JPH0316686B2 - - Google Patents
Info
- Publication number
- JPH0316686B2 JPH0316686B2 JP13353984A JP13353984A JPH0316686B2 JP H0316686 B2 JPH0316686 B2 JP H0316686B2 JP 13353984 A JP13353984 A JP 13353984A JP 13353984 A JP13353984 A JP 13353984A JP H0316686 B2 JPH0316686 B2 JP H0316686B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- insulating layer
- layer
- pattern
- coil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 55
- 239000010408 film Substances 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 19
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 6
- 238000007747 plating Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 3
- 238000000059 patterning Methods 0.000 claims description 2
- 238000010030 laminating Methods 0.000 claims 1
- 239000011347 resin Substances 0.000 description 19
- 229920005989 resin Polymers 0.000 description 19
- 239000010949 copper Substances 0.000 description 11
- 238000004544 sputter deposition Methods 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 239000004020 conductor Substances 0.000 description 5
- 229910000889 permalloy Inorganic materials 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910003271 Ni-Fe Inorganic materials 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000000992 sputter etching Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13353984A JPS6111915A (ja) | 1984-06-27 | 1984-06-27 | 薄膜磁気ヘツドの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13353984A JPS6111915A (ja) | 1984-06-27 | 1984-06-27 | 薄膜磁気ヘツドの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6111915A JPS6111915A (ja) | 1986-01-20 |
| JPH0316686B2 true JPH0316686B2 (de) | 1991-03-06 |
Family
ID=15107174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13353984A Granted JPS6111915A (ja) | 1984-06-27 | 1984-06-27 | 薄膜磁気ヘツドの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6111915A (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6333830B2 (en) * | 1998-11-09 | 2001-12-25 | Read-Rite Corporation | Low resistance coil structure for high speed writer |
-
1984
- 1984-06-27 JP JP13353984A patent/JPS6111915A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6111915A (ja) | 1986-01-20 |
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