JP6987015B2 - 半導体装置 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims description 186
- 230000002093 peripheral effect Effects 0.000 claims description 187
- 239000000758 substrate Substances 0.000 claims description 43
- 230000005684 electric field Effects 0.000 claims description 19
- 239000010410 layer Substances 0.000 description 227
- 238000000034 method Methods 0.000 description 28
- 238000004519 manufacturing process Methods 0.000 description 16
- 239000002019 doping agent Substances 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 229910000789 Aluminium-silicon alloy Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
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Description
図1を参照して、実施の形態1に係る半導体装置1を説明する。半導体装置1は、半導体基板2と、第1の電極20と、第2の電極30とを主に備える。
本実施の形態の半導体装置1は、半導体基板2を備える。半導体基板2は、半導体素子3が設けられた活性領域6と、活性領域6を取り囲む外周領域7とを含む。半導体基板2は、おもて面2aと裏面2bとを有している。半導体素子3は、n-ドリフト領域5と、pベース領域10と、n+型エミッタ領域14と、ゲート絶縁膜17と、ゲート電極18と、p+コレクタ層25とを含む。ゲート絶縁膜17は、n+型エミッタ領域14とn-ドリフト領域5との間のpベース領域10の部分12上に設けられている。ゲート電極18は、ゲート絶縁膜17を挟んでpベース領域10の部分12に対向している。p+コレクタ層25は、裏面2bに設けられている。外周領域7は、n-ドリフト領域5と、p+裏面外周層26とを含む。n-ドリフト領域5は、活性領域6から外周領域7に延在している。p+裏面外周層26は、n-ドリフト領域5の裏面2bの側に設けられている。p+裏面外周層26における第1の正孔濃度は、p+コレクタ層25における第2の正孔濃度よりも大きい。
図6を参照して、実施の形態2に係る半導体装置1bを説明する。本実施の形態の半導体装置1bは、実施の形態1の半導体装置1と同様の構成を備え、同様の効果を奏するが、主に以下の点で異なる。
図7を参照して、実施の形態3に係る半導体装置1cを説明する。本実施の形態の半導体装置1cは、実施の形態1の半導体装置1と同様の構成を備えるが、主に以下の点で異なる。
p+裏面外周層26とn裏面外周層27とによって、pn接合が形成されている。低電圧期間では、第1の電極20と第2の電極30との間に相対的に小さなオン電圧が印加されるため、p+裏面外周層26とn裏面外周層27とによって形成されるpn接合に印加される逆バイアス電圧の絶対値は小さい。正孔は、このpn接合を通り抜けることができない。低電圧期間において、このpn接合は、第2の電極30の外周部分30p及びp+裏面外周層26からn-ドリフト領域5に正孔が注入されることを阻止し、n-ドリフト領域5における正孔の濃度の増加を抑制することができる。半導体装置1cのターンオフ過程においてn-ドリフト領域5に蓄積されていた正孔は、より短時間でn-ドリフト領域5から排出される。ターンオフ過程において、半導体装置1cの電力損失が減少し得る。
図9を参照して、実施の形態4に係る半導体装置1dを説明する。本実施の形態の半導体装置1dは、実施の形態3の半導体装置1cと同様の構成を備えるが、主に以下の点で異なる。
Claims (8)
- 半導体素子が設けられた活性領域と、前記活性領域を取り囲む外周領域とを含む半導体基板を備え、前記半導体基板は、おもて面と裏面とを有し、
前記半導体素子は、n - ドリフト領域と、pベース領域と、n + 型エミッタ領域と、前記n + 型エミッタ領域と前記n - ドリフト領域との間の前記pベース領域の部分上に設けられているゲート絶縁膜と、前記ゲート絶縁膜を挟んで前記pベース領域の前記部分に対向するゲート電極と、前記裏面に設けられているp + コレクタ層とを含み、
