JP6785775B2 - 光電変換素子、それを備えた太陽電池モジュールおよび太陽光発電システム - Google Patents
光電変換素子、それを備えた太陽電池モジュールおよび太陽光発電システム Download PDFInfo
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- JP6785775B2 JP6785775B2 JP2017539818A JP2017539818A JP6785775B2 JP 6785775 B2 JP6785775 B2 JP 6785775B2 JP 2017539818 A JP2017539818 A JP 2017539818A JP 2017539818 A JP2017539818 A JP 2017539818A JP 6785775 B2 JP6785775 B2 JP 6785775B2
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- semiconductor layer
- type amorphous
- amorphous semiconductor
- photoelectric conversion
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- H01L31/0747—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells comprising a heterojunction of crystalline and amorphous materials, e.g. heterojunction with intrinsic thin layer
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Description
図1は、この発明の実施の形態1による光電変換素子の構成を示す断面図である。図1を参照して、実施の形態1による光電変換素子10は、半導体基板1と、反射防止膜2と、パッシベーション膜3と、n型非晶質半導体層4と、p型非晶質半導体層5と、電極6,7と、保護膜8とを備える。
図5から図9は、それぞれ、図1に示す光電変換素子10の製造方法を示す第1から第5の工程図である。
Si+2NaOH+H2O → Na2SiO3+2H2 …(1)
2Si+2NaOH+3H2O → Na2Si2O5+4H2 …(2)
3Si+4NaOH+4H2O → Na4Si3O8+6H2 …(3)
図17は、本実施の形態における光電変換素子の断面図である。図17に示すように、本実施の形態における光電変換素子10Aは、半導体基板1の受光面だけでなく、半導体基板1の裏面にもテクスチャ構造が形成されている点で実施の形態1と異なっている。以下、光電変換素子10Aについて、主に実施の形態1と異なる点を説明する。
上述した実施の形態1における光電変換素子10の半導体基板1は、n型結晶シリコンからなるため、p型非晶質半導体層5の幅を実施の形態1よりも大きくして面積を広げることにより、変換効率をより向上させることができる。しかしながら、p型非晶質半導体層5の幅を大きくするために、p型非晶質半導体層5を形成する際に用いるシャドーマスク40の開口部40aの間隔を狭くすると、シャドーマスク40がよれたり、撓んだりしやすくなり、p型非晶質半導体層を適切な位置に形成することができない場合が生じうる。本実施の形態では、実施の形態1の光電変換素子10よりもシャドーマスク40の開口部40aの幅を広げても、n型非晶質半導体層4と一定の間隔を隔てた適切な位置にp型非晶質半導体層が形成され、変換効率を向上させることができる構成について説明する。
図23は、本実施の形態における光電変換素子を裏面側から見た概略平面図である。なお、図23において、電極6,7及び保護膜8の図示は省略されている。
図25は、本実施の形態における光電変換素子を裏面側から見た概略平面図である。なお、図25において、電極6,7及び保護膜8の図示は省略されている。
図27は、本実施の形態による光電変換素子を備える光電変換モジュールの構成を示す概略図である。図27を参照して、光電変換モジュール1000は、複数の光電変換素子1001と、カバー1002と、出力端子1003,1004とを備える。
図28は、この実施の形態による光電変換素子を備える太陽光発電システムの構成を示す概略図である。
図31は、この実施の形態による光電変換素子を備える太陽光発電システムの構成を示す概略図である。
今回開示された実施の形態はすべての点で例示であって制限的なものではないと考えられるべきである。本発明の範囲は、上記した実施の形態の説明ではなくて特許請求の範囲によって示され、特許請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。
Claims (8)
- 半導体基板と、
前記半導体基板上に形成され、リンをドーパントとして含むn型非晶質半導体層と、
前記半導体基板上の面内方向において前記n型非晶質半導体層に隣接して形成され、ボロンをドーパントとして含むp型非晶質半導体層と、を備え、
前記半導体基板上に成膜された一の薄膜において、膜厚が最大である第1の点を含みかつ膜厚が略一定である領域をフラット領域とし、当該一の薄膜の面内方向において当該薄膜の膜厚の減少率が第1の減少率から前記第1の減少率よりも大きい第2の減少率に変化する点を第2の点とし、当該一の薄膜の面内方向において前記フラット領域の端部から前記第2の点までの領域を膜厚減少領域と定義したとき、
前記n型非晶質半導体層は、前記p型非晶質半導体層と隣り合う面に前記膜厚減少領域を有し、前記p型非晶質半導体層は、前記n型非晶質半導体層と隣り合う面に前記膜厚減少領域を有し、
前記p型非晶質半導体層の前記膜厚減少領域の傾斜角度は、前記n型非晶質半導体層の前記膜厚減少領域の傾斜角度よりも急峻であり、
前記p型非晶質半導体層と前記n型非晶質半導体層との少なくとも一方における前記膜厚減少領域のドーパント濃度は、前記フラット領域におけるドーパント濃度よりも大きい、光電変換素子。 - 隣接する前記n型非晶質半導体層と前記p型非晶質半導体層は、20μm以上、100μm未満の距離を隔てて配置されている、請求項1に記載の光電変換素子。
- 前記半導体基板の前記n型非晶質半導体層及び前記p型非晶質半導体層が形成されている面はテクスチャが形成されている、請求項1又は2に記載の光電変換素子。
- 前記n型非晶質半導体層と前記p型非晶質半導体層のそれぞれは、前記n型非晶質半導体層と前記p型非晶質半導体層とが隣接する方向に直交する方向に、一つながりに形成されている、請求項1から3のいずれか一項に記載の光電変換素子。
- 前記n型非晶質半導体層と前記p型非晶質半導体層の少なくとも一方は、前記n型非晶質半導体層と前記p型非晶質半導体層とが隣接する方向に直交する方向に、離間して配置されている、請求項1から3のいずれか一項に記載の光電変換素子。
- 前記n型非晶質半導体層と前記p型非晶質半導体層のそれぞれは、前記半導体基板において交差する2つの方向において、互いに隣接するように配置されている、請求項1から3のいずれか一項に記載の光電変換素子。
- 前記半導体基板上に、前記半導体基板に接するように形成された真性非晶質半導体層をさらに備える、請求項1から6のいずれか一項に記載の光電変換素子。
- 前記n型非晶質半導体層上に設けられた第1電極と、
前記p型非晶質半導体層上に設けられた第2電極と、をさらに備え、
前記第1電極は、前記n型非晶質半導体層における前記膜厚減少領域の少なくとも一部と接し、前記第2電極は、前記p型非晶質半導体層における前記膜厚減少領域の少なくとも一部と接する、請求項1から7のいずれか一項に記載の光電変換素子。
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