KR850003992A - 광 저항 조성물 - Google Patents

광 저항 조성물 Download PDF

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Publication number
KR850003992A
KR850003992A KR1019840007391A KR840007391A KR850003992A KR 850003992 A KR850003992 A KR 850003992A KR 1019840007391 A KR1019840007391 A KR 1019840007391A KR 840007391 A KR840007391 A KR 840007391A KR 850003992 A KR850003992 A KR 850003992A
Authority
KR
South Korea
Prior art keywords
photoresist composition
group
vinyl
relief structure
photoresist
Prior art date
Application number
KR1019840007391A
Other languages
English (en)
Other versions
KR910007246B1 (ko
Inventor
헤르트네르 하르트무트 (외 2)
Original Assignee
감스, 나우만
메르크 파텐트 게젤샤프트 미트 베쉬랭크터 하프퉁
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 감스, 나우만, 메르크 파텐트 게젤샤프트 미트 베쉬랭크터 하프퉁 filed Critical 감스, 나우만
Publication of KR850003992A publication Critical patent/KR850003992A/ko
Application granted granted Critical
Publication of KR910007246B1 publication Critical patent/KR910007246B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

내용 없음

Description

광 저항 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (4)

  1. 부가적으로 공단량체로서 비닐 또는 알릴기가 작용기를 통하여 결합된 적어도 하나의 공중합할 수 있는 방사-반응성 비닐 또는 알릴 화합물과 광개시제로서 적어도 하나의 N-아지도 설포닐알릴말레이미드 형태의 화합물을 포함하는 것을 특징으로 하는 카르복실기에 에스테르-결합을 통하여 결합된 방사-반응성 라디칼을 갖는 용해성 폴리아마이드 에스테르 전중합체가 포함된 높은 열-저항 중합체로 구성되는 릴리프 구조의 제조를 위한 광저항-조성물.
  2. 제1항에 있어서, 공단량체에 비닐 또는 알릴기가 산소, 황 또는 질소원자 또는카르보닐, 카르복실, SI, 또는 SO2기를 통하여 결합된 것을 특징으로 하는 광 저항 조성물.
  3. 제1항과 2항에 있어서, N-(4-아지도설포닐페닐)-말레이미드가 광개시제로서 존재하는 것을 특징으로 하는 광 저항-조성물.
  4. 제1-3항에 따른 광 저항-조성물이 적용되는 것을 특징으로 하는 광 저항-조성물로 코팅하고, 층을 건조하여 상을 노출시키고 조사되지 않은 층의 부분을 제거하고 필요하다면 얻어진 릴리프 구조를 가열하는 것에 의한 높은 열-저항중합체로 구성되는 릴리프구조를 제조하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019840007391A 1983-11-26 1984-11-26 감광성 내식막 조성물 KR910007246B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DEP3342851.4 1983-11-26
DE3342851 1983-11-26
DE19833342851 DE3342851A1 (de) 1983-11-26 1983-11-26 Fotolacke

Publications (2)

Publication Number Publication Date
KR850003992A true KR850003992A (ko) 1985-06-29
KR910007246B1 KR910007246B1 (ko) 1991-09-24

Family

ID=6215357

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840007391A KR910007246B1 (ko) 1983-11-26 1984-11-26 감광성 내식막 조성물

Country Status (5)

Country Link
EP (1) EP0143380B1 (ko)
JP (1) JPS60133445A (ko)
KR (1) KR910007246B1 (ko)
AT (1) ATE40847T1 (ko)
DE (2) DE3342851A1 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0188205B1 (de) * 1985-01-15 1988-06-22 Ciba-Geigy Ag Polyamidester-Fotoresist-Formulierungen gesteigerter Empfindlichkeit
DE4328839C2 (de) * 1993-08-27 1997-12-04 Basf Lacke & Farben N-(4-Azidosulfonylphenyl)-tetrahydrophthalimid sowie die Verwendung von N-(4-Azidosulfonylphenyl)-phthalimid und/oder N-(Azidosulfonylphenyl)-tetrahydrophthalimid
JP3425311B2 (ja) * 1996-03-04 2003-07-14 株式会社東芝 ネガ型感光性ポリマー樹脂組成物、これを用いたパターン形成方法、および電子部品
WO2015067533A1 (en) 2013-11-07 2015-05-14 Akzo Nobel Chemicals International B.V. Process for modifying ethylene-based polymers and copolymers
MX2016005601A (es) 2013-11-07 2016-07-21 Akzo Nobel Chemicals Int Bv Proceso para modificar polimeros.
RU2016121180A (ru) 2013-11-07 2017-12-08 Акцо Нобель Кемикалз Интернэшнл Б.В. Азид циклического карбоната
US10100133B2 (en) 2015-04-24 2018-10-16 Akzo Nobel Chemicals International B.V. Process for functionalising polymers
US10093762B2 (en) 2015-04-24 2018-10-09 Akzo Nobel Chemicals International B.V. Process for modifying polymers
JP2018146964A (ja) * 2017-03-08 2018-09-20 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、パターン硬化物の製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜及び電子部品

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6012622B2 (ja) * 1977-12-27 1985-04-02 東レ株式会社 ポリアミド系感光性樹脂印刷版用組成物
DE2919823A1 (de) * 1979-05-16 1980-11-20 Siemens Ag N-azidosulfonylaryl-maleinimide sowie deren verwendung
DE2919841A1 (de) * 1979-05-16 1980-11-20 Siemens Ag Verfahren zur phototechnischen herstellung von reliefstrukturen
JPS5732441A (en) * 1980-08-06 1982-02-22 Unitika Ltd Photosensitive resin composition
US4329419A (en) * 1980-09-03 1982-05-11 E. I. Du Pont De Nemours And Company Polymeric heat resistant photopolymerizable composition for semiconductors and capacitors
DE3233912A1 (de) * 1982-09-13 1984-03-15 Merck Patent Gmbh, 6100 Darmstadt Fotolacke zur ausbildung von reliefstrukturen aus hochwaermebestaendigen polymeren

Also Published As

Publication number Publication date
EP0143380A2 (de) 1985-06-05
EP0143380A3 (en) 1986-07-16
ATE40847T1 (de) 1989-03-15
JPS60133445A (ja) 1985-07-16
JPH0424694B2 (ko) 1992-04-27
EP0143380B1 (de) 1989-02-15
DE3476779D1 (en) 1989-03-23
KR910007246B1 (ko) 1991-09-24
DE3342851A1 (de) 1985-06-05

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