリル酸メチル65g、アクリロニトリル65
g、アクリル酸70g及びアゾビスイソブチロニト
リル1.0gを2−メトキシエタノール380gに溶解
し、窒素を通じながら100℃において6時間反応
を継続した。この反応混合物を60℃に冷却したの
ち、これに2−メトキシエタノール20g、重合禁
止剤としてハイドロキノン0.6g、反応触媒とし
てトリメチルベンジルアンモニウムハイドロオキ
サイドの40重量%メタノール溶液5gを加えた。
次に内容物を80℃に昇温したのち、ハイドロキノ
ン0.6gを含むグリシドール60gを1時間で滴下
し、滴下終了直後にトリメチルベンジルアンモニ
ウムハイドロオキサイドの40重量%メタノール溶
液5gを加えて、そのまま5時間反応を続けた。
次いで室温に冷却後、淡黄色の粘稠な重合体溶液
(1)を得た。得られた重合体のグリシドールの付加
反応率(カルボキシル基に対するもの)は61%で
あつた。Example 1 Methyl methacrylate 65g, acrylonitrile 65g
g, 70 g of acrylic acid, and 1.0 g of azobisisobutyronitrile were dissolved in 380 g of 2-methoxyethanol, and the reaction was continued at 100° C. for 6 hours while passing nitrogen through the solution. After cooling the reaction mixture to 60° C., 20 g of 2-methoxyethanol, 0.6 g of hydroquinone as a polymerization inhibitor, and 5 g of a 40% by weight methanol solution of trimethylbenzylammonium hydroxide as a reaction catalyst were added.
Next, after raising the temperature of the contents to 80°C, 60 g of glycidol containing 0.6 g of hydroquinone was added dropwise over 1 hour, and immediately after the dropwise addition, 5 g of a 40% by weight methanol solution of trimethylbenzylammonium hydroxide was added, and the mixture remained for 5 hours. continued to react.
Then, after cooling to room temperature, a pale yellow viscous polymer solution
I got (1). The glycidol addition reaction rate (to carboxyl groups) of the obtained polymer was 61%.
次に、このアクリル系共重合溶液(1)を用いて、
以下に示す感光性組成物を調製した。 Next, using this acrylic copolymer solution (1),
A photosensitive composition shown below was prepared.
感光性組成物
共重合体溶液(1) 5.5g
p−ジアゾフエニルアミンとパラホルムアルデ
ヒドの縮合物の2−メトキシ−4−ヒドロキシ
−5−ベンゾイルベンゼンスルホン酸塩 0.25g
オイルブルー #603(オリエント化学工業(株)
製) 0.075g
2−メトキシエタノール 10.5g
メタノール 13.8g
エチレンジクロライド 13.8g
この感光性組成物を、機械的研摩をし硫酸で陽
極酸化したアルミニウム板上にホワイラーを用い
て塗布後、100℃で2分間乾燥し、感光性印刷版
を得た。乾燥後の塗布量は、1.5g/m2であつた。
得られた感光性印刷版の感光層上にネガフイルム
を真空密着し、3KWのメタルハライドランプ
(アイグラフイツクス(株)製)、距離1mで1分間露
光後、下記組成の現像液で、室温下1分間処理し
て未露光部を除去し、画像を形成させた。 Photosensitive composition copolymer solution (1) 5.5g 2-methoxy-4-hydroxy-5-benzoylbenzenesulfonic acid salt of p-diazophenylamine and paraformaldehyde condensate 0.25g Oil Blue #603 (Orient Chemical) Kogyo Co., Ltd.
0.075 g 2-methoxyethanol 10.5 g Methanol 13.8 g Ethylene dichloride 13.8 g This photosensitive composition was coated using a whiler on an aluminum plate that had been mechanically polished and anodized with sulfuric acid, and then heated at 100°C for 2 minutes. It was dried to obtain a photosensitive printing plate. The coating amount after drying was 1.5 g/m 2 .
A negative film was vacuum-adhered onto the photosensitive layer of the obtained photosensitive printing plate, exposed to light for 1 minute at a distance of 1 m using a 3KW metal halide lamp (manufactured by Eye Graphics Co., Ltd.), and then heated to room temperature using a developer with the following composition. The unexposed areas were removed by processing for 1 minute to form an image.
現像液
ベンジルアルコール 3g
ケイ酸ソーダ40重量%水溶液 1g
ドデシルベンゼンスルホン酸ソーダ 1g
水 995g
このようにして得た印刷版をハマダスター
700CDにかけて、上質紙に印刷したところ、5万
部以上印刷することができた。Developer: Benzyl alcohol 3g Sodium silicate 40% by weight aqueous solution 1g Sodium dodecylbenzenesulfonate 1g Water 995g
When I printed 700 CDs on high-quality paper, I was able to print over 50,000 copies.
