JP7458825B2 - パッケージおよび半導体装置 - Google Patents
パッケージおよび半導体装置 Download PDFInfo
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- JP7458825B2 JP7458825B2 JP2020033756A JP2020033756A JP7458825B2 JP 7458825 B2 JP7458825 B2 JP 7458825B2 JP 2020033756 A JP2020033756 A JP 2020033756A JP 2020033756 A JP2020033756 A JP 2020033756A JP 7458825 B2 JP7458825 B2 JP 7458825B2
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- 239000004065 semiconductor Substances 0.000 title claims description 20
- 239000000463 material Substances 0.000 claims description 34
- 230000002093 peripheral effect Effects 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 description 15
- 239000000853 adhesive Substances 0.000 description 11
- 230000001070 adhesive effect Effects 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 238000003892 spreading Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000013007 heat curing Methods 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000011231 conductive filler Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
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- H01L23/053—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having an insulating or insulated base as a mounting for the semiconductor body
- H01L23/055—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having an insulating or insulated base as a mounting for the semiconductor body the leads having a passage through the base
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49838—Geometry or layout
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- H01L2224/131—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H01L2224/131—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/13138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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- H01L2224/131—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/16227—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bond pad of the item
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- H01L2224/85463—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
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- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H01L2924/16195—Flat cap [not enclosing an internal cavity]
Description
Claims (23)
- 電子デバイスを搭載するための基材を備えるパッケージであって、
前記パッケージの第1面には、電極と、前記基材に設けられた凹部と、が配され、
前記基材は、前記第1面とは反対の側の第2面と、第3面と、を有し、
