JPH023495B2 - - Google Patents

Info

Publication number
JPH023495B2
JPH023495B2 JP56027769A JP2776981A JPH023495B2 JP H023495 B2 JPH023495 B2 JP H023495B2 JP 56027769 A JP56027769 A JP 56027769A JP 2776981 A JP2776981 A JP 2776981A JP H023495 B2 JPH023495 B2 JP H023495B2
Authority
JP
Japan
Prior art keywords
sample
electron beam
negative resist
post
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56027769A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57142637A (en
Inventor
Koichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2776981A priority Critical patent/JPS57142637A/ja
Publication of JPS57142637A publication Critical patent/JPS57142637A/ja
Publication of JPH023495B2 publication Critical patent/JPH023495B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electron Beam Exposure (AREA)
JP2776981A 1981-02-27 1981-02-27 Treatment of negative type resist Granted JPS57142637A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2776981A JPS57142637A (en) 1981-02-27 1981-02-27 Treatment of negative type resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2776981A JPS57142637A (en) 1981-02-27 1981-02-27 Treatment of negative type resist

Publications (2)

Publication Number Publication Date
JPS57142637A JPS57142637A (en) 1982-09-03
JPH023495B2 true JPH023495B2 (enrdf_load_stackoverflow) 1990-01-23

Family

ID=12230184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2776981A Granted JPS57142637A (en) 1981-02-27 1981-02-27 Treatment of negative type resist

Country Status (1)

Country Link
JP (1) JPS57142637A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS589141A (ja) * 1981-07-10 1983-01-19 Nippon Telegr & Teleph Corp <Ntt> 放射線感応性ネガ形レジストの感度向上方法
JP2538052B2 (ja) * 1989-04-28 1996-09-25 松下電器産業株式会社 レジスト重合促進加熱方法および装置
US5962196A (en) * 1991-04-08 1999-10-05 Intel Corporation Deep ultraviolet light photoresist processing
JP2682437B2 (ja) * 1994-04-22 1997-11-26 日本電気株式会社 露光方法およびその装置
JP2002343708A (ja) * 2001-05-21 2002-11-29 Toshiba Corp 基板処理装置および熱処理方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5691425A (en) * 1979-12-25 1981-07-24 Seiko Epson Corp Resist heat treatment device
JPS6013432B2 (ja) * 1980-07-25 1985-04-06 日本電信電話株式会社 Ａｌ又はＡｌ合金パタ−ンの形成方法
JPS5727030A (en) * 1980-07-25 1982-02-13 Nippon Telegr & Teleph Corp <Ntt> Formation of resist pattern

Also Published As

Publication number Publication date
JPS57142637A (en) 1982-09-03

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