JP6782702B2 - 高品質ｆｃｖｄ膜バックグラウンド用の先進的処理フロー - Google Patents

高品質ｆｃｖｄ膜バックグラウンド用の先進的処理フロー Download PDF

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JP6782702B2
JP6782702B2 JP2017535912A JP2017535912A JP6782702B2 JP 6782702 B2 JP6782702 B2 JP 6782702B2 JP 2017535912 A JP2017535912 A JP 2017535912A JP 2017535912 A JP2017535912 A JP 2017535912A JP 6782702 B2 JP6782702 B2 JP 6782702B2
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fcvd
film
ion implantation
dielectric film
substrate
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JP2018503259A5 (enExample
JP2018503259A (ja
Inventor
シュリーニヴァース ディー． ネマニ，
シュリーニヴァース ディー． ネマニ，
エリカ チェン，
エリカ チェン，
ルドヴィーク ゴデット，
ルドヴィーク ゴデット，
チュン シュエ，
チュン シュエ，
エリー ワイ． イー，
エリー ワイ． イー，
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Applied Materials Inc
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Applied Materials Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Chemical Vapour Deposition (AREA)
JP2017535912A 2015-01-07 2015-12-15 高品質ｆｃｖｄ膜バックグラウンド用の先進的処理フロー Active JP6782702B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201562100888P 2015-01-07 2015-01-07
US62/100,888 2015-01-07
US14/635,589 2015-03-02
US14/635,589 US9777378B2 (en) 2015-01-07 2015-03-02 Advanced process flow for high quality FCVD films
PCT/US2015/065846 WO2016111815A1 (en) 2015-01-07 2015-12-15 Advanced process flow for high quality fcvd films

Related Child Applications (1)

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JP2020176093A Division JP2021044555A (ja) 2015-01-07 2020-10-20 高品質ｆｃｖｄ膜バックグラウンド用の先進的処理フロー

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JP2018503259A JP2018503259A (ja) 2018-02-01
JP2018503259A5 JP2018503259A5 (enExample) 2019-01-31
JP6782702B2 true JP6782702B2 (ja) 2020-11-11

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JP2017535912A Active JP6782702B2 (ja) 2015-01-07 2015-12-15 高品質ｆｃｖｄ膜バックグラウンド用の先進的処理フロー
JP2020176093A Pending JP2021044555A (ja) 2015-01-07 2020-10-20 高品質ｆｃｖｄ膜バックグラウンド用の先進的処理フロー

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Country Status (6)

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US (1) US9777378B2 (enExample)
JP (2) JP6782702B2 (enExample)
KR (1) KR102438577B1 (enExample)
CN (1) CN107109643B (enExample)
TW (1) TWI676700B (enExample)
WO (1) WO2016111815A1 (enExample)

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Also Published As

Publication number Publication date
JP2018503259A (ja) 2018-02-01
CN107109643A (zh) 2017-08-29
KR20170101997A (ko) 2017-09-06
KR102438577B1 (ko) 2022-08-30
JP2021044555A (ja) 2021-03-18
US20160194758A1 (en) 2016-07-07
US9777378B2 (en) 2017-10-03
TWI676700B (zh) 2019-11-11
TW201629254A (zh) 2016-08-16
WO2016111815A1 (en) 2016-07-14
CN107109643B (zh) 2019-09-24

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