実施例 2
かきまぜ機、還流冷却器、滴下ロート、及び温
度計を備えた1容の4ツ口フラスコに、反応溶
媒として2−メトキシエタノール200gを入れ、
窒素置換を行いながら100℃に加熱した。滴下ロ
ートにグリセロールモノメタクリレート50g、メ
タクリル酸メチル70g、アクリロニトリル70g、
メタクリル酸10g、及び重合触媒として過酸化ベ
ンゾイル0.8gの混合物を入れておき、該混合物
を2時間で滴下し、滴下終了15分後に2−メトキ
シエタノール200gと過酸化ベンゾイル0.2gを加
えて、そのまま4時間加熱することによつて反応
を完結した。室温に冷却後、淡黄色の粘稠な重合
体溶液(2)を得た。Example 2 200 g of 2-methoxyethanol was placed as a reaction solvent in a 1-volume 4-necked flask equipped with a stirrer, a reflux condenser, a dropping funnel, and a thermometer.
It was heated to 100°C while purging with nitrogen. In the dropping funnel, add 50 g of glycerol monomethacrylate, 70 g of methyl methacrylate, 70 g of acrylonitrile,
A mixture of 10 g of methacrylic acid and 0.8 g of benzoyl peroxide as a polymerization catalyst was added dropwise over 2 hours, and 15 minutes after the dropwise addition was completed, 200 g of 2-methoxyethanol and 0.2 g of benzoyl peroxide were added. The reaction was completed by heating for 4 hours. After cooling to room temperature, a pale yellow viscous polymer solution (2) was obtained.
次いで、このアクリル系共重合体溶液(2)を用い
て、以下に示す感光性組成物を調製した。 Next, the photosensitive composition shown below was prepared using this acrylic copolymer solution (2).
感光性組成物
共重合体溶液(2) 6.4g
実施例1におけるジアゾ樹脂 0.25g
オイルブルー # 603 0.075g
2−メトキシエタノール 9.6g
メタノール 13.8g
エチレンジクロライド 13.8g
この感光性組成物を、実施例1で用いた陽極酸
化アルミニウム板に塗布した。乾燥後の塗布量
は、1.5g/m2であつた。このようにして得られ
た感光性印刷版を実施例1と同様の方法で露光、
現像後、印刷機にかけたところ、5万部以上印刷
することができた。 Photosensitive composition Copolymer solution (2) 6.4g Diazo resin in Example 1 0.25g Oil Blue #603 0.075g 2-methoxyethanol 9.6g Methanol 13.8g Ethylene dichloride 13.8g This photosensitive composition was prepared in Example 1. It was applied to the anodized aluminum plate used in . The coating amount after drying was 1.5 g/m 2 . The photosensitive printing plate thus obtained was exposed in the same manner as in Example 1,
After developing it, I put it on a printing press and was able to print over 50,000 copies.
Claims (1)
示される構成単位を10〜50重量%含有する重合体
とジアゾ化合物とを感光成分として含有して成る
感光性組成物。[Claims] 1. General formula or A photosensitive composition comprising a polymer containing 10 to 50% by weight of a structural unit represented by the formula (R in the formula is a hydrogen atom or a methyl group) and a diazo compound as photosensitive components.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7440584A JPS60217356A (en) | 1984-04-13 | 1984-04-13 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7440584A JPS60217356A (en) | 1984-04-13 | 1984-04-13 | Photosensitive composition |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7328731A Division JP2815332B2 (en) | 1995-12-18 | 1995-12-18 | Method for producing photosensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60217356A JPS60217356A (en) | 1985-10-30 |
JPH057704B2 true JPH057704B2 (en) | 1993-01-29 |
Family
ID=13546243
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7440584A Granted JPS60217356A (en) | 1984-04-13 | 1984-04-13 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60217356A (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63204248A (en) * | 1987-02-20 | 1988-08-23 | Konica Corp | Photosensitive composition |
JP2646579B2 (en) * | 1987-10-06 | 1997-08-27 | 三菱化学株式会社 | Photosensitive composition |
JPH01274132A (en) * | 1988-04-27 | 1989-11-01 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
JP2671406B2 (en) * | 1988-07-19 | 1997-10-29 | 三菱化学株式会社 | Photosensitive composition |
JP5403943B2 (en) * | 2008-05-21 | 2014-01-29 | 昭和電工株式会社 | Polymer, photosensitive resin composition and method for forming resist pattern |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50118802A (en) * | 1974-02-28 | 1975-09-17 | ||
JPS50138905A (en) * | 1974-04-24 | 1975-11-06 | ||
JPS5196603A (en) * | 1975-02-19 | 1976-08-25 | HIKARIKOKA SEISOSEIBUTSU |
-
1984
- 1984-04-13 JP JP7440584A patent/JPS60217356A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50118802A (en) * | 1974-02-28 | 1975-09-17 | ||
JPS50138905A (en) * | 1974-04-24 | 1975-11-06 | ||
JPS5196603A (en) * | 1975-02-19 | 1976-08-25 | HIKARIKOKA SEISOSEIBUTSU |
Also Published As
Publication number | Publication date |
---|---|
JPS60217356A (en) | 1985-10-30 |
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