JP7373600B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP7373600B2 JP7373600B2 JP2022037829A JP2022037829A JP7373600B2 JP 7373600 B2 JP7373600 B2 JP 7373600B2 JP 2022037829 A JP2022037829 A JP 2022037829A JP 2022037829 A JP2022037829 A JP 2022037829A JP 7373600 B2 JP7373600 B2 JP 7373600B2
- Authority
- JP
- Japan
- Prior art keywords
- type
- gate electrode
- voltage
- gate
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004065 semiconductor Substances 0.000 title claims description 113
- 230000004888 barrier function Effects 0.000 description 40
- 239000012535 impurity Substances 0.000 description 37
- 239000000969 carrier Substances 0.000 description 16
- 238000009825 accumulation Methods 0.000 description 11
- 230000004048 modification Effects 0.000 description 11
- 238000012986 modification Methods 0.000 description 11
- 238000009826 distribution Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 230000007423 decrease Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 102000004129 N-Type Calcium Channels Human genes 0.000 description 6
- 108090000699 N-Type Calcium Channels Proteins 0.000 description 6
- 238000002513 implantation Methods 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 238000004645 scanning capacitance microscopy Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000003071 parasitic effect Effects 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 108091006146 Channels Proteins 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
- H01L29/7396—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions
- H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5228—Resistive arrangements or effects of, or between, wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/083—Anode or cathode regions of thyristors or gated bipolar-mode devices
- H01L29/0834—Anode regions of thyristors or gated bipolar-mode devices, e.g. supplementary regions surrounding anode regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1095—Body region, i.e. base region, of DMOS transistors or IGBTs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/36—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the concentration or distribution of impurities in the bulk material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42356—Disposition, e.g. buried gate electrode
- H01L29/4236—Disposition, e.g. buried gate electrode within a trench, e.g. trench gate electrode, groove gate electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42372—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
- H01L29/4238—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out characterised by the surface lay-out
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66234—Bipolar junction transistors [BJT]
- H01L29/66325—Bipolar junction transistors [BJT] controlled by field-effect, e.g. insulated gate bipolar transistors [IGBT]
- H01L29/66333—Vertical insulated gate bipolar transistors
- H01L29/66348—Vertical insulated gate bipolar transistors with a recessed gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/16—Modifications for eliminating interference voltages or currents
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/60—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being bipolar transistors
Description
Claims (5)
- 第1面と、前記第1面の反対側に位置する第2面と、を有する半導体部と、
前記半導体部の前記第1面上に設けられた第1電極と、
前記半導体部の前記第2面上に設けられた第2電極と、
前記半導体部の前記第2面側に設けられたトレンチゲート構造の第1~第3制御電極と、
を有するスイッチング素子を備え、
前記第1電極と前記第2電極間に所定の電圧を印可した状態において、
前記第1制御電極に、前記第1制御電極のしきい値よりも高い第1オン電圧を与えた後、前記第1制御電極の前記しきい値よりも低い第1オフ電圧を与え、
前記第2制御電極に、前記第2制御電極のしきい値よりも高い第2オン電圧を与えた後、前記第1制御電極に前記第1オフ電圧を与える前に、前記第2制御電極に、前記第2制御電極の前記しきい値よりも低い第2オフ電圧を与え、
前記第3制御電極に、前記第3制御電極のしきい値よりも高い第3オン電圧を与えた後、前記第1制御電極に前記第1オフ電圧を与える前に、前記第3制御電極に、前記第3制御電極の前記しきい値よりも低く、前記第2オフ電圧よりも高い第3オフ電圧を与えるように構成された半導体装置。 - 前記第1制御電極、前記第2制御電極および前記第3制御電極は、前記半導体部の前記第2面に沿って並び、
