JPH0424694B2 - - Google Patents

Info

Publication number
JPH0424694B2
JPH0424694B2 JP59248284A JP24828484A JPH0424694B2 JP H0424694 B2 JPH0424694 B2 JP H0424694B2 JP 59248284 A JP59248284 A JP 59248284A JP 24828484 A JP24828484 A JP 24828484A JP H0424694 B2 JPH0424694 B2 JP H0424694B2
Authority
JP
Japan
Prior art keywords
group
allyl
compound
photoresist
vinyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59248284A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60133445A (ja
Inventor
Harutonaa Harutomuuto
Yoahimu Meremu Hansu
Kurutsuku Rudorufu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS60133445A publication Critical patent/JPS60133445A/ja
Publication of JPH0424694B2 publication Critical patent/JPH0424694B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP59248284A 1983-11-26 1984-11-26 ホトレジスト組成物 Granted JPS60133445A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19833342851 DE3342851A1 (de) 1983-11-26 1983-11-26 Fotolacke
DE3342851.4 1983-11-26

Publications (2)

Publication Number Publication Date
JPS60133445A JPS60133445A (ja) 1985-07-16
JPH0424694B2 true JPH0424694B2 (en, 2012) 1992-04-27

Family

ID=6215357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59248284A Granted JPS60133445A (ja) 1983-11-26 1984-11-26 ホトレジスト組成物

Country Status (5)

Country Link
EP (1) EP0143380B1 (en, 2012)
JP (1) JPS60133445A (en, 2012)
KR (1) KR910007246B1 (en, 2012)
AT (1) ATE40847T1 (en, 2012)
DE (2) DE3342851A1 (en, 2012)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0188205B1 (de) * 1985-01-15 1988-06-22 Ciba-Geigy Ag Polyamidester-Fotoresist-Formulierungen gesteigerter Empfindlichkeit
DE4328839C2 (de) * 1993-08-27 1997-12-04 Basf Lacke & Farben N-(4-Azidosulfonylphenyl)-tetrahydrophthalimid sowie die Verwendung von N-(4-Azidosulfonylphenyl)-phthalimid und/oder N-(Azidosulfonylphenyl)-tetrahydrophthalimid
JP3425311B2 (ja) * 1996-03-04 2003-07-14 株式会社東芝 ネガ型感光性ポリマー樹脂組成物、これを用いたパターン形成方法、および電子部品
EP3066088B1 (en) 2013-11-07 2017-12-06 Akzo Nobel Chemicals International B.V. Cyclic carbonate azide
EP3066151A1 (en) 2013-11-07 2016-09-14 Akzo Nobel Chemicals International B.V. Process for modifying ethylene-based polymers and copolymers
WO2015067531A1 (en) 2013-11-07 2015-05-14 Akzo Nobel Chemicals International B.V. Process for modifying polymers
US10100133B2 (en) 2015-04-24 2018-10-16 Akzo Nobel Chemicals International B.V. Process for functionalising polymers
WO2016170018A1 (en) 2015-04-24 2016-10-27 Akzo Nobel Chemicals International B.V. Process for modifying polymers
JP2018146964A (ja) * 2017-03-08 2018-09-20 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、パターン硬化物の製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜及び電子部品

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6012622B2 (ja) * 1977-12-27 1985-04-02 東レ株式会社 ポリアミド系感光性樹脂印刷版用組成物
DE2919841A1 (de) * 1979-05-16 1980-11-20 Siemens Ag Verfahren zur phototechnischen herstellung von reliefstrukturen
DE2919823A1 (de) * 1979-05-16 1980-11-20 Siemens Ag N-azidosulfonylaryl-maleinimide sowie deren verwendung
JPS5732441A (en) * 1980-08-06 1982-02-22 Unitika Ltd Photosensitive resin composition
US4329419A (en) * 1980-09-03 1982-05-11 E. I. Du Pont De Nemours And Company Polymeric heat resistant photopolymerizable composition for semiconductors and capacitors
DE3233912A1 (de) * 1982-09-13 1984-03-15 Merck Patent Gmbh, 6100 Darmstadt Fotolacke zur ausbildung von reliefstrukturen aus hochwaermebestaendigen polymeren

Also Published As

Publication number Publication date
EP0143380A3 (en) 1986-07-16
JPS60133445A (ja) 1985-07-16
DE3476779D1 (en) 1989-03-23
DE3342851A1 (de) 1985-06-05
KR850003992A (ko) 1985-06-29
EP0143380B1 (de) 1989-02-15
EP0143380A2 (de) 1985-06-05
KR910007246B1 (ko) 1991-09-24
ATE40847T1 (de) 1989-03-15

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