JP6994334B2 - 加工装置 - Google Patents
加工装置 Download PDFInfo
- Publication number
- JP6994334B2 JP6994334B2 JP2017181135A JP2017181135A JP6994334B2 JP 6994334 B2 JP6994334 B2 JP 6994334B2 JP 2017181135 A JP2017181135 A JP 2017181135A JP 2017181135 A JP2017181135 A JP 2017181135A JP 6994334 B2 JP6994334 B2 JP 6994334B2
- Authority
- JP
- Japan
- Prior art keywords
- motor
- holding
- cooling
- motor bracket
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
- B24B37/105—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
- B24B37/107—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
- B24B41/068—Table-like supports for panels, sheets or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017181135A JP6994334B2 (ja) | 2017-09-21 | 2017-09-21 | 加工装置 |
KR1020180101177A KR102541671B1 (ko) | 2017-09-21 | 2018-08-28 | 가공 장치 |
CN201811079560.5A CN109531428B (zh) | 2017-09-21 | 2018-09-17 | 加工装置 |
TW107132872A TWI767058B (zh) | 2017-09-21 | 2018-09-18 | 加工裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017181135A JP6994334B2 (ja) | 2017-09-21 | 2017-09-21 | 加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019055450A JP2019055450A (ja) | 2019-04-11 |
JP6994334B2 true JP6994334B2 (ja) | 2022-01-14 |
Family
ID=65841242
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017181135A Active JP6994334B2 (ja) | 2017-09-21 | 2017-09-21 | 加工装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6994334B2 (zh) |
KR (1) | KR102541671B1 (zh) |
CN (1) | CN109531428B (zh) |
TW (1) | TWI767058B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111734799B (zh) * | 2020-07-20 | 2020-12-08 | 上海陛通半导体能源科技股份有限公司 | 可去除径向力的旋转装置、加热器旋转系统及半导体设备 |
JP2023145215A (ja) * | 2022-03-28 | 2023-10-11 | 株式会社東京精密 | ウエハ加工装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003025198A (ja) | 2001-07-10 | 2003-01-29 | Sharp Corp | 面取り装置および被面取り基板 |
JP2008006535A (ja) | 2006-06-29 | 2008-01-17 | Nidec Sankyo Corp | 産業用ロボット |
JP2016112635A (ja) | 2014-12-12 | 2016-06-23 | Towa株式会社 | 切断装置及び切断方法 |
JP2017042875A (ja) | 2015-08-27 | 2017-03-02 | 株式会社ディスコ | 研削装置 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4657455A (en) * | 1984-11-16 | 1987-04-14 | Cemtronics | Concrete machine tools |
JPH05285781A (ja) * | 1992-04-10 | 1993-11-02 | Sony Corp | エアスピンドルユニット |
JP3449505B2 (ja) * | 1995-02-23 | 2003-09-22 | 株式会社ディスコ | 研磨装置におけるセットアップ方法 |
DE102005044832A1 (de) * | 2005-09-20 | 2007-03-22 | Siemens Ag | Elektrische Maschine |
TW200827086A (en) * | 2006-12-28 | 2008-07-01 | Hiwin Tech Corp | Cooling device of linear module |
JP5318517B2 (ja) | 2008-10-10 | 2013-10-16 | 株式会社ディスコ | チャックテーブル機構 |
JP5335448B2 (ja) * | 2009-01-19 | 2013-11-06 | 株式会社ディスコ | 加工装置 |
CN101820197A (zh) * | 2009-02-27 | 2010-09-01 | 鸿富锦精密工业(深圳)有限公司 | 马达安装座 |
JP2011051027A (ja) * | 2009-08-31 | 2011-03-17 | Nagase Integrex Co Ltd | 連結フランジ |
TWM389601U (en) * | 2010-04-01 | 2010-10-01 | Prec Machinery Res & Dev Ct | Motor fixing plate with heat dissipating features |
CN101924415A (zh) * | 2010-08-27 | 2010-12-22 | 湘潭市长航电机有限公司 | 一种水冷电机 |
CN202114607U (zh) * | 2011-06-08 | 2012-01-18 | 云南蓝晶科技股份有限公司 | 晶片抛光机 |
JP2013123309A (ja) * | 2011-12-09 | 2013-06-20 | Fanuc Ltd | 放熱性能を向上させた電動機冷却プレート |
CN203574480U (zh) * | 2013-10-10 | 2014-04-30 | 苏州上金数控科技有限公司 | 主轴电机冷却座 |
CN204992883U (zh) * | 2015-09-02 | 2016-01-20 | 东莞市启航精密数控设备有限公司 | 液冷式电机座 |
-
2017
- 2017-09-21 JP JP2017181135A patent/JP6994334B2/ja active Active
-
2018
- 2018-08-28 KR KR1020180101177A patent/KR102541671B1/ko active IP Right Grant
- 2018-09-17 CN CN201811079560.5A patent/CN109531428B/zh active Active
- 2018-09-18 TW TW107132872A patent/TWI767058B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003025198A (ja) | 2001-07-10 | 2003-01-29 | Sharp Corp | 面取り装置および被面取り基板 |
JP2008006535A (ja) | 2006-06-29 | 2008-01-17 | Nidec Sankyo Corp | 産業用ロボット |
JP2016112635A (ja) | 2014-12-12 | 2016-06-23 | Towa株式会社 | 切断装置及び切断方法 |
JP2017042875A (ja) | 2015-08-27 | 2017-03-02 | 株式会社ディスコ | 研削装置 |
Also Published As
Publication number | Publication date |
---|---|
KR102541671B1 (ko) | 2023-06-08 |
CN109531428B (zh) | 2022-06-24 |
TWI767058B (zh) | 2022-06-11 |
TW201914751A (zh) | 2019-04-16 |
KR20190033423A (ko) | 2019-03-29 |
CN109531428A (zh) | 2019-03-29 |
JP2019055450A (ja) | 2019-04-11 |
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