JPH05502754A - 情報を有する物品追跡機能を備えた処理システム - Google Patents
情報を有する物品追跡機能を備えた処理システムInfo
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- JPH05502754A JPH05502754A JP2513095A JP51309590A JPH05502754A JP H05502754 A JPH05502754 A JP H05502754A JP 2513095 A JP2513095 A JP 2513095A JP 51309590 A JP51309590 A JP 51309590A JP H05502754 A JPH05502754 A JP H05502754A
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Classifications
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
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- G—PHYSICS
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70541—Tagging, i.e. hardware or software tagging of features or components, e.g. using tagging scripts or tagging identifier codes for identification of chips, shots or wafers
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
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- G—PHYSICS
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- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
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- G05B2219/31—From computer integrated manufacturing till monitoring
- G05B2219/31002—Computer controlled agv conveys workpieces between buffer and cell
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- G—PHYSICS
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- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/31—From computer integrated manufacturing till monitoring
- G05B2219/31286—Detect position of articles and equipment by receivers, identify objects by code
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- G—PHYSICS
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- G05B2219/00—Program-control systems
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- G05B2219/31323—Database for CIM
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- G—PHYSICS
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- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
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- G05B2219/30—Nc systems
- G05B2219/31—From computer integrated manufacturing till monitoring
- G05B2219/31432—Keep track of conveyed workpiece, batch, tool, conditions of stations, cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
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- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Automation & Control Theory (AREA)
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- Databases & Information Systems (AREA)
- Mathematical Physics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
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- Preparation Of Compounds By Using Micro-Organisms (AREA)
Abstract
Description
Claims (11)
- 1.各処理ステップが対応するワークステーションでおこなわれるようになった 物品のための1連の処理を行うシステムであって、物品のための移動コンテナを 備え、該移動コンテナは、該移動コンテナ内の物品へのアクセスを制御する第1 インターフェースと、物品のアイデンティティと処理ヒストリーに関するデータ を受信し、ストアし、送信するコンテナデータ処理手段を有し、前記システムは 、さらに、 各ワークステーションに設けられ、前記第1インターフェースとインターフェー スする第2インターフェース手段と、各ワークステーションに設けられ、前記コ ンテナデータ処理手段からデータを受信し及び該手段にデータを送信し、前記コ ンテナデータ処理手段から受信したデータを処理し、前記第1及び第2インター フェース手段を制御して物品の処理ヒストリーと該ワークステーションのアイデ ンティティとの比較に基づいて前記移動コンテナにある物品へのアクセスを許容 するワークステーションデータ処理手段と、 前記各コンテナとワークステーションデータ処理手段からデータを受信し及び該 コンテナと手段にデータを送信し、該各コンテナとワークステーションデータ処 理手段から受信したデータを処理する中央データ処理手段とを備えたことを特徴 とするシステム。
- 2.請求項1において、前記コンテナデータ処理手段と前記ワークステーション データ処理手段が物品のステータスとワークステーションのステータスに関する データを前記中央データ処理手段に送信することを特徴とするシステム。
- 3.半導体ウエハー処理システムであって、半導体ウエハーをストアする移動コ ンテナを備え、該移動コンテナは、 該コンテナ内にストアする物品への承認されていないアクセスを防止するラッチ を有するドアと、 該コンテナにストアされたウエハーに関するデータをストアし、該データを送信 し、該コンテナ内にストアされている物品に関するデータを受信する第1データ 処理手段とを有し、 該システムはさらに、 複数のワークステーションを備え、 各ワークステーションは、 前記コンテナを収容し、前記コンテナの前記ドアを操作するインターフェースス テーションと、 処理ステーションと、 前記インターフェースステーションと前記処理ステーションとの間で半導体ウエ ハーを移送する移送手段と、 ワークステーションアイデンティティ情報をストアし、データを受信及び送信し 、データを処理し、前記コンテナから受信されたデータとワークステーションア イデンティティ情報とを比較し、前記コンテナから受信されたデータとワークス テーションアイデンティティ情報との比較に応答して前記インターフェースステ ーションを制御し、前記処理ステーションを制御する第2ステーションとを有し 、 該システムはさらに、 前記各第2データ処理手段からデータを受信し及び該手段にデータを送信し各通 信手段から受信されたデータを処理する第3データ処理手段とを備えたことをシ ステム。
- 4.請求項3において、前記第1データ処理手段は前記コンテナにおいてストア された各ウエハーについてのアイデンティティと、行われる処理ステップと、処 理ヒストリーとを含むデータをストアすることを特徴とするシステム。
- 5.物品の移送と処理を行うシステムであって、物品を収容する内部領域を有す る少なくとも1つの移動コンテナと、前記移動コンテナ内に設けられ、対応する 移動コンテナに収容された物品に関する情報を受信し、ストアし、送信し、表示 する第1手段と、複数のワークステーションとを備え、 該各ワークステーションは、 前記移動コンテナの1つを収容する第2手段と、前記第2手段に収容された移動 コンテナによって搬送される物品を処理する第3手段と、 前記第2手段に収容された移動コンテナに設けられた第1手段にストアされた前 記情報に応答し、前記第2及び第3手段を制御し、前記第3手段で行われる処理 に関する情報を前記第1手段に送信する第4手段とを有し、前記システムはさら に、 少なくとも1つの前記ワークステーションの第3手段と通信して対応するワーク ステーションのステータスに関する情報を受信し、ワークステーションの前記第 3手段で行われる処理に関する情報を送信し、ワークステーションの第2手段に 収容された移動コンテナ上に設けられた第1手段によってストアされた情報を受 信する第5手段とを備えたこと特徴とするシステム。
- 6.請求項5において、さらに、前記移動コンテナの1つをストアし、そこにス トアされた移動コンテナの第1手段と前記第5手段との間の通信を与える第6手 段を備えたことを特徴とするシステム。
- 7.請求項6において、さらに、 前記複数のワークステーションの第1のグループの各々の第3手段の間の通信を 与える第1ネットワーク手段と、 前記複数のワークステーションの第2のグループの各々の第3手段の間の通信を 与える第2ネットワーク手段と、 前記第1ネットワーク手段を制御し、該第1ネットワーク手段と前記第5手段と の間の通信を与える第1ローカル処理手段と、前記第2ネットワーク手段を制御 し、前記第2ネットワーク手段と前記第5手段との間の通信を与える第2ローカ ル処理手段とを備えたことを特徴とするシステム。
- 8.物品をストアし、搬送し、処理するシステムであって、複数の移動コンテナ を備え、 各移動コンテナは、複数の物品を収容する内部領域を有しており、前記システム はさらに、 各移動コンテナに設けられ、対応する移動コンテナに収容された物品に関する情 報を受信し、ストアし、送信し、表示するデータ処理手段と、複数のワークステ ーションとを備え、 該各ワークステーションは、 1つの前記移動コンテナを収容する第1手段と、該第1手段に収容された移動コ ンテナによって輸送される物品の選択されたものを処理する第2処理手段と、 前記第1手段に収容された移動コンテナに設けられたデータ処理手段によってス トアされた前記情報に応答して、(i)前記第1手段に収容された移動コンテナ にある少なくとも1つの物品が適当なワークステーションに到着したことを確認 し、(ii)物品が適当なワークステーションに到着しなかったときは前記デー タ処理手段を制御して該適当なワークステーションのアイデンティティを表示し 、(iii)該ワークステーションで処理されるべき各物品の処理情報をストア し、(iv)前記第1手段及び第2手段を制御して前記確認と選択された物品に ついての処理情報に従い物品の選択されたものを処理し、(v)中央処理ユニッ トに前記物品の処理時間を報告し、(vi)前記第1手段に収容された移動コン テナの前記データ処理手段を制御し後続の処理ステップに関連する情報を表示す る第3手段と、を有し、前記システムはさらに、 少なくとも1つの前記ワークステーションの第3手段と通信して対応するワーク ステーションのステータスに関する情報を受信し、該ワークステーションの前記 第2手段によって行われべき処理に関する情報を送信し、ワークステーションの 第1手段に収容された移動コンテナに設けられたデータ処理手段によってストア された情報を受信する中央処理ユニットと、前記移動コンテナを収容し、前記移 動コンテナに設けられたデータ処理手段と中央処理ユニットとの間の通信を与え 、前記データ処理手段によってストアされた情報のバックアップコピーを作成す る手段を有するストレージステーションとを備えたことを特徴とするシステム。
- 9.請求項8において、前記ストレージ手段が前記データ処理手段によっストア された情報を更新することを特徴とするシステム。
- 10.各データ処理手段が該データ処理手段に対し、該データ処理手段にストア されている情報を表示させる制御手段を備えたことを特徴とするシステム。
- 11.物品をストアし、搬送し、処理するシステムであって、複数の移動コンテ ナを備え、 各移動コンテナは複数の物品を収容する内部領域を有しており、前記システムは さらに、 前記各移動コンテナに設けられ、対応する移動コンテナ収容された物品に関する 情報を受信し、ストアし、送信し、表示するデータ処理手段と、複数のワークス テーションを備え、 各ワークステーションは物品の選択されたものを処理する手段を有し、前記シス テムはさらに、 前記各ワークステーションと通信して対応するワークステーションのステータス に関する情報を受信し、前記ワークステーションによって行われるべき処理に関 する情報をダウンロードし、移動コンテナに設けられたデータ処理手段によって ストアされた情報を受信する中央処理ユニットと、移動コンテナを収容し、移動 コンテナ上に設けられたデータ処理手段と中央処理ユニットとの間の通信を与え 、前記データ処理手段によってストアされた情報のバックアップコピーを作成す る手段とを備えたストレージステーションとを備えたことを特徴とするシステム 。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/458,767 US4974166A (en) | 1987-05-18 | 1989-12-29 | Processing systems with intelligent article tracking |
US458,767 | 1989-12-29 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001045585A Division JP3636669B2 (ja) | 1989-12-29 | 2001-02-21 | 情報を有する物品追跡機能を備えた処理システム |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05502754A true JPH05502754A (ja) | 1993-05-13 |
JP3197273B2 JP3197273B2 (ja) | 2001-08-13 |
Family
ID=23822002
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51309590A Expired - Fee Related JP3197273B2 (ja) | 1989-12-29 | 1990-09-18 | 情報を有する物品追跡機能を備えた処理システム |
JP2001045585A Expired - Fee Related JP3636669B2 (ja) | 1989-12-29 | 2001-02-21 | 情報を有する物品追跡機能を備えた処理システム |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001045585A Expired - Fee Related JP3636669B2 (ja) | 1989-12-29 | 2001-02-21 | 情報を有する物品追跡機能を備えた処理システム |
Country Status (7)
Country | Link |
---|---|
US (1) | US4974166A (ja) |
EP (1) | EP0507773B1 (ja) |
JP (2) | JP3197273B2 (ja) |
KR (1) | KR0178359B1 (ja) |
AT (1) | ATE177851T1 (ja) |
DE (1) | DE69033008T2 (ja) |
WO (1) | WO1991010202A1 (ja) |
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- 1990-09-18 DE DE69033008T patent/DE69033008T2/de not_active Expired - Fee Related
- 1990-09-18 KR KR1019920701527A patent/KR0178359B1/ko not_active IP Right Cessation
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Also Published As
Publication number | Publication date |
---|---|
US4974166A (en) | 1990-11-27 |
KR0178359B1 (ko) | 1999-05-15 |
ATE177851T1 (de) | 1999-04-15 |
WO1991010202A1 (en) | 1991-07-11 |
JP3636669B2 (ja) | 2005-04-06 |
JP2001310820A (ja) | 2001-11-06 |
DE69033008D1 (de) | 1999-04-22 |
EP0507773B1 (en) | 1999-03-17 |
KR920704233A (ko) | 1992-12-19 |
DE69033008T2 (de) | 1999-07-15 |
JP3197273B2 (ja) | 2001-08-13 |
EP0507773A4 (en) | 1992-10-28 |
EP0507773A1 (en) | 1992-10-14 |
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