TWI781112B - 硬化性組合物、硬化物及硬化物之製造方法 - Google Patents

硬化性組合物、硬化物及硬化物之製造方法 Download PDF

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Publication number
TWI781112B
TWI781112B TW106131365A TW106131365A TWI781112B TW I781112 B TWI781112 B TW I781112B TW 106131365 A TW106131365 A TW 106131365A TW 106131365 A TW106131365 A TW 106131365A TW I781112 B TWI781112 B TW I781112B
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Taiwan
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acid
carbon atoms
curable composition
meth
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TW106131365A
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Chinese (zh)
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TW201819501A (zh
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篠塚豊史
品川真澄
六谷翔
三原大樹
松平桂典
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日商艾迪科股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/011—Nanostructured additives

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Graft Or Block Polymers (AREA)
  • Epoxy Resins (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
TW106131365A 2016-09-16 2017-09-13 硬化性組合物、硬化物及硬化物之製造方法 TWI781112B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016182210 2016-09-16
JP??2016-182210 2016-09-16

Publications (2)

Publication Number Publication Date
TW201819501A TW201819501A (zh) 2018-06-01
TWI781112B true TWI781112B (zh) 2022-10-21

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JP (1) JP7043142B2 (ko)
KR (1) KR102374939B1 (ko)
CN (1) CN109476773B (ko)
TW (1) TWI781112B (ko)
WO (1) WO2018051941A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102650361B1 (ko) * 2018-10-03 2024-03-22 후지필름 가부시키가이샤 약액 및 약액 수용체
WO2021157680A1 (ja) * 2020-02-07 2021-08-12 三菱瓦斯化学株式会社 樹脂組成物、プリプレグ、積層板、金属箔張積層板、及びプリント配線板
WO2023125968A1 (zh) * 2021-12-30 2023-07-06 浙江三花智能控制股份有限公司 换热器、热管理系统、复合材料及其制备方法

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JP2010201821A (ja) * 2009-03-04 2010-09-16 Asahi Kasei E-Materials Corp 光重合性樹脂積層体、並びにこれを用いた表面撥液性パターン基板、カラーフィルタ、有機エレクトロルミネッセンス素子及び電子ペーパーの製造方法
TW201437235A (zh) * 2013-03-06 2014-10-01 Adeka Corp 光硬化性組合物

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JP4465752B2 (ja) 1998-10-08 2010-05-19 凸版印刷株式会社 電極基板および液晶表示装置
JP3754065B2 (ja) * 2003-06-10 2006-03-08 三菱化学株式会社 光重合性組成物及びこれを用いたカラーフィルター
JP2008150428A (ja) 2006-12-14 2008-07-03 Toda Kogyo Corp ブラックマトリックス用着色材及び該ブラックマトリックス用着色材を含有するブラックマトリックス用着色組成物並びにカラーフィルター
DE102006061380A1 (de) * 2006-12-23 2008-06-26 Evonik Degussa Gmbh Kieselsäure und Dispergiermittelhaltige strahlenhärtbare Formulierungen mit erhöhtem Korrosionsschutz auf Metalluntergründen
JP5270113B2 (ja) 2007-06-06 2013-08-21 新日鉄住金化学株式会社 ブラックレジスト用感光性樹脂組成物及びこれを用いた遮光膜並びにカラーフィルター
EP2223910B1 (en) * 2007-12-25 2012-11-07 Adeka Corporation Oxime esters and photopolymerization initiators containing the same
JP2010102322A (ja) * 2008-09-26 2010-05-06 Fujifilm Corp 平版印刷版の製版方法
JP5498051B2 (ja) 2009-04-24 2014-05-21 新日鉄住金化学株式会社 隔壁及びカラーフィルター
JP2011116840A (ja) * 2009-12-02 2011-06-16 Fujifilm Corp 顔料微粒子分散体、これを用いた光硬化性組成物及びカラーフィルタ
KR101817378B1 (ko) * 2010-12-20 2018-01-11 아사히 가라스 가부시키가이샤 감광성 수지 조성물, 격벽, 컬러 필터 및 유기 ｅｌ 소자
JP5910629B2 (ja) * 2011-04-28 2016-04-27 旭硝子株式会社 ネガ型感光性樹脂組成物、硬化膜、隔壁およびブラックマトリックスとその製造方法、カラーフィルタならびに有機ｅｌ素子
KR101940844B1 (ko) * 2011-08-30 2019-01-21 에이지씨 가부시키가이샤 네거티브형 감광성 수지 조성물, 격벽, 블랙 매트릭스 및 광학 소자
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JP6241153B2 (ja) * 2012-09-10 2017-12-06 三菱ケミカル株式会社 遮光材、着色樹脂組成物、カラーフィルタ、及び液晶表示装置
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JP2010201821A (ja) * 2009-03-04 2010-09-16 Asahi Kasei E-Materials Corp 光重合性樹脂積層体、並びにこれを用いた表面撥液性パターン基板、カラーフィルタ、有機エレクトロルミネッセンス素子及び電子ペーパーの製造方法
TW201437235A (zh) * 2013-03-06 2014-10-01 Adeka Corp 光硬化性組合物

Also Published As

Publication number Publication date
WO2018051941A1 (ja) 2018-03-22
KR102374939B1 (ko) 2022-03-16
JP7043142B2 (ja) 2022-03-29
KR20190055020A (ko) 2019-05-22
JPWO2018051941A1 (ja) 2019-07-04
KR102374939B9 (ko) 2023-05-11
TW201819501A (zh) 2018-06-01
CN109476773A (zh) 2019-03-15
CN109476773B (zh) 2022-05-13

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