JP7043142B2 - 硬化性組成物、硬化物及び硬化物の製造方法 - Google Patents

硬化性組成物、硬化物及び硬化物の製造方法 Download PDF

Info

Publication number
JP7043142B2
JP7043142B2 JP2018539700A JP2018539700A JP7043142B2 JP 7043142 B2 JP7043142 B2 JP 7043142B2 JP 2018539700 A JP2018539700 A JP 2018539700A JP 2018539700 A JP2018539700 A JP 2018539700A JP 7043142 B2 JP7043142 B2 JP 7043142B2
Authority
JP
Japan
Prior art keywords
group
acid
compound
carbon atoms
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018539700A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2018051941A1 (ja
Inventor
豊史 篠塚
真澄 品川
翔 六谷
大樹 三原
桂典 松平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adeka Corp
Original Assignee
Adeka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adeka Corp filed Critical Adeka Corp
Publication of JPWO2018051941A1 publication Critical patent/JPWO2018051941A1/ja
Application granted granted Critical
Publication of JP7043142B2 publication Critical patent/JP7043142B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/011—Nanostructured additives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerization Catalysts (AREA)
  • Graft Or Block Polymers (AREA)
  • Epoxy Resins (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
JP2018539700A 2016-09-16 2017-09-11 硬化性組成物、硬化物及び硬化物の製造方法 Active JP7043142B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016182210 2016-09-16
JP2016182210 2016-09-16
PCT/JP2017/032651 WO2018051941A1 (ja) 2016-09-16 2017-09-11 硬化性組成物、硬化物及び硬化物の製造方法

Publications (2)

Publication Number Publication Date
JPWO2018051941A1 JPWO2018051941A1 (ja) 2019-07-04
JP7043142B2 true JP7043142B2 (ja) 2022-03-29

Family

ID=61619984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018539700A Active JP7043142B2 (ja) 2016-09-16 2017-09-11 硬化性組成物、硬化物及び硬化物の製造方法

Country Status (5)

Country Link
JP (1) JP7043142B2 (ko)
KR (1) KR102374939B1 (ko)
CN (1) CN109476773B (ko)
TW (1) TWI781112B (ko)
WO (1) WO2018051941A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2020071261A1 (ja) * 2018-10-03 2021-09-24 富士フイルム株式会社 薬液及び薬液収容体
WO2021157680A1 (ja) * 2020-02-07 2021-08-12 三菱瓦斯化学株式会社 樹脂組成物、プリプレグ、積層板、金属箔張積層板、及びプリント配線板
WO2023125968A1 (zh) * 2021-12-30 2023-07-06 浙江三花智能控制股份有限公司 换热器、热管理系统、复合材料及其制备方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010102322A (ja) 2008-09-26 2010-05-06 Fujifilm Corp 平版印刷版の製版方法
JP2010201821A (ja) 2009-03-04 2010-09-16 Asahi Kasei E-Materials Corp 光重合性樹脂積層体、並びにこれを用いた表面撥液性パターン基板、カラーフィルタ、有機エレクトロルミネッセンス素子及び電子ペーパーの製造方法
WO2013031736A1 (ja) 2011-08-30 2013-03-07 旭硝子株式会社 ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子
JP2013171276A (ja) 2012-02-23 2013-09-02 Toyo Ink Sc Holdings Co Ltd 青色感光性着色組成物、およびカラーフィルタ
JP2013195697A (ja) 2012-03-19 2013-09-30 Fujifilm Corp 着色感光性組成物、カラーフィルタ、カラーフィルタの製造方法、および液晶表示装置
JP2014067028A (ja) 2012-09-10 2014-04-17 Mitsubishi Chemicals Corp 遮光材、着色樹脂組成物、カラーフィルタ、及び液晶表示装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4465752B2 (ja) 1998-10-08 2010-05-19 凸版印刷株式会社 電極基板および液晶表示装置
JP3754065B2 (ja) 2003-06-10 2006-03-08 三菱化学株式会社 光重合性組成物及びこれを用いたカラーフィルター
JP2008150428A (ja) 2006-12-14 2008-07-03 Toda Kogyo Corp ブラックマトリックス用着色材及び該ブラックマトリックス用着色材を含有するブラックマトリックス用着色組成物並びにカラーフィルター
DE102006061380A1 (de) * 2006-12-23 2008-06-26 Evonik Degussa Gmbh Kieselsäure und Dispergiermittelhaltige strahlenhärtbare Formulierungen mit erhöhtem Korrosionsschutz auf Metalluntergründen
JP5270113B2 (ja) 2007-06-06 2013-08-21 新日鉄住金化学株式会社 ブラックレジスト用感光性樹脂組成物及びこれを用いた遮光膜並びにカラーフィルター
JPWO2009081483A1 (ja) * 2007-12-25 2011-05-06 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP5498051B2 (ja) 2009-04-24 2014-05-21 新日鉄住金化学株式会社 隔壁及びカラーフィルター
JP2011116840A (ja) * 2009-12-02 2011-06-16 Fujifilm Corp 顔料微粒子分散体、これを用いた光硬化性組成物及びカラーフィルタ
WO2012086610A1 (ja) * 2010-12-20 2012-06-28 旭硝子株式会社 感光性樹脂組成物、隔壁、カラーフィルタおよび有機ｅｌ素子
WO2012147626A1 (ja) * 2011-04-28 2012-11-01 旭硝子株式会社 ネガ型感光性樹脂組成物、硬化膜、隔壁およびブラックマトリックスとその製造方法、カラーフィルタならびに有機ｅｌ素子
TWI641625B (zh) * 2013-03-06 2018-11-21 日商艾迪科股份有限公司 Photocurable composition
JP2015163671A (ja) * 2013-12-13 2015-09-10 株式会社Adeka ラジカル重合性組成物
JP6423215B2 (ja) * 2014-09-18 2018-11-14 株式会社Adeka 光硬化性組成物