前記第3制御電極は、前記第1制御電極と前記第2制御電極との間に位置する請求項1記載の半導体装置。 - 前記第2電極は基準電位に接続され、
前記第2オフ電圧は、前記基準電位に対して、-15Vであり、
前記第1オフ電圧および前記第3オフ電圧は、前記基準電位に対して、0Vである請求項1または2に記載の半導体装置。 - 前記第1制御電極と前記第2制御電極とを電気的に接続する抵抗素子をさらに備える請求項1または2に記載の半導体装置。
- 前記スイッチング素子は、第1ゲートパッドと、第2ゲートパッドと、をさらに有し、
前記第1ゲートパッドは、前記第2制御電極に電気的に接続され、
前記第1ゲートパッドは、前記抵抗素子を介して、前記第1制御電極にも電気的に接続され、
前記第2ゲートパッドは、前記第3制御電極に電気的に接続され、
前記第2オン電圧および前記第2オフ電圧は、前記第1ゲートパッドを介して、前記第2制御電極に印可され、
前記第1オン電圧および前記第1オフ電圧は、前記抵抗素子を介して、前記第1制御電極に印可される前記第2オン電圧および前記第2オフ電圧であり、
前記第3オン電圧および前記第3オフ電圧は、前記第2ゲートパッドを介して、前記第3制御電極に印可される請求項4記載の半導体装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2023180750A JP2023174920A (ja) | 2019-03-19 | 2023-10-20 | Igbt及びその駆動方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019050702 | 2019-03-19 | ||
JP2019050702 | 2019-03-19 | ||
JP2019166842A JP7041653B2 (ja) | 2019-03-19 | 2019-09-13 | 半導体装置およびその制御方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019166842A Division JP7041653B2 (ja) | 2019-03-19 | 2019-09-13 | 半導体装置およびその制御方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023180750A Division JP2023174920A (ja) | 2019-03-19 | 2023-10-20 | Igbt及びその駆動方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022066557A JP2022066557A (ja) | 2022-04-28 |
JP7373600B2 true JP7373600B2 (ja) | 2023-11-02 |
Family
ID=72515508
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022037829A Active JP7373600B2 (ja) | 2019-03-19 | 2022-03-11 | 半導体装置 |
JP2023180750A Pending JP2023174920A (ja) | 2019-03-19 | 2023-10-20 | Igbt及びその駆動方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023180750A Pending JP2023174920A (ja) | 2019-03-19 | 2023-10-20 | Igbt及びその駆動方法 |
Country Status (3)
Country | Link |
---|---|
US (3) | US11101375B2 (ja) |
JP (2) | JP7373600B2 (ja) |
CN (1) | CN111725309A (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11374563B2 (en) * | 2020-03-03 | 2022-06-28 | Kabushiki Kaisha Toshiba | Method for controlling semiconductor device |
JP7330155B2 (ja) | 2020-09-16 | 2023-08-21 | 株式会社東芝 | 半導体装置及び半導体回路 |
JP2023121917A (ja) * | 2022-02-22 | 2023-09-01 | 株式会社東芝 | 半導体装置 |
JP2023139979A (ja) * | 2022-03-22 | 2023-10-04 | 株式会社東芝 | 半導体装置及び半導体回路 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120025874A1 (en) | 2010-07-27 | 2012-02-02 | Denso Corporation | Semiconductor device having switching element and free wheel diode and method for controlling the same |
JP2014093486A (ja) | 2012-11-06 | 2014-05-19 | Denso Corp | 半導体装置 |
JP2017168638A (ja) | 2016-03-16 | 2017-09-21 | 株式会社東芝 | 半導体装置 |
JP2018107693A (ja) | 2016-12-27 | 2018-07-05 | ルネサスエレクトロニクス株式会社 | 半導体装置および電力変換装置 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5554862A (en) | 1992-03-31 | 1996-09-10 | Kabushiki Kaisha Toshiba | Power semiconductor device |
JP3119931B2 (ja) | 1992-03-31 | 2000-12-25 | 株式会社東芝 | サイリスタ |
JP3333299B2 (ja) | 1993-01-20 | 2002-10-15 | 株式会社東芝 | 電力用半導体素子 |
JP3257186B2 (ja) | 1993-10-12 | 2002-02-18 | 富士電機株式会社 | 絶縁ゲート型サイリスタ |
JP4398719B2 (ja) | 2003-12-25 | 2010-01-13 | 株式会社東芝 | 半導体装置 |
JP4980743B2 (ja) | 2007-02-15 | 2012-07-18 | 三菱電機株式会社 | 電力変換装置 |
JP5333342B2 (ja) | 2009-06-29 | 2013-11-06 | 株式会社デンソー | 半導体装置 |
JP2012204436A (ja) * | 2011-03-24 | 2012-10-22 | Toshiba Corp | 電力用半導体装置 |
JP5742672B2 (ja) * | 2011-11-02 | 2015-07-01 | 株式会社デンソー | 半導体装置 |
JP6064371B2 (ja) | 2012-05-30 | 2017-01-25 | 株式会社デンソー | 半導体装置 |
JP2013251395A (ja) | 2012-05-31 | 2013-12-12 | Denso Corp | 半導体装置 |
US9595602B2 (en) | 2012-09-07 | 2017-03-14 | Hitachi, Ltd. | Switching device for power conversion and power conversion device |
CN105103298B (zh) * | 2013-03-31 | 2019-01-01 | 新电元工业株式会社 | 半导体装置 |
JP6406454B2 (ja) * | 2015-07-07 | 2018-10-17 | 富士電機株式会社 | 半導体装置 |
US10276681B2 (en) | 2016-02-29 | 2019-04-30 | Infineon Technologies Austria Ag | Double gate transistor device and method of operating |
