JP6926873B2 - Al及びO含有シリコン材料 - Google Patents
Al及びO含有シリコン材料 Download PDFInfo
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- JP6926873B2 JP6926873B2 JP2017177198A JP2017177198A JP6926873B2 JP 6926873 B2 JP6926873 B2 JP 6926873B2 JP 2017177198 A JP2017177198 A JP 2017177198A JP 2017177198 A JP2017177198 A JP 2017177198A JP 6926873 B2 JP6926873 B2 JP 6926873B2
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- Prior art keywords
- containing silicon
- negative electrode
- silicon material
- mass
- electrode active
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052782 aluminium Inorganic materials 0.000 title claims description 171
- 239000002210 silicon-based material Substances 0.000 title claims description 170
- 229910052760 oxygen Inorganic materials 0.000 title claims description 154
- 229910052710 silicon Inorganic materials 0.000 claims description 61
- 239000007773 negative electrode material Substances 0.000 claims description 46
- 229910052751 metal Inorganic materials 0.000 claims description 35
- 239000002184 metal Substances 0.000 claims description 35
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 32
- 229910052791 calcium Inorganic materials 0.000 claims description 31
- 239000007787 solid Substances 0.000 claims description 31
- 229910052799 carbon Inorganic materials 0.000 claims description 30
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 29
- 239000010703 silicon Substances 0.000 claims description 29
- 238000010438 heat treatment Methods 0.000 claims description 23
- 239000002243 precursor Substances 0.000 claims description 20
- 238000001816 cooling Methods 0.000 claims description 17
- 229910018516 Al—O Inorganic materials 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 238000010521 absorption reaction Methods 0.000 claims description 11
- 238000005259 measurement Methods 0.000 claims description 11
- 238000000137 annealing Methods 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 150000002367 halogens Chemical class 0.000 claims description 8
- 239000011260 aqueous acid Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 229910021419 crystalline silicon Inorganic materials 0.000 claims 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 55
- 229910001416 lithium ion Inorganic materials 0.000 description 55
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 28
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 28
- 239000000243 solution Substances 0.000 description 25
- 239000012298 atmosphere Substances 0.000 description 23
- 238000000034 method Methods 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 22
- 239000011230 binding agent Substances 0.000 description 21
- -1 hydrochlorite Chemical compound 0.000 description 19
- 239000000203 mixture Substances 0.000 description 19
- 239000010410 layer Substances 0.000 description 18
- 238000011156 evaluation Methods 0.000 description 17
- 239000012752 auxiliary agent Substances 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 239000002253 acid Substances 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- 239000007774 positive electrode material Substances 0.000 description 14
- 239000002002 slurry Substances 0.000 description 14
- 229920002125 Sokalan® Polymers 0.000 description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 13
- 239000001301 oxygen Substances 0.000 description 13
- 239000004584 polyacrylic acid Substances 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 239000006104 solid solution Substances 0.000 description 12
- 229910004706 CaSi2 Inorganic materials 0.000 description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 239000008151 electrolyte solution Substances 0.000 description 11
- 230000014759 maintenance of location Effects 0.000 description 11
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 239000011149 active material Substances 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 10
- 239000011889 copper foil Substances 0.000 description 10
- 238000000921 elemental analysis Methods 0.000 description 10
- 239000011888 foil Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 229910001873 dinitrogen Inorganic materials 0.000 description 8
