JP7165673B2 - 流動床方式反応装置及びトリクロロシランの製造方法 - Google Patents

流動床方式反応装置及びトリクロロシランの製造方法 Download PDF

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Publication number
JP7165673B2
JP7165673B2 JP2019554324A JP2019554324A JP7165673B2 JP 7165673 B2 JP7165673 B2 JP 7165673B2 JP 2019554324 A JP2019554324 A JP 2019554324A JP 2019554324 A JP2019554324 A JP 2019554324A JP 7165673 B2 JP7165673 B2 JP 7165673B2
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fluidized bed
reaction vessel
hydrogen chloride
silicon powder
chloride gas
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Japanese (ja)
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JPWO2019098346A1 (ja
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賢次 弘田
克弥 荻原
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Tokuyama Corp
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Tokuyama Corp
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1818—Feeding of the fluidising gas
    • B01J8/1827—Feeding of the fluidising gas the fluidising gas being a reactant
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1872—Details of the fluidised bed reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
    • C01B33/10731—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10736—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane from silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00106—Controlling the temperature by indirect heat exchange
    • B01J2208/00115—Controlling the temperature by indirect heat exchange with heat exchange elements inside the bed of solid particles
    • B01J2208/00132—Tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00548—Flow
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
JP2019554324A 2017-11-20 2018-11-16 流動床方式反応装置及びトリクロロシランの製造方法 Active JP7165673B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017223143 2017-11-20
JP2017223143 2017-11-20
PCT/JP2018/042558 WO2019098346A1 (ja) 2017-11-20 2018-11-16 流動床方式反応装置及びトリクロロシランの製造方法

Publications (2)

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JPWO2019098346A1 JPWO2019098346A1 (ja) 2020-12-03
JP7165673B2 true JP7165673B2 (ja) 2022-11-04

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Country Link
US (1) US11007499B2 (ko)
EP (1) EP3715328A4 (ko)
JP (1) JP7165673B2 (ko)
KR (1) KR102585512B1 (ko)
CN (1) CN111094182A (ko)
TW (1) TWI786226B (ko)
WO (1) WO2019098346A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113387363B (zh) * 2021-05-08 2023-01-31 内蒙古新特硅材料有限公司 一种三氯氢硅合成方法及系统
CN114307857A (zh) * 2022-01-11 2022-04-12 内蒙古恒星化学有限公司 硅粉加料系统
CN115285999B (zh) * 2022-07-28 2024-01-30 江苏中能硅业科技发展有限公司 一种用于三氯氢硅生产的自动推料系统和推料方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009256197A (ja) 2008-03-24 2009-11-05 Mitsubishi Materials Corp クロロシランの精製装置及びクロロシラン製造方法
JP2010189256A (ja) 2009-01-20 2010-09-02 Mitsubishi Materials Corp トリクロロシラン製造装置及びトリクロロシラン製造方法
JP2011063480A (ja) 2009-09-17 2011-03-31 Mitsubishi Materials Corp クロロシラン精製用フィルター装置、クロロシラン精製装置及び精製方法
JP2011184242A (ja) 2010-03-09 2011-09-22 Jnc Corp クロロシランの製造装置

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NL271393A (ko) * 1960-12-31
JPS52129679A (en) 1976-04-26 1977-10-31 Hitachi Ltd Fluidized bed reactor with inserted baffle plate
US5776416A (en) 1995-11-14 1998-07-07 Tokuyama Corporation Cyclone and fluidized bed reactor having same
JP3778631B2 (ja) 1995-11-14 2006-05-24 株式会社トクヤマ サイクロン及びこれを備えた流動層反応装置
JP3324922B2 (ja) 1995-12-22 2002-09-17 株式会社トクヤマ 三塩化ケイ素の製造方法
RU2126713C1 (ru) * 1996-07-22 1999-02-27 Государственный научный центр Российской Федерации Государственный научно-исследовательский институт химии и технологии элементоорганических соединений Аппарат для синтеза органохлорсиланов в кипящем слое
JP5359082B2 (ja) * 2007-10-23 2013-12-04 三菱マテリアル株式会社 トリクロロシラン製造装置及びトリクロロシラン製造方法
JP5308794B2 (ja) * 2007-12-11 2013-10-09 住友化学株式会社 噴流層装置を用いたポリオレフィン製造方法
DE102008041974A1 (de) * 2008-09-10 2010-03-11 Evonik Degussa Gmbh Vorrichtung, deren Verwendung und ein Verfahren zur energieautarken Hydrierung von Chlorsilanen
CN201882919U (zh) * 2010-10-25 2011-06-29 宁波朝日硅材料有限公司 一种三氯氢硅流化床
US10105669B2 (en) * 2012-08-29 2018-10-23 Hemlock Semiconductor Operations Llc Tapered fluidized bed reactor and process for its use
DE102013212908A1 (de) * 2013-07-02 2015-01-08 Wacker Chemie Ag Analyse der Zusammensetzung eines Gases oder eines Gasstromes in einem chemischen Reaktor und ein Verfahren zur Herstellung von Chlorsilanen in einem Wirbelschichtreaktor
JP6287081B2 (ja) 2013-11-06 2018-03-07 三菱マテリアル株式会社 テトラクロロシラン回収方法及び多結晶シリコン製造方法
CN203922739U (zh) * 2014-06-18 2014-11-05 四川永祥多晶硅有限公司 一种三氯氢硅合成炉
CN205933254U (zh) * 2016-07-20 2017-02-08 江苏中能硅业科技发展有限公司 流化床反应器

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009256197A (ja) 2008-03-24 2009-11-05 Mitsubishi Materials Corp クロロシランの精製装置及びクロロシラン製造方法
JP2010189256A (ja) 2009-01-20 2010-09-02 Mitsubishi Materials Corp トリクロロシラン製造装置及びトリクロロシラン製造方法
JP2011063480A (ja) 2009-09-17 2011-03-31 Mitsubishi Materials Corp クロロシラン精製用フィルター装置、クロロシラン精製装置及び精製方法
JP2011184242A (ja) 2010-03-09 2011-09-22 Jnc Corp クロロシランの製造装置

Also Published As

Publication number Publication date
WO2019098346A1 (ja) 2019-05-23
JPWO2019098346A1 (ja) 2020-12-03
TW201922345A (zh) 2019-06-16
US20200276552A1 (en) 2020-09-03
EP3715328A4 (en) 2021-07-28
US11007499B2 (en) 2021-05-18
KR20200088277A (ko) 2020-07-22
EP3715328A1 (en) 2020-09-30
TWI786226B (zh) 2022-12-11
KR102585512B1 (ko) 2023-10-10
CN111094182A (zh) 2020-05-01

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