JP6834090B2 - 誘電体組成物及びこれを含む積層セラミックキャパシタ - Google Patents
誘電体組成物及びこれを含む積層セラミックキャパシタ Download PDFInfo
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- JP6834090B2 JP6834090B2 JP2016134611A JP2016134611A JP6834090B2 JP 6834090 B2 JP6834090 B2 JP 6834090B2 JP 2016134611 A JP2016134611 A JP 2016134611A JP 2016134611 A JP2016134611 A JP 2016134611A JP 6834090 B2 JP6834090 B2 JP 6834090B2
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- Non-Insulated Conductors (AREA)
Description
本発明の一実施形態による誘電体組成物は、Ba 及びTiの酸化物を主成分とし、上記主成分は、Baの一部がNaまたはCaで置換されて成る組成式(Ba1−x(Na,Ca)x)TiO3で示され、ここで、xは0.005≦x≦0.035であり、0.994<(Ba1−x(Na,Ca)x)/Ti<1.003である条件を満たす。
本発明の一実施形態による誘電体組成物の場合、主成分は、Ba及びTiの酸化物として、具体的には、Baの一部がNaまたはCaで置換されて成る組成式(Ba1−x(Na,Ca)x)TiO3で示され、ここで、xは0.005≦x≦0.035であり、0.994<(Ba1−x(Na,Ca)x)/Ti<1.003である条件を満たす。
本発明の一実施形態によると、上記誘電体組成物は、第1副成分として、Mn、V、Cr、Fe、Ni、Co、Cu及びZnのうち少なくとも一つ以上を含む酸化物または炭酸塩をさらに含むことができる。第1副成分は、原子価可変アクセプタ(variable valence acceptor)であり、誘電体組成物が適用された積層セラミックキャパシタの焼成温度を低下させ、高温耐電圧特性を向上させる役割をすることができる。この場合、必ずしもこれに制限されるものではないが、第1副成分は主成分100モル%に対して0.1〜1.0モル%含まれることができる。第1副成分の含量及び後述する他の副成分の含量は主成分100モル%に対する量であり、各副成分が含む金属イオンのモル%と定義されることができる。第1副成分が主成分に対して0.1モル%未満である場合は耐還元性及び信頼性が低下する可能性があり、1.0モル%以上である場合は焼成温度の増加及び容量の低下などが発生するおそれがある。
本発明の一実施形態によると、上記誘電体組成物は、第2副成分として、Mg及びAlのうち少なくとも一つの酸化物または炭酸塩をさらに含むことができる。上記第2副成分は、原子価固定アクセプタ(fixed valence acceptor)であり、誘電体組成物が適用された積層セラミックキャパシタの焼成温度を低下させ、高温耐電圧特性を向上させる役割をすることができる。この場合、必ずしもこれに制限されるものではないが、第2副成分は主成分100モル%に対して0.1〜1.0モル%含まれることができる。第2副成分が主成分に対して0.1モル%未満である場合は耐還元性及び信頼性が低下する可能性があり、1.0モル%以上である場合は焼成温度の増加及び容量の低下などが発生するおそれがある。
本発明の一実施形態によると、上記誘電体組成物は、第3副成分として、Ce、Nb、La及びSbのうち少なくとも一つの酸化物または炭酸塩をさらに含むことができる。この場合、必ずしもこれに制限されるものではないが、第3副成分は主成分100モル%に対して0.1〜1.0モル%含まれることができる。
本発明の一実施形態によると、上記誘電体組成物は、第4副成分として、Si、Ba、Ca及びAlのうち少なくとも一つの酸化物または炭酸塩をさらに含むことができる。この場合、必ずしもこれに制限されるものではないが、第4副成分は主成分100モル%に対して0.1〜1.0モル%含まれることができる。
図2は本発明の一実施形態による積層セラミックキャパシタを示す概略的な斜視図であり、図3は図2のI−I'線に沿って取った積層セラミックキャパシタを示す概略的な断面図である。
以下、本発明の発明者が行った実験例を通じて本発明をより詳細に説明する。これは発明の具体的な理解を助けるためのもので、本発明の範囲が実験例のみに限定されるものではない。
111 誘電体層
121、122 第1及び第2内部電極
131、132 第1及び第2外部電極
Claims (13)
- Ba及びTiの酸化物を主成分とし、
前記主成分は、Baの一部がNaで置換されて成る組成式(Ba1−x Na x )TiO3で示され、
xは0.005≦x≦0.035であり、0.994<(Ba1−x Na x )/Ti<1.003である条件を満たす、誘電体組成物。 - Mn、V、Cr、Fe、Ni、Co、Cu及びZnのうち少なくとも一つの酸化物または炭酸塩である第1副成分を前記主成分100モル%に対して0.1〜1.0モル%さらに含む、請求項1に記載の誘電体組成物。
- Mg及びAlのうち少なくとも一つの酸化物または炭酸塩である第2副成分を前記主成分100モル%に対して0.1〜1.0モル%さらに含む、請求項1または2に記載の誘電体組成物。
- Ce、Nb、La及びSbのうち少なくとも一つの酸化物または炭酸塩である第3副成分を前記主成分100モル%に対して0.1〜1.0モル%さらに含む、請求項1〜3のいずれか1項に記載の誘電体組成物。
- Si、Ba、Ca及びAlのうち少なくとも一つの酸化物または炭酸塩である第4副成分を前記主成分100モル%に対して0.1〜1.0モル%さらに含む、請求項1〜4のいずれか1項に記載の誘電体組成物。
- Siを含むガラス化合物である第4副成分を前記主成分100モル%に対して0.1〜1.0モル%さらに含む、請求項1〜4のいずれか1項に記載の誘電体組成物。
- 誘電体層と内部電極が交互に積層されたセラミック本体を含み、
前記誘電体層は、
Ba及びTiの酸化物を主成分とし、
前記主成分は、Baの一部がNaで置換されて成る組成式(Ba1−x Na x )TiO3で示され、
xは0.005≦x≦0.035であり、0.994<(Ba1−x Na x )/Ti<1.003である条件を満たす誘電体組成物を含む、積層セラミックキャパシタ。 - 前記内部電極はNi成分を含む、請求項7に記載の積層セラミックキャパシタ。
- 前記誘電体組成物は、Mn、V、Cr、Fe、Ni、Co、Cu及びZnのうち少なくとも一つの酸化物または炭酸塩である第1副成分を前記主成分100モル%に対して0.1〜1.0モル%さらに含む、請求項7または8に記載の積層セラミックキャパシタ。
- 前記誘電体組成物は、Mg及びAlのうち少なくとも一つの酸化物または炭酸塩である第2副成分を前記主成分100モル%に対して0.1〜1.0モル%さらに含む、請求項7〜9のいずれか1項に記載の積層セラミックキャパシタ。
- 前記誘電体組成物は、Ce、Nb、La及びSbのうち少なくとも一つの酸化物または炭酸塩である第3副成分を前記主成分100モル%に対して0.1〜1.0モル%さらに含む、請求項7〜10のいずれか1項に記載の積層セラミックキャパシタ。
- 前記誘電体組成物は、Si、Ba、Ca及びAlのうち少なくとも一つの酸化物または炭酸塩である第4副成分を前記主成分100モル%に対して0.1〜1.0モル%さらに含む、請求項7〜11のいずれか1項に記載の積層セラミックキャパシタ。
- 前記誘電体組成物は、Siを含むガラス化合物である第4副成分を前記主成分100モル%に対して0.1〜1.0モル%さらに含む、請求項7〜11のいずれか1項に記載の積層セラミックキャパシタ。
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