- 229910052742 iron Inorganic materials 0.000 description 8
- 229910052744 lithium Inorganic materials 0.000 description 8
- 229910004709 CaSi Inorganic materials 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 238000010587 phase diagram Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 5
- 229910013870 LiPF 6 Inorganic materials 0.000 description 5
- 239000006230 acetylene black Substances 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000003125 aqueous solvent Substances 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000002800 charge carrier Substances 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 230000006698 induction Effects 0.000 description 5
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 4
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- 238000000833 X-ray absorption fine structure spectroscopy Methods 0.000 description 4
- 238000007599 discharging Methods 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229920000548 poly(silane) polymer Polymers 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- SBLRHMKNNHXPHG-UHFFFAOYSA-N 4-fluoro-1,3-dioxolan-2-one Chemical compound FC1COC(=O)O1 SBLRHMKNNHXPHG-UHFFFAOYSA-N 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 229910018557 Si O Inorganic materials 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 3
- 238000009689 gas atomisation Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- 229920013683 Celanese Polymers 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910013063 LiBF 4 Inorganic materials 0.000 description 2
- 229910013684 LiClO 4 Inorganic materials 0.000 description 2
- 229910013275 LiMPO Inorganic materials 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 238000005273 aeration Methods 0.000 description 2
- NBZSRYLFPDLEKA-UHFFFAOYSA-N argon propane Chemical compound [Ar].CCC NBZSRYLFPDLEKA-UHFFFAOYSA-N 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
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- 230000008859 change Effects 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229920006037 cross link polymer Polymers 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910003002 lithium salt Inorganic materials 0.000 description 2
- 159000000002 lithium salts Chemical class 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000005543 nano-size silicon particle Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
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- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
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- 229910052700 potassium Inorganic materials 0.000 description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 2
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- 238000002230 thermal chemical vapour deposition Methods 0.000 description 2
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- 150000003624 transition metals Chemical class 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 238000009692 water atomization Methods 0.000 description 2
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- ZZXUZKXVROWEIF-UHFFFAOYSA-N 1,2-butylene carbonate Chemical compound CCC1COC(=O)O1 ZZXUZKXVROWEIF-UHFFFAOYSA-N 0.000 description 1
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- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
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- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- OMQHDIHZSDEIFH-UHFFFAOYSA-N 3-Acetyldihydro-2(3H)-furanone Chemical compound CC(=O)C1CCOC1=O OMQHDIHZSDEIFH-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
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- QGHDLJAZIIFENW-UHFFFAOYSA-N 4-[1,1,1,3,3,3-hexafluoro-2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical group C1=C(CC=C)C(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C(CC=C)=C1 QGHDLJAZIIFENW-UHFFFAOYSA-N 0.000 description 1
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-N acetoacetic acid Chemical compound CC(=O)CC(O)=O WDJHALXBUFZDSR-UHFFFAOYSA-N 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
