JPH0451821B2 - - Google Patents

Info

Publication number
JPH0451821B2
JPH0451821B2 JP62287369A JP28736987A JPH0451821B2 JP H0451821 B2 JPH0451821 B2 JP H0451821B2 JP 62287369 A JP62287369 A JP 62287369A JP 28736987 A JP28736987 A JP 28736987A JP H0451821 B2 JPH0451821 B2 JP H0451821B2
Authority
JP
Japan
Prior art keywords
general formula
formula
quaternary ammonium
carbon atoms
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62287369A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01129250A (ja
Inventor
Shunren Cho
Taeko Sannomya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tama Kagaku Kogyo Co Ltd
Original Assignee
Tama Kagaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tama Kagaku Kogyo Co Ltd filed Critical Tama Kagaku Kogyo Co Ltd
Priority to JP28736987A priority Critical patent/JPH01129250A/ja
Publication of JPH01129250A publication Critical patent/JPH01129250A/ja
Publication of JPH0451821B2 publication Critical patent/JPH0451821B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP28736987A 1987-11-16 1987-11-16 ポジ型フォトレジスト用現像液 Granted JPH01129250A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28736987A JPH01129250A (ja) 1987-11-16 1987-11-16 ポジ型フォトレジスト用現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28736987A JPH01129250A (ja) 1987-11-16 1987-11-16 ポジ型フォトレジスト用現像液

Publications (2)

Publication Number Publication Date
JPH01129250A JPH01129250A (ja) 1989-05-22
JPH0451821B2 true JPH0451821B2 (enrdf_load_stackoverflow) 1992-08-20

Family

ID=17716470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28736987A Granted JPH01129250A (ja) 1987-11-16 1987-11-16 ポジ型フォトレジスト用現像液

Country Status (1)

Country Link
JP (1) JPH01129250A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999000707A1 (fr) * 1997-06-27 1999-01-07 Clariant International Ltd. Revelateur pour agents de reserve

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2543742B2 (ja) * 1988-04-07 1996-10-16 富士写真フイルム株式会社 ポジ型フオトレジスト用現像液
JP2579189B2 (ja) * 1988-05-13 1997-02-05 コニカ株式会社 感光性平版印刷版の現像液組成物
US6007970A (en) * 1992-02-07 1999-12-28 Canon Kabushiki Kaisha Lithographic developer containing surfactant
DE69321627T2 (de) * 1992-02-10 1999-04-22 Canon K.K., Tokio/Tokyo Lithographisches Verfahren
JPH0643631A (ja) * 1992-04-01 1994-02-18 Internatl Business Mach Corp <Ibm> 非イオン性ポリグリコールを含有するフォトレジスト
JP4547491B2 (ja) * 2000-04-28 2010-09-22 大日本印刷株式会社 顔料分散型感光性樹脂の現像方法、および光学的カラーフィルターの製造方法
JP4585136B2 (ja) * 2001-03-29 2010-11-24 メッツォペーパージャパン株式会社 巻取ロール押さえ装置および長尺材巻取り方法
JP4080784B2 (ja) 2002-04-26 2008-04-23 東京応化工業株式会社 レジスト用現像液及びそれを用いたレジストパターン形成方法、並びにレジスト用現像原液
JP4166167B2 (ja) 2004-02-05 2008-10-15 富士フイルム株式会社 感光性平版印刷版用現像液及び平版印刷版の製版方法
JP5053592B2 (ja) * 2006-08-10 2012-10-17 関東化学株式会社 ポジ型レジスト処理液組成物及び現像液
JP7340969B2 (ja) 2019-06-28 2023-09-08 東京応化工業株式会社 シリコンエッチング液、シリコンエッチング方法、及びシリコンフィン構造体の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR850008058A (ko) * 1984-05-16 1985-12-11 로이 에이취, 맷신길 양성 포토레지스트 전개제 및 전개방법
JPH063549B2 (ja) * 1984-12-25 1994-01-12 株式会社東芝 ポジ型フォトレジスト現像液組成物
JPS61167948A (ja) * 1985-01-21 1986-07-29 Mitsubishi Chem Ind Ltd ポジ型感光性組成物用現像液

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999000707A1 (fr) * 1997-06-27 1999-01-07 Clariant International Ltd. Revelateur pour agents de reserve

Also Published As

Publication number Publication date
JPH01129250A (ja) 1989-05-22

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