前記第1面は、前記第2面と前記第3面との間に位置し、
前記電極は、前記第2面の側とは反対の側の面である電極表面と、前記第1面と前記第2面との間の仮想的な平面に交差する方向に沿った面である電極側面と、を有し、
前記凹部は、前記平面に交差する方向に沿った面である凹部側面と、前記凹部側面よりも前記第2面の側に位置する凹部底面と、を有し、
前記電子デバイスを搭載する中央上面は、前記凹部底面よりも前記第1面の側に位置し、
前記電極表面は、前記凹部底面よりも前記平面から離れた位置に配され、
前記電極側面が、前記凹部側面に連続しており、
前記凹部は、前記凹部側面に対向するとともに前記第3面に連続する第2の側面をさらに備え、
前記平面から前記凹部側面と前記電極側面との境界までの前記平面と交差する方向の距離が、前記平面から前記第2の側面の一部までの前記平面と交差する方向の距離よりも長いことを特徴とするパッケージ。 - 電子デバイスを搭載するためのキャビティが設けられた基材を備えるパッケージであって、
前記パッケージの前記キャビティ内に配された第1面には、電極と、前記基材に設けられた凹部と、前記第1面に対する正射影において前記電極と前記凹部との間に位置する、前記基材で構成された中間部と、が配され、
前記基材は、前記第1面とは反対の側の第2面と、第3面と、第4面と、を有し、
前記第1面は、前記第2面と前記第3面との間に位置し、
前記第3面は、前記第1面と前記第4面との間に位置し、
前記第4面は、前記電子デバイスを覆うカバー部材を配するために、前記キャビティを取り囲むように配され、
前記電極は、前記第2面の側とは反対の側の面である電極表面と、前記第1面と前記第2面との間の仮想的な平面に交差する方向に沿った面である電極側面と、を有し、
前記凹部は、前記平面に交差する方向に沿った面である凹部側面と、前記凹部側面よりも前記第2面の側に位置する凹部底面と、を有し、
前記中間部は、前記第2面の側とは反対の側の面である中間上面を有し、
前記電極表面および前記中間上面は、前記凹部底面よりも前記平面から離れた位置に配され、
前記平面から前記中間上面までの距離が、前記平面から前記電極表面までの距離を超えず、
前記電極から前記凹部までの距離が、前記電極と前記凹部とを結ぶ方向における前記電極の長さよりも小さく、
前記凹部は、前記凹部側面に対向するとともに前記第3面に連続する第2の側面をさらに備えていることを特徴とするパッケージ。 - 前記基材が、中央部および周辺部を有し、
前記電極および前記凹部は、前記周辺部に配され、
前記凹部が、前記電極と前記中央部との間に配されることを特徴とする請求項2に記載のパッケージ。 - 前記中央部は、前記第2面の側とは反対の側の面である中央上面を有し、
前記平面から前記中央上面までの距離が、前記平面から前記電極表面までの距離よりも大きいことを特徴とする請求項3に記載のパッケージ。 - 前記基材が、中央部および周辺部を有し、
前記電極および前記凹部は、前記周辺部に配され、
前記凹部が、前記電極と前記中央部との間に配されることを特徴とする請求項1に記載のパッケージ。 - 前記中央部は、前記第2面の側とは反対の側の面である前記中央上面を有し、
前記平面から前記中央上面までの距離が、前記平面から前記電極表面までの距離よりも大きいことを特徴とする請求項5に記載のパッケージ。 - 前記周辺部のうち前記電極よりも前記中央部とは反対の側の外側部は、前記第2面の側とは反対の側の面である外側上面を有し、
前記外側上面に、前記電子デバイスが備える面のうち前記第1面に対向する面とは反対の面に配される外部端子に電気的に接続するための端子が配され、
前記平面から前記外側上面までの距離が、前記平面から前記電極表面までの距離以上であることを特徴とする請求項4乃至6の何れか1項に記載のパッケージ。 - 前記周辺部のうち前記電極よりも前記中央部とは反対の側の外側部は、前記第2面の側とは反対の側の面である外側上面を有し、
前記外側上面に、前記電子デバイスが備える面のうち前記第1面に対向する面とは反対の面に配される外部端子に電気的に接続するための端子が配され、
前記平面から前記外側上面までの距離が、前記平面から前記中央上面までの距離と同じであることを特徴とする請求項4または6に記載のパッケージ。 - 前記周辺部のうち前記電極よりも前記中央部とは反対の側の外側部は、前記第2面の側とは反対の側の面である外側上面を有し、
前記外側部は、前記平面から前記第2面の側とは反対の側の面である第1外側上面までの距離が前記平面から前記電極表面までの距離よりも大きい第1外側部と、前記第1外側部よりも前記中央部とは反対の側に配され、前記平面から前記第2面の側とは反対の側の面である第2外側上面までの距離が前記平面から前記第1外側上面までの距離よりも大きい第2外側部と、を備え、
前記第2外側上面に、前記電子デバイスが備える面のうち前記第1面に対向する面とは反対の面に配される外部端子に電気的に接続するための端子が配されることを特徴とする請求項4または6に記載のパッケージ。 - 前記平面から前記第1外側上面までの距離が、前記平面から前記中央上面までの距離と同じであることを特徴とする請求項9に記載のパッケージ。
- 前記第1面に対する正射影において、前記電極の面積が、前記端子の面積よりも大きいことを特徴とする請求項7乃至10の何れか1項に記載のパッケージ。
