JP6790826B2 - 高分子化合物、樹脂組成物、膜、固体撮像素子、高分子化合物の製造方法、固体撮像素子の製造方法、および光学デバイス - Google Patents

高分子化合物、樹脂組成物、膜、固体撮像素子、高分子化合物の製造方法、固体撮像素子の製造方法、および光学デバイス Download PDF

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JP6790826B2
JP6790826B2 JP2016560932A JP2016560932A JP6790826B2 JP 6790826 B2 JP6790826 B2 JP 6790826B2 JP 2016560932 A JP2016560932 A JP 2016560932A JP 2016560932 A JP2016560932 A JP 2016560932A JP 6790826 B2 JP6790826 B2 JP 6790826B2
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polymer compound
general formula
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film
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JPWO2017057105A1 (ja
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陽平 此島
陽平 此島
利保 日比野
利保 日比野
諏訪　充史
充史 諏訪
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Toray Industries Inc
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Power Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Electromagnetism (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2016560932A 2015-09-28 2016-09-20 高分子化合物、樹脂組成物、膜、固体撮像素子、高分子化合物の製造方法、固体撮像素子の製造方法、および光学デバイス Expired - Fee Related JP6790826B2 (ja)

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JP2015189495 2015-09-28
JP2015189495 2015-09-28
PCT/JP2016/077727 WO2017057105A1 (ja) 2015-09-28 2016-09-20 高分子化合物、樹脂組成物、膜、固体撮像素子、高分子化合物の製造方法、固体撮像素子の製造方法、および光学デバイス

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JP6790826B2 true JP6790826B2 (ja) 2020-11-25

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JP (1) JP6790826B2 (zh)
KR (1) KR20180059751A (zh)
CN (1) CN108026253B (zh)
TW (1) TWI703135B (zh)
WO (1) WO2017057105A1 (zh)

Family Cites Families (18)

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US5700696A (en) * 1993-11-08 1997-12-23 Lucent Technologies Inc. Method for preparation of conjugated arylene or heteroarylene vinylene polymer and device including same
CA2360644A1 (en) * 1999-02-04 2000-08-10 The Dow Chemical Company Fluorene copolymers and devices made therefrom
JP4234623B2 (ja) * 2004-02-18 2009-03-04 Ｔｄｋ株式会社 １，１’−ビナフチル−６，６’−イレン骨格を有する芳香族ポリケトン及び芳香族ポリケトン前駆体並びにこれらの製造方法
WO2005093516A1 (ja) * 2004-03-25 2005-10-06 Mitsubishi Gas Chemical Company, Inc. レジスト組成物
CN1942825B (zh) * 2004-04-15 2010-05-12 三菱瓦斯化学株式会社 抗蚀剂组合物
JP5044908B2 (ja) * 2005-09-02 2012-10-10 東レ株式会社 非感光性樹脂組成物およびそれを用いた光学素子
JP4973093B2 (ja) 2005-10-03 2012-07-11 東レ株式会社 シロキサン系樹脂組成物、光学物品およびシロキサン系樹脂組成物の製造方法
JP4315195B2 (ja) 2006-12-21 2009-08-19 ソニー株式会社 硬化性樹脂材料−微粒子複合材料及びその製造方法、光学材料、並びに発光装置
JP2008248239A (ja) * 2007-03-08 2008-10-16 Toray Ind Inc シロキサン樹脂組成物、それを用いた硬化膜および光学デバイス
JP2009258471A (ja) * 2008-04-18 2009-11-05 Toray Ind Inc 感光性樹脂組成物フィルムおよびそれを用いたレジスト形成方法
CN101613477B (zh) * 2009-07-16 2012-08-08 浙江工业大学 主链含萘衍生物的共轭聚合物发光材料的制备方法
JP5701576B2 (ja) 2009-11-20 2015-04-15 富士フイルム株式会社 分散組成物及び感光性樹脂組成物、並びに固体撮像素子
WO2011068305A2 (ko) * 2009-12-03 2011-06-09 한국화학연구원 파이렌 화합물이 도입된 전도성 고분자 및 그를 이용한 유기 태양전지
CN103154002B (zh) * 2010-12-20 2015-01-07 海洋王照明科技股份有限公司 一种有机半导体材料及其制备方法和应用
CN103382248A (zh) * 2012-05-04 2013-11-06 海洋王照明科技股份有限公司 二氧硫芴基共聚物、其制备方法以及聚合物发光二极管
WO2014192716A1 (ja) * 2013-05-27 2014-12-04 富士フイルム株式会社 カラーフィルタの製造方法、下地層形成用組成物、有機ｅｌ表示装置
CN104629005A (zh) * 2013-11-13 2015-05-20 北京师范大学 一类基于9,10-二取代菲共轭聚合物、其制备方法及其在有机光电子器件中的应用
KR101821734B1 (ko) * 2015-02-17 2018-01-24 삼성에스디아이 주식회사 중합체, 유기막 조성물, 유기막, 및 패턴형성방법

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Publication number Publication date
KR20180059751A (ko) 2018-06-05
CN108026253A (zh) 2018-05-11
TWI703135B (zh) 2020-09-01
WO2017057105A1 (ja) 2017-04-06
CN108026253B (zh) 2020-06-12
JPWO2017057105A1 (ja) 2018-07-12
TW201718522A (zh) 2017-06-01

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