JP7094372B2 - 転写フィルム、積層体、及びパターン形成方法 - Google Patents

転写フィルム、積層体、及びパターン形成方法 Download PDF

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Publication number
JP7094372B2
JP7094372B2 JP2020538358A JP2020538358A JP7094372B2 JP 7094372 B2 JP7094372 B2 JP 7094372B2 JP 2020538358 A JP2020538358 A JP 2020538358A JP 2020538358 A JP2020538358 A JP 2020538358A JP 7094372 B2 JP7094372 B2 JP 7094372B2
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light
mass
photosensitive layer
layer
transfer film
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Japanese (ja)
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JPWO2020040054A1 (ja
Inventor
達也 霜山
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Fujifilm Corp
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Fujifilm Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2020538358A 2018-08-23 2019-08-16 転写フィルム、積層体、及びパターン形成方法 Active JP7094372B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018156419 2018-08-23
JP2018156419 2018-08-23
PCT/JP2019/032150 WO2020040054A1 (ja) 2018-08-23 2019-08-16 転写フィルム、積層体、及びパターン形成方法

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JPWO2020040054A1 JPWO2020040054A1 (ja) 2021-04-30
JP7094372B2 true JP7094372B2 (ja) 2022-07-01

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JP2020538358A Active JP7094372B2 (ja) 2018-08-23 2019-08-16 転写フィルム、積層体、及びパターン形成方法

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JP (1) JP7094372B2 (zh)
CN (1) CN112352199A (zh)
TW (1) TW202012187A (zh)
WO (1) WO2020040054A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022051261A (ja) * 2020-09-18 2022-03-31 富士フイルム株式会社 積層体の製造方法、反射防止部材、ｌｅｄディスプレイのフロント部材、転写フィルム
WO2023026786A1 (ja) * 2021-08-24 2023-03-02 富士フイルム株式会社 転写フィルム及び積層体の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001133983A (ja) 1999-11-09 2001-05-18 Kansai Paint Co Ltd パターン形成用積層被膜、その積層被膜の製造方法及びその被膜を使用したパターン形成方法
JP2015064707A (ja) 2013-09-25 2015-04-09 大日本印刷株式会社 タッチパネルセンサ及びその製造方法
WO2015141766A1 (ja) 2014-03-20 2015-09-24 富士フイルム株式会社 感光性積層体、転写材料、パターン化された感光性積層体及びその製造方法、タッチパネル、並びに画像表示装置
WO2016047355A1 (ja) 2014-09-22 2016-03-31 富士フイルム株式会社 パターン状被めっき層含有積層体の製造方法、金属層含有積層体の製造方法、タッチパネルセンサー、タッチパネル、パターン状被めっき層含有積層体、金属層含有積層体

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006085116A (ja) * 2004-08-17 2006-03-30 Fuji Photo Film Co Ltd 感光性転写材料並びにパターン形成方法及びパターン
JP5470993B2 (ja) * 2009-04-13 2014-04-16 日立化成株式会社 パターン形成用材料、これを用いたフィルム状エレメント及びパターン形成方法
WO2019044138A1 (ja) * 2017-08-28 2019-03-07 富士フイルム株式会社 感光性転写材料及びその製造方法、並びに、回路配線の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001133983A (ja) 1999-11-09 2001-05-18 Kansai Paint Co Ltd パターン形成用積層被膜、その積層被膜の製造方法及びその被膜を使用したパターン形成方法
JP2015064707A (ja) 2013-09-25 2015-04-09 大日本印刷株式会社 タッチパネルセンサ及びその製造方法
WO2015141766A1 (ja) 2014-03-20 2015-09-24 富士フイルム株式会社 感光性積層体、転写材料、パターン化された感光性積層体及びその製造方法、タッチパネル、並びに画像表示装置
WO2016047355A1 (ja) 2014-09-22 2016-03-31 富士フイルム株式会社 パターン状被めっき層含有積層体の製造方法、金属層含有積層体の製造方法、タッチパネルセンサー、タッチパネル、パターン状被めっき層含有積層体、金属層含有積層体

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CN112352199A (zh) 2021-02-09
TW202012187A (zh) 2020-04-01
WO2020040054A1 (ja) 2020-02-27
JPWO2020040054A1 (ja) 2021-04-30

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