TWI713276B - 用於延長在雷射腔室中電極壽命的方法及裝置 - Google Patents

用於延長在雷射腔室中電極壽命的方法及裝置 Download PDF

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TWI713276B
TWI713276B TW107137280A TW107137280A TWI713276B TW I713276 B TWI713276 B TW I713276B TW 107137280 A TW107137280 A TW 107137280A TW 107137280 A TW107137280 A TW 107137280A TW I713276 B TWI713276 B TW I713276B
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Taiwan
Prior art keywords
electrode
discharge
laser
gap
width
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TW107137280A
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English (en)
Chinese (zh)
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TW201931705A (zh
Inventor
湯瑪斯 派翠克 杜菲
保羅 克里斯多福 米契爾
華特 戴爾 吉爾斯比
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美商希瑪有限責任公司
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381—Anodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0382—Cathodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388—Compositions, materials or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW107137280A 2017-10-24 2018-10-23 用於延長在雷射腔室中電極壽命的方法及裝置 TWI713276B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762576371P 2017-10-24 2017-10-24
US62/576,371 2017-10-24

Publications (2)

Publication Number Publication Date
TW201931705A TW201931705A (zh) 2019-08-01
TWI713276B true TWI713276B (zh) 2020-12-11

Family

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Family Applications (1)

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TW107137280A TWI713276B (zh) 2017-10-24 2018-10-23 用於延長在雷射腔室中電極壽命的方法及裝置

Country Status (6)

Country Link
US (1) US11777271B2 (https=)
JP (3) JP7095084B2 (https=)
KR (2) KR102408834B1 (https=)
CN (1) CN111279562A (https=)
TW (1) TWI713276B (https=)
WO (1) WO2019083722A1 (https=)

Families Citing this family (5)

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WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser
WO2021138019A1 (en) * 2019-12-31 2021-07-08 Cymer, Llc Undercut electrodes for a gas discharge laser chamber
KR20210133084A (ko) 2020-04-28 2021-11-05 삼성전자주식회사 뉴럴 네트워크의 학습 방법 및 장치
JP2024500674A (ja) * 2020-12-22 2024-01-10 サイマー リミテッド ライアビリティ カンパニー ガス放電チャンバブロワのエネルギー消費量を低減すること
WO2025202806A1 (en) 2024-03-28 2025-10-02 Cymer, Llc Systems and methods for electrode position sensing and adjustment

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TW200807165A (en) * 2006-05-04 2008-02-01 Asml Netherlands Bv Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
TW200938961A (en) * 2007-12-27 2009-09-16 Asml Netherlands Bv Source constructed and arranged to produce extreme ultraviolet radiation and method for producing extreme ultraviolet radiation
US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US9742141B2 (en) * 2014-06-05 2017-08-22 Gigaphoton Inc. Laser chamber

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JP2913957B2 (ja) * 1990-12-27 1999-06-28 松下電器産業株式会社 放電励起ガスレーザ装置
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JP3815578B2 (ja) * 1996-07-19 2006-08-30 忠弘 大見 エキシマレーザー発振装置
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US6466602B1 (en) * 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes
TW200807165A (en) * 2006-05-04 2008-02-01 Asml Netherlands Bv Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
TW200938961A (en) * 2007-12-27 2009-09-16 Asml Netherlands Bv Source constructed and arranged to produce extreme ultraviolet radiation and method for producing extreme ultraviolet radiation
US9742141B2 (en) * 2014-06-05 2017-08-22 Gigaphoton Inc. Laser chamber

Also Published As

Publication number Publication date
US20210111529A1 (en) 2021-04-15
TW201931705A (zh) 2019-08-01
KR102593750B1 (ko) 2023-10-24
KR102408834B1 (ko) 2022-06-13
JP7095084B2 (ja) 2022-07-04
JP2021500745A (ja) 2021-01-07
WO2019083722A1 (en) 2019-05-02
CN111279562A (zh) 2020-06-12
US11777271B2 (en) 2023-10-03
JP2024009127A (ja) 2024-01-19
JP7417654B2 (ja) 2024-01-18
JP2022093614A (ja) 2022-06-23
KR20220084196A (ko) 2022-06-21
JP7644203B2 (ja) 2025-03-11
KR20200051818A (ko) 2020-05-13

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