JPH0326535B2 - - Google Patents
Info
- Publication number
- JPH0326535B2 JPH0326535B2 JP58119097A JP11909783A JPH0326535B2 JP H0326535 B2 JPH0326535 B2 JP H0326535B2 JP 58119097 A JP58119097 A JP 58119097A JP 11909783 A JP11909783 A JP 11909783A JP H0326535 B2 JPH0326535 B2 JP H0326535B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- layer
- electrode
- conductivity type
- band gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/01—Manufacture or treatment
- H10D10/021—Manufacture or treatment of heterojunction BJTs [HBT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/80—Heterojunction BJTs
- H10D10/821—Vertical heterojunction BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/82—Heterojunctions
- H10D62/824—Heterojunctions comprising only Group III-V materials heterojunctions, e.g. GaN/AlGaN heterojunctions
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58119097A JPS6010776A (ja) | 1983-06-30 | 1983-06-30 | バイポーラトランジスタの製造方法 |
| DE8484304305T DE3466322D1 (en) | 1983-06-30 | 1984-06-26 | Process for fabricating bipolar transistor |
| EP84304305A EP0130774B1 (en) | 1983-06-30 | 1984-06-26 | Process for fabricating bipolar transistor |
| US06/781,787 US4617724A (en) | 1983-06-30 | 1985-09-30 | Process for fabricating heterojunction bipolar transistor with low base resistance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58119097A JPS6010776A (ja) | 1983-06-30 | 1983-06-30 | バイポーラトランジスタの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6010776A JPS6010776A (ja) | 1985-01-19 |
| JPH0326535B2 true JPH0326535B2 (enEXAMPLES) | 1991-04-11 |
Family
ID=14752825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58119097A Granted JPS6010776A (ja) | 1983-06-30 | 1983-06-30 | バイポーラトランジスタの製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0130774B1 (enEXAMPLES) |
| JP (1) | JPS6010776A (enEXAMPLES) |
| DE (1) | DE3466322D1 (enEXAMPLES) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61188966A (ja) * | 1985-02-16 | 1986-08-22 | Fujitsu Ltd | 高速半導体装置の製造方法 |
| JPS61198776A (ja) * | 1985-02-28 | 1986-09-03 | Fujitsu Ltd | ヘテロ接合バイポ−ラトランジスタおよびその製造方法 |
| GB8507624D0 (en) * | 1985-03-23 | 1985-05-01 | Standard Telephones Cables Ltd | Semiconductor devices |
| EP0197424B1 (en) * | 1985-03-25 | 1993-06-02 | Nec Corporation | Process of fabricating a heterojunction bipolar transistor |
| GB2188479B (en) * | 1986-03-26 | 1990-05-23 | Stc Plc | Semiconductor devices |
| US4872040A (en) * | 1987-04-23 | 1989-10-03 | International Business Machines Corporation | Self-aligned heterojunction transistor |
| JP2971246B2 (ja) * | 1992-04-15 | 1999-11-02 | 株式会社東芝 | ヘテロバイポーラトランジスタの製造方法 |
| EP0654406B1 (en) | 1993-11-22 | 1999-06-23 | Kuraray Chemical Co., Ltd. | Freshness keeping sheet |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53115181A (en) * | 1977-03-18 | 1978-10-07 | Hitachi Ltd | Production of semiconductor device |
| FR2436502A1 (fr) * | 1978-09-12 | 1980-04-11 | Ankri David | Transistors bipolaires a heterojonction de structure plane et leur procede de fabrication |
-
1983
- 1983-06-30 JP JP58119097A patent/JPS6010776A/ja active Granted
-
1984
- 1984-06-26 EP EP84304305A patent/EP0130774B1/en not_active Expired
- 1984-06-26 DE DE8484304305T patent/DE3466322D1/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| EP0130774A1 (en) | 1985-01-09 |
| DE3466322D1 (en) | 1987-10-22 |
| JPS6010776A (ja) | 1985-01-19 |
| EP0130774B1 (en) | 1987-09-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4996166A (en) | Process for fabricating a heterojunction bipolar transistor | |
| JPS62189762A (ja) | 3−5族化合物基体上に半導体装置を製造する方法 | |
| JPS59207667A (ja) | 半導体装置 | |
| JPH023240A (ja) | ヘテロ接合バイポーラトランジスタ形の半導体デバイスの製造方法 | |
| JPS5891682A (ja) | 半導体装置 | |
| JP3262056B2 (ja) | バイポーラトランジスタとその製造方法 | |
| JPH0326535B2 (enEXAMPLES) | ||
| JPS6356710B2 (enEXAMPLES) | ||
| EP0851510A2 (en) | Field effect transistor | |
| JPS59181060A (ja) | 半導体装置 | |
| JPS63314866A (ja) | バイボ−ラ・トランジスタ | |
| JPS60160664A (ja) | 半導体装置の製造方法 | |
| JP2570770B2 (ja) | バイポーラ・トランジスタ | |
| JP2568680B2 (ja) | 化合物半導体装置の製造方法 | |
| JPS61276318A (ja) | 化合物半導体装置の製造方法 | |
| JPS6010785A (ja) | 電界効果トランジスタおよびその製造方法 | |
| JPS63115384A (ja) | 半導体装置の製造方法 | |
| JPS6143443A (ja) | 半導体装置の製造方法 | |
| JPS63252475A (ja) | ヘテロ接合型バイポ−ラトランジスタ | |
| JPS61123175A (ja) | ヘテロ接合パイポ−ラトランジスタの製造方法 | |
| JPH0327537A (ja) | 変調ドープ型電界効果トランジスタ | |
| JPS6251269A (ja) | 半導体装置 | |
| JPH0439774B2 (enEXAMPLES) | ||
| JPS59167060A (ja) | ホットエレクトロントランジスタ | |
| JPH084141B2 (ja) | 電界効果トランジスタ |