JPS57142637A - Treatment of negative type resist - Google Patents

Treatment of negative type resist

Info

Publication number
JPS57142637A
JPS57142637A JP2776981A JP2776981A JPS57142637A JP S57142637 A JPS57142637 A JP S57142637A JP 2776981 A JP2776981 A JP 2776981A JP 2776981 A JP2776981 A JP 2776981A JP S57142637 A JPS57142637 A JP S57142637A
Authority
JP
Japan
Prior art keywords
sample
chamber
valve
negative type
type resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2776981A
Other languages
English (en)
Japanese (ja)
Other versions
JPH023495B2 (enrdf_load_stackoverflow
Inventor
Koichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2776981A priority Critical patent/JPS57142637A/ja
Publication of JPS57142637A publication Critical patent/JPS57142637A/ja
Publication of JPH023495B2 publication Critical patent/JPH023495B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electron Beam Exposure (AREA)
JP2776981A 1981-02-27 1981-02-27 Treatment of negative type resist Granted JPS57142637A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2776981A JPS57142637A (en) 1981-02-27 1981-02-27 Treatment of negative type resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2776981A JPS57142637A (en) 1981-02-27 1981-02-27 Treatment of negative type resist

Publications (2)

Publication Number Publication Date
JPS57142637A true JPS57142637A (en) 1982-09-03
JPH023495B2 JPH023495B2 (enrdf_load_stackoverflow) 1990-01-23

Family

ID=12230184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2776981A Granted JPS57142637A (en) 1981-02-27 1981-02-27 Treatment of negative type resist

Country Status (1)

Country Link
JP (1) JPS57142637A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS589141A (ja) * 1981-07-10 1983-01-19 Nippon Telegr & Teleph Corp <Ntt> 放射線感応性ネガ形レジストの感度向上方法
JPH02287456A (ja) * 1989-04-28 1990-11-27 Matsushita Electric Ind Co Ltd レジスト重合促進加熱方法および装置
JPH07297096A (ja) * 1994-04-22 1995-11-10 Nec Corp 露光方法およびその装置
US5962196A (en) * 1991-04-08 1999-10-05 Intel Corporation Deep ultraviolet light photoresist processing
JP2002343708A (ja) * 2001-05-21 2002-11-29 Toshiba Corp 基板処理装置および熱処理方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5691425A (en) * 1979-12-25 1981-07-24 Seiko Epson Corp Resist heat treatment device
JPS5726170A (en) * 1980-07-25 1982-02-12 Nippon Telegr & Teleph Corp <Ntt> Formation of al or al alloy pattern
JPS5727030A (en) * 1980-07-25 1982-02-13 Nippon Telegr & Teleph Corp <Ntt> Formation of resist pattern

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5691425A (en) * 1979-12-25 1981-07-24 Seiko Epson Corp Resist heat treatment device
JPS5726170A (en) * 1980-07-25 1982-02-12 Nippon Telegr & Teleph Corp <Ntt> Formation of al or al alloy pattern
JPS5727030A (en) * 1980-07-25 1982-02-13 Nippon Telegr & Teleph Corp <Ntt> Formation of resist pattern

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS589141A (ja) * 1981-07-10 1983-01-19 Nippon Telegr & Teleph Corp <Ntt> 放射線感応性ネガ形レジストの感度向上方法
JPH02287456A (ja) * 1989-04-28 1990-11-27 Matsushita Electric Ind Co Ltd レジスト重合促進加熱方法および装置
US5962196A (en) * 1991-04-08 1999-10-05 Intel Corporation Deep ultraviolet light photoresist processing
JPH07297096A (ja) * 1994-04-22 1995-11-10 Nec Corp 露光方法およびその装置
JP2002343708A (ja) * 2001-05-21 2002-11-29 Toshiba Corp 基板処理装置および熱処理方法

Also Published As

Publication number Publication date
JPH023495B2 (enrdf_load_stackoverflow) 1990-01-23

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