JP7279770B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP7279770B2 JP7279770B2 JP2021201564A JP2021201564A JP7279770B2 JP 7279770 B2 JP7279770 B2 JP 7279770B2 JP 2021201564 A JP2021201564 A JP 2021201564A JP 2021201564 A JP2021201564 A JP 2021201564A JP 7279770 B2 JP7279770 B2 JP 7279770B2
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Description
特許文献1 特開2015-72950号公報
Claims (16)
- 半導体基板の上面に設けられた複数のトレンチ部と、
前記トレンチ部に挟まれた前記半導体基板の領域であって、第1導電型のエミッタ領域および第2導電型のベース領域を含む第1メサ部と、
前記トレンチ部に挟まれた前記半導体基板の領域であって、前記トレンチ部の下端よりも深い第2導電型の第1ウェル領域を含む第2メサ部と、
前記半導体基板の下面に設けられた第2導電型のコレクタ領域と、
前記コレクタ領域の上面側に設けられる第1導電型のバッファ領域と、
前記第1メサ部の内部から前記バッファ領域まで設けられる第1導電型のドリフト領域と、
前記半導体基板の上方に設けられたゲート電極と、
前記半導体基板の上方に設けられたエミッタ電極と、
を備え、
前記第1ウェル領域は、前記ベース領域よりもドーピング濃度が高く、前記トレンチ部の幅方向において、前記トレンチ部の底部を越えて、前記第1メサ部の下方まで設けられている
半導体装置。 - 半導体基板の上面に設けられた複数のトレンチ部と、
前記トレンチ部に挟まれた前記半導体基板の領域であって、第1導電型のエミッタ領域および第2導電型のベース領域を含む第1メサ部と、
前記トレンチ部に挟まれた前記半導体基板の領域であって、前記トレンチ部の下端よりも深い第2導電型の第1ウェル領域を含む第2メサ部と、
前記半導体基板の上方に設けられたゲート電極と、
前記半導体基板の上方に設けられたエミッタ電極と、
を備え、
前記第1ウェル領域は、前記トレンチ部の幅方向において、前記トレンチ部の底部を越えて、前記第1メサ部の下方まで設けられ、
前記トレンチ部は、前記ゲート電極と接続されるゲートトレンチ部と、前記エミッタ電極と接続されるダミートレンチ部と、
を含み、
前記第2メサ部は、2つの前記ダミートレンチ部に挟まれたダミーメサ部であり、
2つの前記ダミートレンチ部は、それぞれ、上面視において第1方向に延伸する延伸部を有し、
2つの前記延伸部は、前記第1方向と垂直な第2方向に延伸する前記トレンチ部である先端部によって接続され、
前記第1ウェル領域と前記ダミートレンチ部との深さの差分は、前記第2方向における第2メサ部の幅よりも大きい
半導体装置。 - 半導体基板の上面に設けられた複数のトレンチ部と、
前記トレンチ部に挟まれた前記半導体基板の領域であって、第1導電型のエミッタ領域および第2導電型のベース領域を含む第1メサ部と、
前記トレンチ部に挟まれた前記半導体基板の領域であって、前記トレンチ部の下端よりも深い第2導電型の第1ウェル領域を含む第2メサ部と、
前記半導体基板の上方に設けられたゲート電極と、
前記半導体基板の上方に設けられたエミッタ電極と、
を備え、
前記第1ウェル領域は、前記トレンチ部の幅方向において、前記トレンチ部の底部を越えて、前記第1メサ部の下方まで設けられ、
前記トレンチ部は、前記ゲート電極と接続されるゲートトレンチ部と、前記エミッタ電極と接続されるダミートレンチ部と、
を含み、
前記第2メサ部は、2つの前記ダミートレンチ部に挟まれたダミーメサ部であり、
2つの前記ダミートレンチ部は、それぞれ、上面視において第1方向に延伸する延伸部を有し、
2つの前記延伸部は、前記第1方向と垂直な第2方向に延伸する前記トレンチ部である先端部によって接続され、
前記ベース領域よりもドーピング濃度が高く、前記先端部の底部を覆う第2導電型の第2ウェル領域を更に備え、
前記第2ウェル領域は、前記第2メサ部の前記第1ウェル領域と電気的に接続されている
半導体装置。 - 前記第1ウェル領域は、前記ベース領域よりもドーピング濃度の高い
請求項2または3に記載の半導体装置。 - 前記トレンチ部は、前記ゲート電極と接続されるゲートトレンチ部と、前記エミッタ電極と接続されるダミートレンチ部と、
を含み、
前記第2メサ部は、2つの前記ダミートレンチ部に挟まれたダミーメサ部である
請求項1に記載の半導体装置。 - 前記第1メサ部は、前記複数のトレンチ部のゲートトレンチ部とダミートレンチ部とに挟まれたメサ部である
請求項1から3のいずれか一項に記載の半導体装置。 - 2つの前記ダミートレンチ部は、それぞれ、上面視において第1方向に延伸する延伸部を有し、
2つの前記延伸部は、前記第1方向と垂直な第2方向に延伸する前記トレンチ部である先端部によって接続されている
請求項5に記載の半導体装置。 - 前記ダミーメサ部は、2つの前記延伸部と前記先端部とにより囲われている
請求項3または7に記載の半導体装置。 - 前記第1ウェル領域と前記ダミートレンチ部との深さの差分は、前記第2方向における第2メサ部の幅よりも大きい
請求項3、7、8のいずれか一項に記載の半導体装置。 - 前記第1メサ部側の前記ダミートレンチ部の側壁から前記第1ウェル領域の端部の位置までの長さは、前記第1メサ部側の前記ダミートレンチ部の側壁から前記ダミートレンチ部の底部における前記第2方向の中央までの長さより短い
請求項2、3、7から9のいずれか一項に記載の半導体装置。 - 前記第1メサ部側の前記ダミートレンチ部の側壁から前記第1ウェル領域の端部の位置までの長さは、前記第1メサ部側の前記ダミートレンチ部の側壁から前記ダミートレンチ部の底部における前記第2方向の中央までの長さより長い
請求項2、3、7から9のいずれか一項に記載の半導体装置。 - 前記ベース領域よりもドーピング濃度が高く、前記先端部の底部を覆う第2導電型の第2ウェル領域を更に備え、
前記第2ウェル領域は、前記第2メサ部の前記第1ウェル領域と電気的に接続されている
請求項2または7に記載の半導体装置。 - 前記第2ウェル領域は、前記第1ウェル領域と同一のドーピング濃度を有する
請求項3または12に記載の半導体装置。 - 前記第2メサ部の前記第2方向の幅は、前記第1メサ部の前記第2方向の幅よりも大きい
請求項2、3、7のいずれか一項に記載の半導体装置。 - 前記第2メサ部の第2方向の幅は、前記第1メサ部の第2方向の幅の2.0倍以上4.0倍以下である
請求項14に記載の半導体装置。 - 前記第1メサ部において、前記ベース領域と前記ドリフト領域との間に設けられ、前記ドリフト領域よりもドーピング濃度の高い第1導電型の蓄積領域を備える
請求項1、5、7のいずれか一項に記載の半導体装置。
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