JP7321730B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP7321730B2 JP7321730B2 JP2019047313A JP2019047313A JP7321730B2 JP 7321730 B2 JP7321730 B2 JP 7321730B2 JP 2019047313 A JP2019047313 A JP 2019047313A JP 2019047313 A JP2019047313 A JP 2019047313A JP 7321730 B2 JP7321730 B2 JP 7321730B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 13
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- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 description 28
- 239000010937 tungsten Substances 0.000 description 28
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 27
- 238000000034 method Methods 0.000 description 19
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- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 12
- 229910052731 fluorine Inorganic materials 0.000 description 12
- 239000011737 fluorine Substances 0.000 description 12
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- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 8
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- 229910052739 hydrogen Inorganic materials 0.000 description 5
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- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 4
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- 229910002091 carbon monoxide Inorganic materials 0.000 description 4
- JJWKPURADFRFRB-UHFFFAOYSA-N carbonyl sulfide Chemical compound O=C=S JJWKPURADFRFRB-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
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- 229910015844 BCl3 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- GCPXMJHSNVMWNM-UHFFFAOYSA-N arsenous acid Chemical compound O[As](O)O GCPXMJHSNVMWNM-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
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- 230000001737 promoting effect Effects 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003657 tungsten Chemical class 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
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- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
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Description
図1は、第1実施形態に係る基板処理装置の概略的な構成を示す図である。図1に示す基板処理装置1は、ALD(Atomic Layer Deposition)方式で基板100に成膜する枚葉型成膜装置である。この基板処理装置1は、チャンバー10と、ヘッド20と、ステージ30と、ドライポンプ40と、を備える。
上記化学反応の結果、図4(b)に示すように、タングステン膜101上では、六フッ化タングステンを還元してタングステン膜101が成膜される。同時に、フッ化水素(HF)が、副生成物として生成されてタングステン膜101上に吸着する。タングステン膜101上では、吸着したフッ素が成膜阻害物質として作用する。
図5は、第2実施形態に係る基板処理装置の概略的な構成を示す図である。図1に示す第1実施形態に係る基板処理装置1と同様の構成要素には同じ符号を付し、詳細な説明を省略する。
図7は、第3実施形態に係る基板処理装置の概略的な構成を示す平面図である。また、図8は、第3実施形態に係る基板処理装置の概略的な構成を示す側面図である。以下、上述した第2実施形態に係る基板処理装置2と異なる点を中心に説明する。
本実施形態で用いる基板処理装置は、図1に示す第1実施形態に係る基板処理装置1と同様であるので、詳細な説明を省略する。ここでは、第1実施形態と異なる点を中心に説明する。
Claims (6)
- 基板を収容したチャンバー内に、成膜材料となる第1元素を含む第1ガスを導入し、
パージガスを用いて前記第1ガスを前記チャンバー内から排気し、
前記第1ガスを還元する第2ガスを前記チャンバー内に導入し、
前記パージガスを用いて前記第2ガスを前記チャンバーから排気し、
前記第1ガスの排気時および前記第2ガスの排気時の少なくとも一方で、前記第1ガス、前記第2ガス、および前記パージガスとは異なる第3ガスを前記パージガスと同時に前記チャンバー内に導入する、
半導体装置の製造方法。 - 前記第3ガスが、前記基板の表面に吸着した前記第1元素と、前記第1ガス、前記第2ガス、および前記第1ガスと前記第2ガスとの化学反応により生成された副生成物のいずれかに含まれる第2元素との化学結合を切断するガスである、請求項1に記載の半導体装置の製造方法。
- 前記第1元素と前記第2元素の結合エネルギーよりも、前記第2元素と前記第3ガスに含まれる第3元素との結合エネルギーの方が高い、請求項2に記載の半導体装置の製造方法。
- 前記第1ガスが、六フッ化タングステン(WF6)ガスであり、
前記第2ガスが、水素ガスであり、
前記第3ガスが、ハロゲンを含むガス、または酸素を含むガスである、請求項2または3に記載の半導体装置の製造方法。 - 前記第1ガスが、六フッ化タングステン(WF6)ガスであり、
前記第2ガスが、水素ガスであり、
前記第3ガスが、前記基板に前記第1元素を成膜する成膜温度以上に加熱された希ガスである、請求項2または3に記載の半導体装置の製造方法。 - 前記パージガスを加熱する、請求項1から5のいずれか一項に記載の半導体装置の製造方法。
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