- 前記第1面に対する正射影において、前記電極と前記凹部とを結ぶ方向と交差する方向における前記凹部の幅が、前記電極から前記凹部に向かう方向に、同じ、または、連続的または段階的に広くなることを特徴とする請求項1乃至11の何れか1項に記載のパッケージ。
- 前記第1面に対する正射影において、前記電極と前記凹部とを結ぶ方向における前記電極の長さが、前記電極と前記凹部とを結ぶ方向における前記凹部の長さよりも長いことを特徴とする請求項1乃至12の何れか1項に記載のパッケージ。
- 前記第1面に対する正射影において、
前記第1面が、互いに平行な第1辺および第2辺と、前記第1辺と前記第2辺と交差する方向に延びる第3辺と、を含む矩形状を有し、
前記電極が、前記第1面の角部に配され、前記第1辺および前記第3辺にそれぞれ平行な2辺を含む三角形状を備えることを特徴とする請求項1乃至13の何れか1項に記載のパッケージ。 - 前記第1面に対する正射影において、前記凹部が、前記平行な2辺をそれぞれ延長した2つの仮想線と重なる位置にそれぞれ辺を備えることを特徴とする請求項14に記載のパッケージ。
- 前記基材には、複数の前記電極および前記凹部の組み合わせが配され、
前記第1面に対する正射影において、
前記第1面が矩形状を有し、
前記第1面の4つの角部のうち少なくとも互いに対向する2つの角部に、前記組み合わせが、それぞれ配され、
前記2つの角部のうち一方の角部に配された前記電極と前記2つの角部のうち他方の角部に配された前記電極との間に、前記2つの角部に配されたそれぞれの前記凹部が配されることを特徴とする請求項1乃至15の何れか1項に記載のパッケージ。 - 請求項1乃至16の何れか1項に記載のパッケージと、
前記パッケージの前記第1面に搭載された電子デバイスと、
を含むことを特徴とする半導体装置。 - 請求項4または6乃至10の何れか1項に記載のパッケージと、
前記中央上面に搭載された電子デバイスと、
を含むことを特徴とする半導体装置。 - 電子デバイスと、前記電子デバイスが搭載された第1面、前記第1面とは反対の側の第2面、および、第3面を備えるパッケージと、前記電子デバイスを覆うカバー部材と、を含む半導体装置であって、
前記第1面には、前記電子デバイスに対向する電極表面を有する電極が配され、
前記第1面は、前記第2面と前記第3面との間に位置し、
前記電極は、前記電子デバイスが備える面のうち前記第1面に対向する面に導電部材を介して電気的に接続され、
前記第1面は、前記電極と凹部とを備え、
前記凹部は、前記第1面と前記第2面との間の仮想的な平面に交差する方向に沿った面である凹部側面と、前記凹部側面よりも前記第2面の側に位置する凹部底面と、前記凹部側面に対向するとともに前記第3面に連続する第2の側面と、を有し、
前記電極表面は、前記凹部底面よりも前記平面から離れた位置に配され、
前記導電部材が、前記凹部に入り込み、
前記カバー部材が、前記第1面の周辺部に設けられた凸部に結合されていることを特徴とする半導体装置。 - 前記電極は、前記周辺部に配され、
前記第1面に対する正射影において、前記周辺部のうち前記電極と前記凸部との間の外側部に、前記電子デバイスが備える面のうち前記第1面に対向する面とは反対の面に配される外部端子にワイヤによって電気的に接続された端子が配され、
前記外側部は、前記第2面の側とは反対の側の面である外側上面を有し、
前記凸部は、前記第2面の側とは反対の側の面である凸部上面を有し、
前記平面から前記外側上面までの距離が、前記平面から前記電極表面までの距離よりも大きく、
前記平面から前記凸部上面までの距離が、前記平面から前記外側上面までの距離よりも大きいことを特徴とする請求項19に記載の半導体装置。 - 前記第1面に対する正射影において、前記第1面が、前記電極よりも中央の側に配された中央部を有し、
前記中央部は、前記第2面の側とは反対の側の面である中央上面を有し、
前記平面から前記中央上面までの距離が、前記平面から前記電極表面までの距離よりも大きいことを特徴とする請求項19または20に記載の半導体装置。 - 前記第1面に対する正射影において、前記第1面が、前記電極よりも中央の側に配された中央部を有し、
前記中央部は、前記第2面の側とは反対の側の面である中央上面を有し、
前記平面から前記外側上面までの距離が、前記平面から前記中央上面までの距離よりも大きく、
前記平面から前記中央上面までの距離が、前記平面から前記電極表面までの距離よりも大きいことを特徴とする請求項20に記載の半導体装置。 - 前記電子デバイスが備える面のうち前記第1面に対向する面とは反対の面に、画像を取得するための複数のセンサが配されたセンサ部が配され、
前記第1面に対する正射影において、前記電極および前記凹部が、前記センサ部と重ならない位置に配されていることを特徴とする請求項19乃至22の何れか1項に記載の半導体装置。
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JP2014232851A (ja) | 2013-05-30 | 2014-12-11 | 京セラ株式会社 | 電子素子搭載用基板および電子装置 |
JP2016219616A (ja) | 2015-05-21 | 2016-12-22 | 京セラ株式会社 | 電子素子実装用基板および電子装置 |
JP2020017561A (ja) | 2018-07-23 | 2020-01-30 | キヤノン株式会社 | モジュール及びその製造方法 |
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