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- 229910045601 alloy Inorganic materials 0.000 description 1
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Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017177198A JP6926873B2 (ja) | 2017-09-14 | 2017-09-14 | Al及びO含有シリコン材料 |
| CN201880059429.4A CN111095628B (zh) | 2017-09-14 | 2018-06-18 | 含有含Al和O的硅材料的负极活性物质 |
| US16/645,657 US11688852B2 (en) | 2017-09-14 | 2018-06-18 | Negative electrode active material including Al- and O-containing silicon material |
| PCT/JP2018/023075 WO2019053982A1 (ja) | 2017-09-14 | 2018-06-18 | Al及びO含有シリコン材料を含む負極活物質 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017177198A JP6926873B2 (ja) | 2017-09-14 | 2017-09-14 | Al及びO含有シリコン材料 |
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| JP2019052061A JP2019052061A (ja) | 2019-04-04 |
| JP2019052061A5 JP2019052061A5 (https=) | 2020-01-30 |
| JP6926873B2 true JP6926873B2 (ja) | 2021-08-25 |
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| JP (1) | JP6926873B2 (https=) |
| CN (1) | CN111095628B (https=) |
| WO (1) | WO2019053982A1 (https=) |
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| US11769872B2 (en) * | 2021-03-17 | 2023-09-26 | GM Global Technology Operations LLC | Pre-lithiated silicon particles and methods of forming the same |
| KR102537059B1 (ko) | 2022-06-23 | 2023-05-30 | 에스케이온 주식회사 | 리튬 이차전지용 음극 및 이의 제조방법 |
| CN116868373B (zh) * | 2023-02-28 | 2024-08-09 | 宁德时代新能源科技股份有限公司 | 硅基负极活性材料、二次电池及用电装置 |
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| CN101453016A (zh) * | 2007-11-29 | 2009-06-10 | 比亚迪股份有限公司 | 负极活性材料及其制备方法和负极及锂离子电池 |
| JP5471284B2 (ja) | 2009-10-20 | 2014-04-16 | 株式会社豊田中央研究所 | リチウム二次電池用電極及びそれを備えたリチウム二次電池 |
| JP5842985B2 (ja) * | 2009-12-24 | 2016-01-13 | ソニー株式会社 | リチウムイオン二次電池、リチウムイオン二次電池用負極、電動工具、電気自動車および電力貯蔵システム |
| JP5666378B2 (ja) * | 2010-05-24 | 2015-02-12 | 信越化学工業株式会社 | 非水電解質二次電池用負極活物質の製造方法及び非水電解質二次電池用負極活物質並びに非水電解質二次電池用負極材、非水電解質二次電池用負極、非水電解質二次電池 |
| JP6010429B2 (ja) | 2012-11-08 | 2016-10-19 | 信越化学工業株式会社 | 非水電解質二次電池用負極活物質用の珪素含有粒子の製造方法、非水電解質二次電池用負極材の製造方法、及び非水電解質二次電池の製造方法 |
| DE112013005568T5 (de) | 2012-11-21 | 2015-09-17 | Kabushiki Kaisha Toyota Jidoshokki | Nanokristallines Siliciummaterial, Aktivmaterial für eine negative Elektrode, Herstellungsverfahren für das Material und elektrisches Speichergerät |
| DE112013006722B4 (de) * | 2013-02-22 | 2020-10-15 | Kabushiki Kaisha Toyota Jidoshokki | Negativelektrodenaktivmaterial, Herstellungsverfahren für selbiges und elektrischer Speicherapparat |
| JP6068237B2 (ja) | 2013-04-02 | 2017-01-25 | 本田技研工業株式会社 | 電解質−負極構造体及びそれを備えるリチウムイオン二次電池 |
| US20150044560A1 (en) | 2013-08-09 | 2015-02-12 | Semiconductor Energy Laboratory Co., Ltd. | Electrode for lithium-ion secondary battery and manufacturing method thereof, and lithium-ion secondary battery |
| WO2015097974A1 (ja) * | 2013-12-25 | 2015-07-02 | 株式会社豊田自動織機 | 負極活物質とその製造方法及び蓄電装置 |
| KR102143708B1 (ko) * | 2014-01-31 | 2020-08-11 | 가부시키가이샤 도요다 지도숏키 | 비수계 이차 전지용 부극 및 비수계 이차 전지, 부극 활물질 및 그 제조 방법, 나노 실리콘과 탄소층과 카티온성 폴리머층을 구비하는 복합체, 나노 실리콘과 탄소층으로 이루어지는 복합체의 제조 방법 |
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| JP6318859B2 (ja) * | 2014-05-29 | 2018-05-09 | 株式会社豊田自動織機 | 銅含有シリコン材料及びその製造方法と負極活物質及び二次電池 |
| EP3150555A4 (en) * | 2014-05-29 | 2018-02-21 | Kabushiki Kaisha Toyota Jidoshokki | Silicon material and secondary cell negative electrode |
| WO2016031099A1 (ja) * | 2014-08-27 | 2016-03-03 | 株式会社豊田自動織機 | 炭素被覆シリコン材料の製造方法 |
| WO2016031146A1 (ja) * | 2014-08-27 | 2016-03-03 | 株式会社豊田自動織機 | 炭素被覆シリコン材料の製造方法 |
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| JP6548959B2 (ja) * | 2015-06-02 | 2019-07-24 | 信越化学工業株式会社 | 非水電解質二次電池用負極活物質、非水電解質二次電池用負極、及び非水電解質二次電池、並びに負極活物質粒子の製造方法 |
| JP6445956B2 (ja) | 2015-11-17 | 2018-12-26 | 信越化学工業株式会社 | 負極活物質、混合負極活物質材料、非水電解質二次電池用負極、リチウムイオン二次電池 |
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| CN111095628A (zh) | 2020-05-01 |
| US20200266432A1 (en) | 2020-08-20 |
| US11688852B2 (en) | 2023-06-27 |
| CN111095628B (zh) | 2023-04-04 |
| WO2019053982A1 (ja) | 2019-03-21 |
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