JP6970346B2 - 半導体装置の製造方法 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims description 48
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 238000007747 plating Methods 0.000 claims description 99
- 238000000034 method Methods 0.000 claims description 27
- 229920002120 photoresistant polymer Polymers 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000001000 micrograph Methods 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 239000000470 constituent Substances 0.000 description 2
- CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
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- H01L2224/131—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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Description
各半導体ウェハに等間隔で複数の開口が配列されたフォトレジストパターンを形成して、それぞれの半導体ウェハについて異なるめっき条件で電極を形成した。そして、各半導体ウェハにおける複数の開口に形成された電極のうち、上面に凹みが発生した電極の割合を凹み発生率として、その凹み発生率をもって電極形成条件を比較した。フォトレジストの厚さは65μmである。フォトレジストの開口の平面視の形状は円形であり、その直径が約80μmである。電極をめっき法により形成する。この電極は、平面視の形状が直径約80μmの円形であり、また膜厚が55μmである。電極は銅を用いて形成する。
めっき処理にかかる時間が長くなることが分かる。本発明にかかる製造方法のように、めっき処理を2段階に分けて、まず比較的低い電流密度の第1電流密度で比較的薄い第1膜厚の第1めっき層を形成した後、その上面に比較的高い電流密度の第2電流密度で第1膜厚より厚い第2膜厚の第2めっき層を形成する場合、めっき処理に要する時間を大幅に短縮しながら、上面の平坦性が優れた電極を得られることが確認できる。
102 基板
102a 表面
103 半導体素子
104 絶縁層
104a 開口
106 導電層
112 フォトレジスト
112a 開口
120 電極
122 第1めっき層
124 第2めっき層
Claims (3)
- 基板と、前記基板の表面に形成された半導体素子と、前記基板の表面に形成され前記半導体素子の上部に第1開口を有する絶縁層と、前記第1開口の内側の領域と前記第1開口の内側の領域から連続する前記第1開口の外側の領域とに形成された導電層と、を含む半導体ウェハを準備する工程と、
前記第1開口の上部に設けられ、平面視における最大幅が前記第1開口よりも大きく、平面視における最大幅が100μm以下である第2開口を有し、厚さが50〜70μmであるフォトレジストを前記半導体ウェハの上面に形成するフォトレジスト形成工程と、
めっき法によって前記第1開口及び前記第2開口に銅からなる電極を形成する電極形成工程と、を含む半導体装置の製造方法であって、
前記導電層は、平面視において前記第2開口と重なる前記半導体素子の上面のうち前記絶縁層から露出する前記半導体素子の第1上面から平面視において前記第2開口と重なる前記絶縁層の上面までの領域を連続して少なくとも被覆し、
前記電極形成工程は、
第1電流密度で第1膜厚である第1めっき層を形成する工程と、
前記第1電流密度より電流密度が高い第2電流密度で、前記第1めっき層の上面に前記第1膜厚より膜厚が厚い第2膜厚である第2めっき層を形成する工程と、を含み、
前記第1めっき層を形成する工程において、断面視で前記第1開口の上部に位置する前記第1めっき層の前記上面と前記半導体素子の前記第1上面との間の距離と、断面視で前記第1開口の外側に位置する前記第1めっき層の前記上面と前記半導体素子の上面のうち前記絶縁層で被覆される第2上面との間の距離とが、略同じとなるように前記第1めっき層を形成することを特徴とする半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法であって、
前記第1電流密度が0.1〜0.7mA/mm2で、前記第2電流密度が0.8〜2.0mA/mm2である
ことを特徴とする半導体装置の製造方法。 - 請求項1または2に記載の半導体装置の製造方法であって、
前記第2膜厚が前記第1膜厚の3〜5倍である
ことを特徴とする半導体装置の製造方法。
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JP2018178777A JP6970346B2 (ja) | 2018-09-25 | 2018-09-25 | 半導体装置の製造方法 |
US16/580,945 US11145513B2 (en) | 2018-09-25 | 2019-09-24 | Method of manufacturing semiconductor device |
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JP3176973B2 (ja) | 1992-01-31 | 2001-06-18 | 株式会社東芝 | 半導体装置の製造方法 |
JP3972813B2 (ja) | 2002-12-24 | 2007-09-05 | セイコーエプソン株式会社 | 半導体装置の製造方法 |
JP4072141B2 (ja) | 2003-07-31 | 2008-04-09 | 沖電気工業株式会社 | 半導体装置の製造方法 |
JP4713290B2 (ja) | 2005-09-30 | 2011-06-29 | エヌ・イーケムキャット株式会社 | 金バンプ又は金配線の形成方法 |
JP5446126B2 (ja) | 2008-05-13 | 2014-03-19 | 富士通セミコンダクター株式会社 | 電解メッキ方法および半導体装置の製造方法 |
JP5146774B2 (ja) | 2009-02-27 | 2013-02-20 | 住友金属鉱山株式会社 | 二層めっき基板とその製造方法 |
JP2011014607A (ja) | 2009-06-30 | 2011-01-20 | Renesas Electronics Corp | 半導体装置の製造方法 |
JP5394461B2 (ja) | 2011-06-28 | 2014-01-22 | シャープ株式会社 | 光半導体素子の製造方法 |
JP2014157906A (ja) | 2013-02-15 | 2014-08-28 | Fujitsu Semiconductor Ltd | 半導体装置の製造方法及び半導体装置 |
JP6450560B2 (ja) | 2014-10-24 | 2019-01-09 | 新日本無線株式会社 | 半導体装置およびその製造方法 |
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