JPH02765B2 - - Google Patents
Info
- Publication number
- JPH02765B2 JPH02765B2 JP56121423A JP12142381A JPH02765B2 JP H02765 B2 JPH02765 B2 JP H02765B2 JP 56121423 A JP56121423 A JP 56121423A JP 12142381 A JP12142381 A JP 12142381A JP H02765 B2 JPH02765 B2 JP H02765B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- thin film
- magnetic
- insulating layer
- nonmagnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 16
- 239000004020 conductor Substances 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 238000009713 electroplating Methods 0.000 claims description 7
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 4
- 229910003271 Ni-Fe Inorganic materials 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 238000001020 plasma etching Methods 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 4
- 230000000873 masking effect Effects 0.000 claims 2
- 238000004804 winding Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 70
- 238000007747 plating Methods 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56121423A JPS5823316A (ja) | 1981-08-04 | 1981-08-04 | 薄膜磁気ヘツドの製造方法 |
| US06/405,059 US4402801A (en) | 1981-08-04 | 1982-08-04 | Method for manufacturing thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56121423A JPS5823316A (ja) | 1981-08-04 | 1981-08-04 | 薄膜磁気ヘツドの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5823316A JPS5823316A (ja) | 1983-02-12 |
| JPH02765B2 true JPH02765B2 (en:Method) | 1990-01-09 |
Family
ID=14810771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56121423A Granted JPS5823316A (ja) | 1981-08-04 | 1981-08-04 | 薄膜磁気ヘツドの製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4402801A (en:Method) |
| JP (1) | JPS5823316A (en:Method) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4391849A (en) * | 1982-04-12 | 1983-07-05 | Memorex Corporation | Metal oxide patterns with planar surface |
| JPS60177417A (ja) * | 1984-02-23 | 1985-09-11 | Seiko Epson Corp | 薄膜磁気ヘツドの製造方法 |
| EP0218445A3 (en) * | 1985-10-01 | 1989-08-30 | Sony Corporation | Thin film magnetic heads |
| FR2604021B1 (fr) * | 1986-09-17 | 1988-10-28 | Commissariat Energie Atomique | Procede de realisation de tetes magnetiques en couches minces et a structure planaire et tete obtenue par ce procede |
| FR2606197B1 (fr) * | 1986-10-31 | 1988-12-02 | Commissariat Energie Atomique | Procede de realisation d'une tete magnetique permettant de simplifier la realisation des connexions electriques |
| EP0351048A3 (en) * | 1988-07-11 | 1992-04-08 | Digital Equipment Corporation | Recording head to optimize high density recording |
| US5068959A (en) * | 1988-07-11 | 1991-12-03 | Digital Equipment Corporation | Method of manufacturing a thin film head |
| NL9000546A (nl) * | 1990-03-09 | 1991-10-01 | Philips Nv | Werkwijze voor het vervaardigen van een dunnefilm magneetkop alsmede een dunnefilm magneetkop vervaardigbaar volgens de werkwijze. |
| US5157570A (en) * | 1990-06-29 | 1992-10-20 | Digital Equipment Corporation | Magnetic pole configuration for high density thin film recording head |
| FR2716996B1 (fr) | 1994-03-07 | 1996-04-05 | Commissariat Energie Atomique | Tête magnétique verticale et son procédé de réalisation. |
| JP3576783B2 (ja) * | 1997-12-26 | 2004-10-13 | Ｔｄｋ株式会社 | 薄膜磁気ヘッドの製造方法 |
| US6473960B1 (en) | 2000-01-07 | 2002-11-05 | Storage Technology Corporation | Method of making nitrided active elements |
| JP3464988B2 (ja) * | 2001-09-21 | 2003-11-10 | 株式会社東芝 | ディスク装置、ディスク装置に組み込まれたヨーク、およびヨークの製造方法 |
| US7263762B2 (en) * | 2004-09-30 | 2007-09-04 | Hitachi Global Storage Technologies | Method for reducing pole height loss in the formation of a write pole for a magnetic write head |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3317408A (en) * | 1963-06-11 | 1967-05-02 | North American Aviation Inc | Method of making a magnetic core storage device |
| FR1469185A (fr) * | 1965-12-30 | 1967-02-10 | Csf | Intégration d'éléments magnétiques câblés |
| US3764486A (en) * | 1972-01-03 | 1973-10-09 | Buckbee Mears Co | Method of making memory planes |
-
1981
- 1981-08-04 JP JP56121423A patent/JPS5823316A/ja active Granted
-
1982
- 1982-08-04 US US06/405,059 patent/US4402801A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5823316A (ja) | 1983-02-12 |
| US4402801A (en) | 1983-09-06 |
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