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010102322A (ja) 2008-09-26 2010-05-06 Fujifilm Corp 平版印刷版の製版方法
JP2010201821A (ja) 2009-03-04 2010-09-16 Asahi Kasei E-Materials Corp 光重合性樹脂積層体、並びにこれを用いた表面撥液性パターン基板、カラーフィルタ、有機エレクトロルミネッセンス素子及び電子ペーパーの製造方法
WO2013031736A1 (ja) 2011-08-30 2013-03-07 旭硝子株式会社 ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子
JP2013171276A (ja) 2012-02-23 2013-09-02 Toyo Ink Sc Holdings Co Ltd 青色感光性着色組成物、およびカラーフィルタ
JP2013195697A (ja) 2012-03-19 2013-09-30 Fujifilm Corp 着色感光性組成物、カラーフィルタ、カラーフィルタの製造方法、および液晶表示装置
JP2014067028A (ja) 2012-09-10 2014-04-17 Mitsubishi Chemicals Corp 遮光材、着色樹脂組成物、カラーフィルタ、及び液晶表示装置

Also Published As

Publication number Publication date
JPWO2018051941A1 (ja) 2019-07-04
WO2018051941A1 (ja) 2018-03-22
CN109476773B (zh) 2022-05-13
TW201819501A (zh) 2018-06-01
KR102374939B1 (ko) 2022-03-16
CN109476773A (zh) 2019-03-15
TWI781112B (zh) 2022-10-21
KR102374939B9 (ko) 2023-05-11
KR20190055020A (ko) 2019-05-22

Similar Documents

Publication Publication Date Title
WO2018051940A1 (ja) 硬化性組成物及び硬化物
JP6423215B2 (ja) 光硬化性組成物
KR102400771B1 (ko) 흑색 감광성 수지 조성물
JP7049067B2 (ja) 重合性組成物、ブラックマトリクス用感光性組成物及び硬化物
WO2019088055A1 (ja) 化合物、組成物、硬化物及び硬化物の製造方法
WO2018159265A1 (ja) 重合性組成物及びブラックカラムスペーサー用感光性組成物
JP6240924B2 (ja) 光硬化性黒色組成物
KR102597826B1 (ko) 중합성 조성물, 블랙 매트릭스용 감광성 조성물 및 블랙 칼럼 스페이서용 감광성 조성물
JP7043142B2 (ja) 硬化性組成物、硬化物及び硬化物の製造方法
KR102669276B1 (ko) 중합성 조성물, 블랙 매트릭스용 감광성 조성물 및 블랙 칼럼 스페이서용 감광성 조성물
JP2015007729A (ja) 光硬化性黒色組成物
JP6560513B2 (ja) 硬化性組成物
JP7236386B2 (ja) 組成物、硬化物及び硬化物の製造方法
WO2018012383A1 (ja) 硬化性組成物、硬化物及び硬化物の製造方法
JP6420666B2 (ja) 着色剤分散液、着色組成物及びカラーフィルタ
JP2022061912A (ja) 重合性組成物、硬化物、表示装置及び硬化物の製造方法
JP2021187935A (ja) 重合性組成物、ブラックカラムスペーサー用感光性組成物、硬化物及び表示装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20200806

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210608

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210802

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210914

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20211101

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20211116

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220121

C60 Trial request (containing other claim documents, opposition documents)

Free format text: JAPANESE INTERMEDIATE CODE: C60

Effective date: 20220121

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20220128

C21 Notice of transfer of a case for reconsideration by examiners before appeal proceedings

Free format text: JAPANESE INTERMEDIATE CODE: C21

Effective date: 20220201

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20220315

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20220315

R150 Certificate of patent or registration of utility model

Ref document number: 7043142

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150