KR102408834B1 - 레이저 챔버에서 전극 수명을 연장시키기 위한 장치 및 방법 - Google Patents

레이저 챔버에서 전극 수명을 연장시키기 위한 장치 및 방법 Download PDF

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KR102408834B1
KR102408834B1 KR1020207011634A KR20207011634A KR102408834B1 KR 102408834 B1 KR102408834 B1 KR 102408834B1 KR 1020207011634 A KR1020207011634 A KR 1020207011634A KR 20207011634 A KR20207011634 A KR 20207011634A KR 102408834 B1 KR102408834 B1 KR 102408834B1
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electrode
discharge
laser
discharge chamber
polarity
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KR20200051818A (ko
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토마스 패트릭 더피
폴 크리스토퍼 멜처
월터 데일 길스피
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사이머 엘엘씨
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09705Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381Anodes or particular adaptations thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • H01S3/0382Cathodes or particular adaptations thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388Compositions, materials or coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22Gases
    • H01S3/223Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020207011634A 2017-10-24 2018-10-09 레이저 챔버에서 전극 수명을 연장시키기 위한 장치 및 방법 Active KR102408834B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020227019481A KR102593750B1 (ko) 2017-10-24 2018-10-09 레이저 챔버에서 전극 수명을 연장시키기 위한 장치 및 방법

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762576371P 2017-10-24 2017-10-24
US62/576,371 2017-10-24
PCT/US2018/055078 WO2019083722A1 (en) 2017-10-24 2018-10-09 METHOD AND APPARATUS FOR LIFTING THE LIFE OF AN ELECTRODE IN A LASER CHAMBER

Related Child Applications (1)

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KR1020227019481A Division KR102593750B1 (ko) 2017-10-24 2018-10-09 레이저 챔버에서 전극 수명을 연장시키기 위한 장치 및 방법

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KR20200051818A KR20200051818A (ko) 2020-05-13
KR102408834B1 true KR102408834B1 (ko) 2022-06-13

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KR1020207011634A Active KR102408834B1 (ko) 2017-10-24 2018-10-09 레이저 챔버에서 전극 수명을 연장시키기 위한 장치 및 방법
KR1020227019481A Active KR102593750B1 (ko) 2017-10-24 2018-10-09 레이저 챔버에서 전극 수명을 연장시키기 위한 장치 및 방법

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Country Link
US (1) US11777271B2 (https=)
JP (3) JP7095084B2 (https=)
KR (2) KR102408834B1 (https=)
CN (1) CN111279562A (https=)
TW (1) TWI713276B (https=)
WO (1) WO2019083722A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser
WO2021138019A1 (en) * 2019-12-31 2021-07-08 Cymer, Llc Undercut electrodes for a gas discharge laser chamber
KR20210133084A (ko) 2020-04-28 2021-11-05 삼성전자주식회사 뉴럴 네트워크의 학습 방법 및 장치
JP2024500674A (ja) * 2020-12-22 2024-01-10 サイマー リミテッド ライアビリティ カンパニー ガス放電チャンバブロワのエネルギー消費量を低減すること
WO2025202806A1 (en) 2024-03-28 2025-10-02 Cymer, Llc Systems and methods for electrode position sensing and adjustment

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WO2014046186A1 (ja) * 2012-09-21 2014-03-27 ギガフォトン株式会社 レーザ装置
JP2014511036A (ja) * 2012-03-02 2014-05-01 中國科學院光電研究院 単一チャンバの二重電極放電チャンバ及びエキシマレーザー
US20160365696A1 (en) * 2014-06-05 2016-12-15 Gigaphoton Inc. Laser chamber

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JP2012023172A (ja) * 2010-07-14 2012-02-02 Sumitomo Heavy Ind Ltd 電極及び電極材料の構成比率決定方法
JP2014511036A (ja) * 2012-03-02 2014-05-01 中國科學院光電研究院 単一チャンバの二重電極放電チャンバ及びエキシマレーザー
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Publication number Publication date
US20210111529A1 (en) 2021-04-15
TW201931705A (zh) 2019-08-01
KR102593750B1 (ko) 2023-10-24
JP7095084B2 (ja) 2022-07-04
JP2021500745A (ja) 2021-01-07
WO2019083722A1 (en) 2019-05-02
CN111279562A (zh) 2020-06-12
US11777271B2 (en) 2023-10-03
JP2024009127A (ja) 2024-01-19
JP7417654B2 (ja) 2024-01-18
JP2022093614A (ja) 2022-06-23
KR20220084196A (ko) 2022-06-21
JP7644203B2 (ja) 2025-03-11
TWI713276B (zh) 2020-12-11
KR20200051818A (ko) 2020-05-13

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