JP7095084B2 - レーザチャンバ内の電極の寿命を延ばす方法及び装置 - Google Patents

レーザチャンバ内の電極の寿命を延ばす方法及び装置 Download PDF

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JP7095084B2
JP7095084B2 JP2020521972A JP2020521972A JP7095084B2 JP 7095084 B2 JP7095084 B2 JP 7095084B2 JP 2020521972 A JP2020521972 A JP 2020521972A JP 2020521972 A JP2020521972 A JP 2020521972A JP 7095084 B2 JP7095084 B2 JP 7095084B2
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electrode
discharge
discharge chamber
laser
gap
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JP2021500745A (ja
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ダフィー，トーマス，パトリック
メルチャー，ポール，クリストファー
ガレスピー，ウォルター，デール
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サイマー リミテッド ライアビリティ カンパニー
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381—Anodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0382—Cathodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388—Compositions, materials or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2020521972A 2017-10-24 2018-10-09 レーザチャンバ内の電極の寿命を延ばす方法及び装置 Active JP7095084B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2022075638A JP7417654B2 (ja) 2017-10-24 2022-05-02 レーザチャンバ内の電極の寿命を延ばす方法及び装置
JP2023196579A JP7644203B2 (ja) 2017-10-24 2023-11-20 レーザチャンバ内の電極の寿命を延ばす方法及び装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762576371P 2017-10-24 2017-10-24
US62/576,371 2017-10-24
PCT/US2018/055078 WO2019083722A1 (en) 2017-10-24 2018-10-09 METHOD AND APPARATUS FOR LIFTING THE LIFE OF AN ELECTRODE IN A LASER CHAMBER

Related Child Applications (1)

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JP2022075638A Division JP7417654B2 (ja) 2017-10-24 2022-05-02 レーザチャンバ内の電極の寿命を延ばす方法及び装置

Publications (2)

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JP2021500745A JP2021500745A (ja) 2021-01-07
JP7095084B2 true JP7095084B2 (ja) 2022-07-04

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JP2020521972A Active JP7095084B2 (ja) 2017-10-24 2018-10-09 レーザチャンバ内の電極の寿命を延ばす方法及び装置
JP2022075638A Active JP7417654B2 (ja) 2017-10-24 2022-05-02 レーザチャンバ内の電極の寿命を延ばす方法及び装置
JP2023196579A Active JP7644203B2 (ja) 2017-10-24 2023-11-20 レーザチャンバ内の電極の寿命を延ばす方法及び装置

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JP2022075638A Active JP7417654B2 (ja) 2017-10-24 2022-05-02 レーザチャンバ内の電極の寿命を延ばす方法及び装置
JP2023196579A Active JP7644203B2 (ja) 2017-10-24 2023-11-20 レーザチャンバ内の電極の寿命を延ばす方法及び装置

Country Status (6)

Country Link
US (1) US11777271B2 (https=)
JP (3) JP7095084B2 (https=)
KR (2) KR102408834B1 (https=)
CN (1) CN111279562A (https=)
TW (1) TWI713276B (https=)
WO (1) WO2019083722A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser
WO2021138019A1 (en) * 2019-12-31 2021-07-08 Cymer, Llc Undercut electrodes for a gas discharge laser chamber
KR20210133084A (ko) 2020-04-28 2021-11-05 삼성전자주식회사 뉴럴 네트워크의 학습 방법 및 장치
JP2024500674A (ja) * 2020-12-22 2024-01-10 サイマー リミテッド ライアビリティ カンパニー ガス放電チャンバブロワのエネルギー消費量を低減すること
WO2025202806A1 (en) 2024-03-28 2025-10-02 Cymer, Llc Systems and methods for electrode position sensing and adjustment