前記外周領域は、前記n - ドリフト領域と、p + 裏面外周層とを含み、前記n - ドリフト領域は、前記活性領域から前記外周領域に延在しており、前記p + 裏面外周層は、前記n - ドリフト領域の前記裏面の側に設けられており、
前記p + 裏面外周層における第1の正孔濃度は、前記p + コレクタ層における第2の正孔濃度よりも大きく、
前記p+裏面外周層は、前記p+コレクタ層より厚い、半導体装置。 - 前記活性領域における前記n-ドリフト領域の第1端は、前記外周領域における前記n-ドリフト領域の第2端より、前記裏面側に位置しており、
前記第1端は、前記活性領域における前記n-ドリフト領域の前記裏面の近位端であり、
前記第2端は、前記外周領域における前記n-ドリフト領域の前記裏面の近位端である、請求項1に記載の半導体装置。 - 半導体素子が設けられた活性領域と、前記活性領域を取り囲む外周領域とを含む半導体基板を備え、前記半導体基板は、おもて面と裏面とを有し、
前記半導体素子は、n - ドリフト領域と、pベース領域と、n + 型エミッタ領域と、前記n + 型エミッタ領域と前記n - ドリフト領域との間の前記pベース領域の部分上に設けられているゲート絶縁膜と、前記ゲート絶縁膜を挟んで前記pベース領域の前記部分に対向するゲート電極と、前記裏面に設けられているp + コレクタ層とを含み、
前記外周領域は、前記n - ドリフト領域と、p + 裏面外周層とを含み、前記n - ドリフト領域は、前記活性領域から前記外周領域に延在しており、前記p + 裏面外周層は、前記n - ドリフト領域の前記裏面の側に設けられており、
前記p + 裏面外周層における第1の正孔濃度は、前記p + コレクタ層における第2の正孔濃度よりも大きく、
前記外周領域は、前記p+裏面外周層に接しているn裏面外周層をさらに含み、
前記n裏面外周層は、前記p+裏面外周層の前記裏面の側に設けられており、
前記p + 裏面外周層及び前記n裏面外周層は、各々、前記p + コレクタ層に接している、半導体装置。 - 前記n裏面外周層は、前記p+裏面外周層より薄い、請求項3に記載の半導体装置。
- 前記p+裏面外周層は、前記p+コレクタ層に接している、請求項1または請求項2に記載の半導体装置。
- 前記外周領域は、前記p+裏面外周層に接しているn裏面外周層をさらに含み、
前記n裏面外周層は、前記p+裏面外周層と前記p+コレクタ層との間に設けられている、請求項1または請求項2に記載の半導体装置。 - 前記半導体素子及び前記外周領域は、前記n-ドリフト領域の前記裏面の側にnバッファ層を含み、
前記nバッファ層における第1の電子濃度は、前記n-ドリフト領域における第2の電子濃度よりも大きく、
前記活性領域において、前記nバッファ層は、前記n-ドリフト領域と前記p+コレクタ層とに接し、
前記外周領域において、前記p+裏面外周層は、前記nバッファ層の前記裏面の側に設けられている、請求項1から請求項6のいずれか1項に記載の半導体装置。 - 前記外周領域は、前記おもて面に、電界制限リング構造を含む、請求項1から請求項7のいずれか1項に記載の半導体装置。
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JP2018084941A JP6987015B2 (ja) | 2018-04-26 | 2018-04-26 | 半導体装置 |
US16/233,830 US10727306B2 (en) | 2018-04-26 | 2018-12-27 | Semiconductor apparatus |
DE102019201834.3A DE102019201834A1 (de) | 2018-04-26 | 2019-02-13 | Halbleitergerät |
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JP2009141067A (ja) | 2007-12-05 | 2009-06-25 | Toyota Motor Corp | 半導体装置 |
JP2009176772A (ja) * | 2008-01-21 | 2009-08-06 | Denso Corp | 半導体装置 |
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KR20150076814A (ko) * | 2013-12-27 | 2015-07-07 | 삼성전기주식회사 | 전력 반도체 소자 |
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