CN111279562A - 用于延长激光室中电极寿命的方法和装置 - Google Patents

用于延长激光室中电极寿命的方法和装置 Download PDF

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Publication number
CN111279562A
CN111279562A CN201880069267.2A CN201880069267A CN111279562A CN 111279562 A CN111279562 A CN 111279562A CN 201880069267 A CN201880069267 A CN 201880069267A CN 111279562 A CN111279562 A CN 111279562A
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China
Prior art keywords
electrode
discharge
laser
gap
width
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Pending
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CN201880069267.2A
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English (en)
Chinese (zh)
Inventor
T·P·达菲
P·C·梅尔彻
W·D·吉莱斯皮
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Cymer LLC
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Cymer LLC
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Publication of CN111279562A publication Critical patent/CN111279562A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381—Anodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0382—Cathodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388—Compositions, materials or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201880069267.2A 2017-10-24 2018-10-09 用于延长激光室中电极寿命的方法和装置 Pending CN111279562A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762576371P 2017-10-24 2017-10-24
US62/576,371 2017-10-24
PCT/US2018/055078 WO2019083722A1 (en) 2017-10-24 2018-10-09 METHOD AND APPARATUS FOR LIFTING THE LIFE OF AN ELECTRODE IN A LASER CHAMBER

Publications (1)

Publication Number Publication Date
CN111279562A true CN111279562A (zh) 2020-06-12

Family

ID=66247591

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880069267.2A Pending CN111279562A (zh) 2017-10-24 2018-10-09 用于延长激光室中电极寿命的方法和装置

Country Status (6)

Country Link
US (1) US11777271B2 (https=)
JP (3) JP7095084B2 (https=)
KR (2) KR102408834B1 (https=)
CN (1) CN111279562A (https=)
TW (1) TWI713276B (https=)
WO (1) WO2019083722A1 (https=)

Cited By (1)

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Publication number Priority date Publication date Assignee Title
CN114514477A (zh) * 2019-10-11 2022-05-17 西默有限公司 用于放电激光器的传导构件

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021138019A1 (en) * 2019-12-31 2021-07-08 Cymer, Llc Undercut electrodes for a gas discharge laser chamber
KR20210133084A (ko) 2020-04-28 2021-11-05 삼성전자주식회사 뉴럴 네트워크의 학습 방법 및 장치
JP2024500674A (ja) * 2020-12-22 2024-01-10 サイマー リミテッド ライアビリティ カンパニー ガス放電チャンバブロワのエネルギー消費量を低減すること
WO2025202806A1 (en) 2024-03-28 2025-10-02 Cymer, Llc Systems and methods for electrode position sensing and adjustment

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US6466602B1 (en) * 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes
US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
CN103199412A (zh) * 2013-03-26 2013-07-10 中国科学院光电研究院 具有微流道结构的单腔双电极放电腔
CN104350650A (zh) * 2012-06-07 2015-02-11 西默有限公司 用于激光器腔室的耐腐蚀性电极
US9742141B2 (en) * 2014-06-05 2017-08-22 Gigaphoton Inc. Laser chamber

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JPS63229789A (ja) * 1987-03-19 1988-09-26 Toshiba Corp 高繰返しパルスレ−ザ発振装置
JP2913957B2 (ja) * 1990-12-27 1999-06-28 松下電器産業株式会社 放電励起ガスレーザ装置
JPH0613690A (ja) * 1992-06-27 1994-01-21 Shimadzu Corp エキシマレーザ装置
JP3815578B2 (ja) * 1996-07-19 2006-08-30 忠弘 大見 エキシマレーザー発振装置
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
US6757316B2 (en) 1999-12-27 2004-06-29 Cymer, Inc. Four KHz gas discharge laser
JP2000058944A (ja) 1998-05-20 2000-02-25 Cymer Inc 高信頼性・モジュラ製造高品質狭帯域高繰り返しレ―トｆ２レ―ザ
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DE60001068T2 (de) * 2000-05-04 2004-06-03 Tuilaser Ag Elektrodenmaterial für einen Gasentladungslaser und Gaslaser
US7132123B2 (en) * 2000-06-09 2006-11-07 Cymer, Inc. High rep-rate laser with improved electrodes
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US6151346A (en) * 1997-12-15 2000-11-21 Cymer, Inc. High pulse rate pulse power system with fast rise time and low current
US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6466602B1 (en) * 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes
CN104350650A (zh) * 2012-06-07 2015-02-11 西默有限公司 用于激光器腔室的耐腐蚀性电极
CN103199412A (zh) * 2013-03-26 2013-07-10 中国科学院光电研究院 具有微流道结构的单腔双电极放电腔
US9742141B2 (en) * 2014-06-05 2017-08-22 Gigaphoton Inc. Laser chamber

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114514477A (zh) * 2019-10-11 2022-05-17 西默有限公司 用于放电激光器的传导构件
CN114514477B (zh) * 2019-10-11 2024-08-27 西默有限公司 用于放电激光器的传导构件

Also Published As

Publication number Publication date
US20210111529A1 (en) 2021-04-15
TW201931705A (zh) 2019-08-01
KR102593750B1 (ko) 2023-10-24
KR102408834B1 (ko) 2022-06-13
JP7095084B2 (ja) 2022-07-04
JP2021500745A (ja) 2021-01-07
WO2019083722A1 (en) 2019-05-02
US11777271B2 (en) 2023-10-03
JP2024009127A (ja) 2024-01-19
JP7417654B2 (ja) 2024-01-18
JP2022093614A (ja) 2022-06-23
KR20220084196A (ko) 2022-06-21
JP7644203B2 (ja) 2025-03-11
TWI713276B (zh) 2020-12-11
KR20200051818A (ko) 2020-05-13

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