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JP2000058944A (ja) 1998-05-20 2000-02-25 Cymer Inc 高信頼性・モジュラ製造高品質狭帯域高繰り返しレ―トｆ２レ―ザ
JP2002043669A (ja) 2000-06-19 2002-02-08 Cymer Inc ４ＫＨｚ気体放電レーザー
US20060078028A1 (en) 2004-10-13 2006-04-13 Gigaphoton Inc. Discharge excitation type pulse laser apparatus
JP2010525571A (ja) 2007-04-16 2010-07-22 サイマー インコーポレイテッド ガス放電レーザ用伸張可能電極
JP2012023172A (ja) 2010-07-14 2012-02-02 Sumitomo Heavy Ind Ltd 電極及び電極材料の構成比率決定方法
WO2014046186A1 (ja) 2012-09-21 2014-03-27 ギガフォトン株式会社 レーザ装置
JP2014511036A (ja) 2012-03-02 2014-05-01 中國科學院光電研究院 単一チャンバの二重電極放電チャンバ及びエキシマレーザー
WO2015186224A1 (ja) 2014-06-05 2015-12-10 ギガフォトン株式会社 レーザチャンバ
WO2016143105A1 (ja) 2015-03-11 2016-09-15 ギガフォトン株式会社 エキシマレーザチャンバ装置

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JPS63229789A (ja) * 1987-03-19 1988-09-26 Toshiba Corp 高繰返しパルスレ−ザ発振装置
JP2913957B2 (ja) * 1990-12-27 1999-06-28 松下電器産業株式会社 放電励起ガスレーザ装置
JPH0613690A (ja) * 1992-06-27 1994-01-21 Shimadzu Corp エキシマレーザ装置
JP3815578B2 (ja) * 1996-07-19 2006-08-30 忠弘 大見 エキシマレーザー発振装置
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
US6151346A (en) * 1997-12-15 2000-11-21 Cymer, Inc. High pulse rate pulse power system with fast rise time and low current
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JP2000058944A (ja) 1998-05-20 2000-02-25 Cymer Inc 高信頼性・モジュラ製造高品質狭帯域高繰り返しレ―トｆ２レ―ザ
JP2002043669A (ja) 2000-06-19 2002-02-08 Cymer Inc ４ＫＨｚ気体放電レーザー
US20060078028A1 (en) 2004-10-13 2006-04-13 Gigaphoton Inc. Discharge excitation type pulse laser apparatus
JP2010525571A (ja) 2007-04-16 2010-07-22 サイマー インコーポレイテッド ガス放電レーザ用伸張可能電極
JP2012023172A (ja) 2010-07-14 2012-02-02 Sumitomo Heavy Ind Ltd 電極及び電極材料の構成比率決定方法
JP2014511036A (ja) 2012-03-02 2014-05-01 中國科學院光電研究院 単一チャンバの二重電極放電チャンバ及びエキシマレーザー
WO2014046186A1 (ja) 2012-09-21 2014-03-27 ギガフォトン株式会社 レーザ装置
WO2015186224A1 (ja) 2014-06-05 2015-12-10 ギガフォトン株式会社 レーザチャンバ
WO2016143105A1 (ja) 2015-03-11 2016-09-15 ギガフォトン株式会社 エキシマレーザチャンバ装置

Also Published As

Publication number Publication date
US20210111529A1 (en) 2021-04-15
TW201931705A (zh) 2019-08-01
KR102593750B1 (ko) 2023-10-24
KR102408834B1 (ko) 2022-06-13
JP2021500745A (ja) 2021-01-07
WO2019083722A1 (en) 2019-05-02
CN111279562A (zh) 2020-06-12
US11777271B2 (en) 2023-10-03
JP2024009127A (ja) 2024-01-19
JP7417654B2 (ja) 2024-01-18
JP2022093614A (ja) 2022-06-23
KR20220084196A (ko) 2022-06-21
JP7644203B2 (ja) 2025-03-11
TWI713276B (zh) 2020-12-11
KR20200051818A (ko) 2020-05-13

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