JP6574744B2 (ja) | 2016-09-16 | 2019-09-11 | 株式会社東芝 | 半導体装置 |
WO2018109794A1 (ja) * | 2016-12-12 | 2018-06-21 | 三菱電機株式会社 | 半導体装置の駆動方法および駆動回路 |
JP2017147468A (ja) | 2017-05-15 | 2017-08-24 | 株式会社日立製作所 | 電力変換用スイッチング素子 |
JP6981777B2 (ja) * | 2017-05-29 | 2021-12-17 | 株式会社 日立パワーデバイス | 半導体装置 |
JP2019012813A (ja) * | 2017-06-29 | 2019-01-24 | 株式会社東芝 | 絶縁ゲート型バイポーラトランジスタ |
US10439054B2 (en) | 2017-06-29 | 2019-10-08 | Kabushiki Kaisha Toshiba | Insulated gate bipolar transistor |
JP6896673B2 (ja) | 2018-03-23 | 2021-06-30 | 株式会社東芝 | 半導体装置 |
JP6952667B2 (ja) | 2018-09-19 | 2021-10-20 | 株式会社東芝 | 半導体装置 |
JP7091204B2 (ja) | 2018-09-19 | 2022-06-27 | 株式会社東芝 | 半導体装置 |
JP7027287B2 (ja) | 2018-09-19 | 2022-03-01 | 株式会社東芝 | 半導体装置 |
JP7272004B2 (ja) * | 2019-02-25 | 2023-05-12 | 富士電機株式会社 | 絶縁ゲート型半導体装置及びその製造方法 |
JP7210342B2 (ja) * | 2019-03-18 | 2023-01-23 | 株式会社東芝 | 半導体装置 |
-
2019
- 2019-09-17 US US16/573,593 patent/US11101375B2/en active Active
- 2019-12-31 CN CN201911413071.3A patent/CN111725309A/zh active Pending
-
2021
- 2021-07-23 US US17/383,837 patent/US11594622B2/en active Active
-
2022
- 2022-03-11 JP JP2022037829A patent/JP7373600B2/ja active Active
-
2023
- 2023-01-26 US US18/101,712 patent/US20230170405A1/en active Pending
- 2023-10-20 JP JP2023180750A patent/JP2023174920A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120025874A1 (en) | 2010-07-27 | 2012-02-02 | Denso Corporation | Semiconductor device having switching element and free wheel diode and method for controlling the same |
JP2014093486A (ja) | 2012-11-06 | 2014-05-19 | Denso Corp | 半導体装置 |
JP2017168638A (ja) | 2016-03-16 | 2017-09-21 | 株式会社東芝 | 半導体装置 |
JP2018107693A (ja) | 2016-12-27 | 2018-07-05 | ルネサスエレクトロニクス株式会社 | 半導体装置および電力変換装置 |
Also Published As
Publication number | Publication date |
---|---|
JP2023174920A (ja) | 2023-12-08 |
US20200303527A1 (en) | 2020-09-24 |
US11594622B2 (en) | 2023-02-28 |
US11101375B2 (en) | 2021-08-24 |
US20230170405A1 (en) | 2023-06-01 |
JP2022066557A (ja) | 2022-04-28 |
CN111725309A (zh) | 2020-09-29 |
US20210351285A1 (en) | 2021-11-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7373600B2 (ja) | 半導体装置 | |
JP7210342B2 (ja) | 半導体装置 | |
US10439054B2 (en) | Insulated gate bipolar transistor | |
JP5742672B2 (ja) | 半導体装置 | |
US10319844B2 (en) | Semiconductor device | |
US8294206B2 (en) | Integrated circuit device and method for its production | |
CN104282759A (zh) | 超结mosfet及其制造方法和复合半导体装置 | |
JP2008021981A (ja) | 絶縁ゲートバイポーラトランジスタ及びその製造方法 | |
KR20150051067A (ko) | 전력 반도체 소자 및 그의 제조 방법 | |
US20150144989A1 (en) | Power semiconductor device and method of manufacturing the same | |
US11217686B2 (en) | Semiconductor device and semiconductor circuit | |
JP7041653B2 (ja) | 半導体装置およびその制御方法 | |
KR20150080776A (ko) | 전력 반도체 소자 | |
US11282949B2 (en) | Semiconductor device and semiconductor circuit | |
JP7352437B2 (ja) | 半導体装置 | |
JP7346170B2 (ja) | 半導体装置及び半導体モジュール | |
JP6995722B2 (ja) | 半導体装置 | |
RU91222U1 (ru) | Мощный интегральный тиристор с полевым управлением | |
JP2023138654A (ja) | 半導体装置及び半導体回路 | |
TW202347796A (zh) | 半導體裝置及電力轉換裝置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220314 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20230419 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230426 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230622 |
|
RD01 | Notification of change of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7421 Effective date: 20230623 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20230623 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230922 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20231023 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7373600 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |