JP6995722B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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Description
図1および図2は、第1実施形態に係る半導体装置1を示す模式図である。半導体装置1は、例えば、IGBTである。図1は、半導体装置1の主要部を模式的に示す斜視図である。図2は、半導体装置1の構造を示す模式断面図である。
図6は、第2実施形態に係る半導体装置4を示す模式断面図である。半導体装置4では、PNP領域において、n形半導体層60とゲート電極GEとの間にゲート絶縁膜25が設けられ、p形半導体層70とゲート電極GEとの間にゲート絶縁膜27が設けられる。
図7は、第3実施形態に係る半導体装置5を示す模式断面図である。半導体装置5では、PNP領域のゲート絶縁膜23とn形半導体層60との間にp形領域65が設けられる。p形領域65は、例えば、n形半導体層60のn形不純物よりも低濃度のn形不純物を含み、さらに、そのn形不純物よりも高濃度のp形不純物を含む。
図8は、第4実施形態に係る半導体装置6を示す模式断面図である。半導体装置6は、PNP領域に設けられたn形半導体層55を有する。n形半導体層55は、正孔に対するトラップ準位TPとなる欠陥を含む。
図9は、第5実施形態に係る半導体装置7を示す模式断面図である。半導体装置7では、X方向において隣接する2つのチャネル領域CRの間に、PNP領域と2つのP領域PRとが設けられる。PNP領域は、2つのP領域PRの間に配置される。
Claims (9)
- 第1導電形の第1半導体層を含む半導体部と、
前記半導体部の表面上に設けられた第1電極と、
前記半導体部の裏面上に設けられた第2電極と、
前記半導体部中に設けられ、前記第1電極から前記第2電極に向かう方向に延びる複数の制御電極と、
前記複数の制御電極を前記半導体部から電気的に絶縁する絶縁膜と、
を備え、
前記複数の制御電極のうちの隣接する2つの制御電極の間に位置し、前記第1電極と前記第1半導体層との間に設けられた第2導電形の第2半導体層と、
前記第1電極と前記第2半導体層との間に設けられた第1導電形の第3半導体層と、
前記複数の制御電極のうちの隣接する別の2つの制御電極間に設けられ、前記第1電極と前記第1半導体層との間に設けられた第2導電形の第4半導体層と、
前記第1電極と前記第4半導体層との間に設けられた第2導電形の第5半導体層であって、前記第1電極と前記第5半導体層との間に第1導電形の半導体領域もしくは第1導電形の半導体層が設けられないように構成された、第5半導体層と、
前記第4半導体層と前記第5半導体層との間に設けられ、前記第5半導体層に接し、第1導電形不純物を含む第6半導体層と、
を含む前記半導体部を有し、
前記第6半導体層は、前記第4半導体層と前記第5半導体層との間に位置する主部と、前記絶縁膜と前記主部との間に位置する境界部と、を有し、前記境界部における第1導電形不純物の濃度は、前記主部における第1導電形不純物の濃度よりも低い半導体装置。 - 前記境界部は、第1導電形不純物の前記濃度よりも高濃度の第2導電形不純物を含む請求項1記載の半導体装置。
- 前記半導体部は、前記第1半導体層と前記第2電極との間に位置する第2導電形の第7半導体層をさらに含む請求項1または2に記載の半導体装置。
- 前記半導体部は、前記第1半導体層と前記第7半導体層との間に位置し、前記第1半導体層の第1導電形不純物濃度よりも高濃度の第1導電形不純物を含む第1導電形の第8半導体層をさらに含む請求項3記載の半導体装置。
- 前記半導体部は、前記隣接する2つの制御電極の間に位置し、前記第2半導体層と前記第3半導体層とを含む第1領域と、前記別の2つの制御電極間に位置し、前記第4半導体層と前記第5半導体層と前記第6半導体層とを含む第2領域と、を有し、
前記第1領域および前記第2領域は、それぞれ複数配置され、
前記半導体部の表面に沿った方向において隣り合う2つの前記第1領域の間に、2つ以上の前記第2領域が配置される請求項1~4のいずれか1つに記載の半導体装置。 - 前記半導体部は、前記隣接する2つの制御電極の間に位置し、前記第2半導体層と前記第3半導体層とを含む第1領域と、前記別の2つの制御電極間に位置し、前記第4半導体層と前記第5半導体層と前記第6半導体層とを含む第2領域と、を有し、
前記第1領域および前記第2領域は、それぞれ複数配置され、
前記半導体部の表面に沿った方向において隣り合う2つの前記第2領域の間に、2つ以上の前記第1領域が配置される請求項1~4のいずれか1つに記載の半導体装置。 - 第1導電形の第1半導体層を含む半導体部と、
前記半導体部の表面上に設けられた第1電極と、
前記半導体部の裏面上に設けられた第2電極と、
前記半導体部中に設けられ、前記第1電極から前記第2電極に向かう方向に延びる複数
の制御電極と、
前記複数の制御電極を前記半導体部から電気的に絶縁する絶縁膜と、
を備え、
前記複数の制御電極のうちの隣接する2つの制御電極の間に位置し、前記第1電極と前記第1半導体層との間に設けられた第2導電形の第2半導体層と、
前記第1電極と前記第2半導体層との間に設けられた第1導電形の第3半導体層と、
前記複数の制御電極のうちの隣接する別の2つの制御電極間に設けられ、前記第1電極と前記第1半導体層との間に設けられた第2導電形の第4半導体層と、
前記第1電極と前記第4半導体層との間に設けられた第2導電形の第5半導体層と、
前記第4半導体層と前記第5半導体層との間に設けられた第1導電形の第6半導体層と、
を含む前記半導体部を有し、
前記第6半導体層と前記別の2つの制御電極のうちの1つとの間に位置する前記絶縁膜の一部は、前記第4半導体層と前記別の2つの制御電極のうちの1つとの間に位置する前記絶縁膜の別の一部の膜厚よりも薄い膜厚を有し、前記第2半導体層と前記2つの制御電極のうちの1つとの間に位置する前記絶縁膜の膜厚よりも薄い前記膜厚を有する半導体装置。 - 第1導電形の第1半導体層を含む半導体部と、
前記半導体部の表面上に設けられた第1電極と、
前記半導体部の裏面上に設けられた第2電極と、
前記半導体部中に設けられ、前記第1電極から前記第2電極に向かう方向に延びる複数の制御電極と、
前記複数の制御電極を前記半導体部から電気的に絶縁する絶縁膜と、
を備え、
前記複数の制御電極のうちの隣接する2つの制御電極の間に位置し、前記第1電極と前記第1半導体層との間に設けられた第2導電形の第2半導体層と、
前記第1電極と前記第2半導体層との間に設けられた第1導電形の第3半導体層と、
前記複数の制御電極のうちの隣接する別の2つの制御電極間に設けられ、前記第1電極と前記第1半導体層との間に設けられた第2導電形の第4半導体層と、
前記第1電極と前記第4半導体層との間に設けられた第2導電形の第5半導体層と、
前記第4半導体層と前記第5半導体層との間に設けられた第1導電形の第6半導体層と、
を含む前記半導体部を有し、
前記第6半導体層は、第2導電形のキャリアをトラップする準位を含む半導体装置。 - 第1導電形の第1半導体層を含む半導体部と、
前記半導体部の表面上に設けられた第1電極と、
前記半導体部の裏面上に設けられた第2電極と、
前記半導体部中に設けられ、前記第1電極から前記第2電極に向かう方向に延びる複数の制御電極と、
前記複数の制御電極を前記半導体部から電気的に絶縁する絶縁膜と、
を備え、
前記複数の制御電極のうちの隣接する2つの制御電極の間に位置し、前記第1電極と前記第1半導体層との間に設けられた第2導電形の第2半導体層と、
前記第1電極と前記第2半導体層との間に設けられた第1導電形の第3半導体層と、
前記複数の制御電極のうちの隣接する別の2つの制御電極間に設けられ、前記第1電極と前記第1半導体層との間に設けられた第2導電形の第4半導体層と、
前記第1電極と前記第4半導体層との間に設けられた第2導電形の第5半導体層と、
前記第4半導体層と前記第5半導体層との間に設けられ、第1導電形不純物を含む第6半導体層と、
を含む前記半導体部を有し、
前記第6半導体層は、前記第4半導体層と前記第5半導体層との間に位置する主部と、前記絶縁膜と前記主部との間に位置する境界部と、を有し、前記境界部における第1導電形不純物の濃度は、前記主部における第1導電形不純物の濃度よりも低く、
前記境界部は、第1導電形不純物の前記濃度よりも高濃度の第2導電形不純物を含む半導体装置。
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