JPH0463019B2 - - Google Patents
Info
- Publication number
- JPH0463019B2 JPH0463019B2 JP62323882A JP32388287A JPH0463019B2 JP H0463019 B2 JPH0463019 B2 JP H0463019B2 JP 62323882 A JP62323882 A JP 62323882A JP 32388287 A JP32388287 A JP 32388287A JP H0463019 B2 JPH0463019 B2 JP H0463019B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- optical system
- refractive index
- quartz glass
- purity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 35
- 230000003287 optical effect Effects 0.000 claims description 35
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 19
- 239000011521 glass Substances 0.000 claims description 5
- 238000002834 transmittance Methods 0.000 description 21
- 239000012535 impurity Substances 0.000 description 13
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 11
- 239000005049 silicon tetrachloride Substances 0.000 description 11
- 230000007423 decrease Effects 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 238000000206 photolithography Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000005304 optical glass Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000013094 purity test Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010436 fluorite Substances 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052756 noble gas Inorganic materials 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- -1 mercury halide Chemical class 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0305—Selection of materials for the tube or the coatings thereon
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Glass Compositions (AREA)
- Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32388287A JPH01167258A (ja) | 1987-12-23 | 1987-12-23 | レーザ光学系素体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32388287A JPH01167258A (ja) | 1987-12-23 | 1987-12-23 | レーザ光学系素体 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5323264A Division JP2558217B2 (ja) | 1993-11-29 | 1993-11-29 | 光リソグラフィ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01167258A JPH01167258A (ja) | 1989-06-30 |
| JPH0463019B2 true JPH0463019B2 (de) | 1992-10-08 |
Family
ID=18159654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32388287A Granted JPH01167258A (ja) | 1987-12-23 | 1987-12-23 | レーザ光学系素体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01167258A (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5410428A (en) * | 1990-10-30 | 1995-04-25 | Shin-Etsu Quartz Products Co. Ltd. | Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof |
| US8048169B2 (en) * | 2003-07-28 | 2011-11-01 | Baronova, Inc. | Pyloric valve obstructing devices and methods |
| CN103435260B (zh) * | 2013-08-30 | 2015-08-05 | 连云港市弘扬石英制品有限公司 | 一种无臭氧石英玻璃板及其制备方法 |
| JP7409636B2 (ja) | 2019-11-27 | 2024-01-09 | 株式会社住田光学ガラス | 多成分系酸化物ガラス、光学素子、光ファイバ、及び多成分系酸化物ガラスの製造方法 |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58125635A (ja) * | 1982-01-22 | 1983-07-26 | Furukawa Electric Co Ltd:The | 耐放射線光フアイバ |
| JPS6090853A (ja) * | 1983-10-22 | 1985-05-22 | Furukawa Electric Co Ltd:The | 光フアイバガラスの処理方法 |
| JPS611380A (ja) * | 1984-06-14 | 1986-01-07 | Ishihara Sangyo Kaisha Ltd | 新規微生物及びそれらを用いる光学活性化合物の製造方法 |
| JPS61251538A (ja) * | 1985-04-26 | 1986-11-08 | Chiyoe Yamanaka | 光フアイバ |
| JPS6238291A (ja) * | 1985-08-13 | 1987-02-19 | Nippon Steel Chem Co Ltd | 脱リン処理方法 |
| JPS6280606A (ja) * | 1985-10-04 | 1987-04-14 | Furukawa Electric Co Ltd:The | 単一モ−ド光フアイバ |
| JPS62270441A (ja) * | 1986-05-19 | 1987-11-24 | Furukawa Electric Co Ltd:The | 光伝送体 |
| JPH01196547A (ja) * | 1988-01-30 | 1989-08-08 | Dainippon Printing Co Ltd | 石英ガラス検査方法 |
-
1987
- 1987-12-23 JP JP32388287A patent/JPH01167258A/ja active Granted
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58125635A (ja) * | 1982-01-22 | 1983-07-26 | Furukawa Electric Co Ltd:The | 耐放射線光フアイバ |
| JPS6090853A (ja) * | 1983-10-22 | 1985-05-22 | Furukawa Electric Co Ltd:The | 光フアイバガラスの処理方法 |
| JPS611380A (ja) * | 1984-06-14 | 1986-01-07 | Ishihara Sangyo Kaisha Ltd | 新規微生物及びそれらを用いる光学活性化合物の製造方法 |
| JPS61251538A (ja) * | 1985-04-26 | 1986-11-08 | Chiyoe Yamanaka | 光フアイバ |
| JPS6238291A (ja) * | 1985-08-13 | 1987-02-19 | Nippon Steel Chem Co Ltd | 脱リン処理方法 |
| JPS6280606A (ja) * | 1985-10-04 | 1987-04-14 | Furukawa Electric Co Ltd:The | 単一モ−ド光フアイバ |
| JPS62270441A (ja) * | 1986-05-19 | 1987-11-24 | Furukawa Electric Co Ltd:The | 光伝送体 |
| JPH01196547A (ja) * | 1988-01-30 | 1989-08-08 | Dainippon Printing Co Ltd | 石英ガラス検査方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01167258A (ja) | 1989-06-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100392127B1 (ko) | 광리소그래피용석영유리,이를함유하는광학부재,이를사용한노광장치및그의제조방법 | |
| US5696624A (en) | Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production | |
| US5679125A (en) | Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range | |
| KR100291564B1 (ko) | 광리소그래피용광학부재및광학부재의평가방법 | |
| JPH0653593B2 (ja) | 合成シリカガラス光学体及びその製造方法 | |
| KR20010062343A (ko) | 투영노광장치 및 이 투영노광장치를 사용한 디바이스의제조방법 | |
| JPH07187684A (ja) | 石英ガラスの製造方法及びそれにより製造された 石英ガラス | |
| JP2770224B2 (ja) | 光リソグラフィ−用石英ガラス、それを含む光学部材、それを用いた露光装置、並びにその製造方法 | |
| JPH0388743A (ja) | 紫外線レーザ用合成シリカガラス光学体及びその製造方法 | |
| JPH0463019B2 (de) | ||
| JPH0627013B2 (ja) | 紫外線レーザ用合成シリカガラス光学体及びその製造方法 | |
| TW581747B (en) | Synthetic quartz glass optical member for ultraviolet light | |
| JPH01212247A (ja) | レーザ光学系母材の製造方法 | |
| JP2558217B2 (ja) | 光リソグラフィ装置 | |
| TW508477B (en) | Exposure apparatus, semiconductor device and photomask | |
| JPH0755845B2 (ja) | レーザ光用透過体 | |
| JP2566151B2 (ja) | レーザー光学系母材の製造方法 | |
| JPH0825773B2 (ja) | レーザー光学系の製造素体 | |
| JPH0912323A (ja) | 紫外線照射による緻密化が抑制された石英ガラス部材 | |
| JP3976083B2 (ja) | 回路パターン露光用光学系 | |
| JP2001302275A (ja) | 合成石英ガラス製光学部材 | |
| JP3245589B2 (ja) | リソグラフィ用レーザ露光装置 | |
| JPH11116248A (ja) | 合成石英ガラス部材 | |
| JPH035338A (ja) | レーザ光用光学部材 | |
| JP3187735B2 (ja) | リソグラフィ用レーザ露光装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20071008 Year of fee payment: 15 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081008 Year of fee payment: 16 |
|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081008 Year of fee payment: 16 |