JPH0442804B2 - - Google Patents
Info
- Publication number
- JPH0442804B2 JPH0442804B2 JP3686485A JP3686485A JPH0442804B2 JP H0442804 B2 JPH0442804 B2 JP H0442804B2 JP 3686485 A JP3686485 A JP 3686485A JP 3686485 A JP3686485 A JP 3686485A JP H0442804 B2 JPH0442804 B2 JP H0442804B2
- Authority
- JP
- Japan
- Prior art keywords
- coil body
- conductive layer
- coil
- thin film
- insulating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- 239000004020 conductor Substances 0.000 claims description 6
- 239000010409 thin film Substances 0.000 description 28
- 239000010408 film Substances 0.000 description 20
- 238000005530 etching Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- 239000013067 intermediate product Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
- H01F41/041—Printed circuit coils
- H01F41/042—Printed circuit coils by thin film techniques
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Coils Or Transformers For Communication (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3686485A JPS60246605A (ja) | 1985-02-26 | 1985-02-26 | コイル体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3686485A JPS60246605A (ja) | 1985-02-26 | 1985-02-26 | コイル体 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2261278A Division JPS54115760A (en) | 1978-02-28 | 1978-02-28 | Method of producing multiilayer thin film inductance |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60246605A JPS60246605A (ja) | 1985-12-06 |
| JPH0442804B2 true JPH0442804B2 (fr) | 1992-07-14 |
Family
ID=12481648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3686485A Granted JPS60246605A (ja) | 1985-02-26 | 1985-02-26 | コイル体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60246605A (fr) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2615151B2 (ja) * | 1988-08-19 | 1997-05-28 | 株式会社村田製作所 | チップ型コイル及びその製造方法 |
| JP2002299121A (ja) * | 2001-04-02 | 2002-10-11 | Kawasaki Steel Corp | 平面磁気素子 |
| CN108303596B (zh) * | 2018-01-16 | 2024-07-02 | 宁波市计量测试研究院（宁波市衡器管理所、宁波新材料检验检测中心） | 一种利用薄膜沉积技术制作超薄线圈的方法及超薄线圈 |
-
1985
- 1985-02-26 JP JP3686485A patent/JPS60246605A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60246605A (ja) | 1985-12-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3686908B2 (ja) | 積層型コイル部品及びその製造方法 | |
| US3614554A (en) | Miniaturized thin film inductors for use in integrated circuits | |
| US6166422A (en) | Inductor with cobalt/nickel core for integrated circuit structure with high inductance and high Q-factor | |
| JP4200631B2 (ja) | オンチップ・コイルとその製造方法 | |
| US7612428B2 (en) | Inductor fabricated with dry film resist and cavity and method of fabricating the inductor | |
| JP2002525869A (ja) | 磁気コアを有するコイルが設けられている表面を有する半導体基体を備えた半導体デバイスの製造方法 | |
| JPH0442804B2 (fr) | ||
| JP3319449B2 (ja) | 積層インダクタ及びその製造方法 | |
| JPS60136363A (ja) | 半導体装置 | |
| US4922323A (en) | Hermetically sealed multilayer electrical feedthru | |
| JPH0729732A (ja) | 薄膜磁気素子 | |
| JPH04221812A (ja) | 高周波用薄膜トランス | |
| JP2938341B2 (ja) | 同軸構造の配線の形成方法 | |
| JPH08124745A (ja) | 薄膜回路およびその製造方法 | |
| JPS5915178B2 (ja) | 配線構造及び方法 | |
| JPS63171412A (ja) | 電気的接続を簡単にする磁気ヘッドの製造方法 | |
| JPS6373606A (ja) | 厚膜インダクタの製造方法 | |
| JPS5935165B2 (ja) | 多層薄膜コイルの製法 | |
| JP7533368B2 (ja) | インダクタ部品 | |
| JP2000182873A (ja) | チップインダクタの製造方法およびチップインダクタ | |
| JPH10270248A (ja) | スパイラルインダクタ | |
| JPH03241768A (ja) | 半導体装置の製造方法 | |
| JPH03104190A (ja) | 多層配線板およびその製造方法 | |
| JPS5943689Y2 (ja) | 積層トランス | |
| JPH07106514A (ja) | 半導体集積回路装置 |