JP6678128B2 - 感光性樹脂組成物およびそれから製造される光硬化パターン - Google Patents
感光性樹脂組成物およびそれから製造される光硬化パターン Download PDFInfo
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- JP6678128B2 JP6678128B2 JP2017099698A JP2017099698A JP6678128B2 JP 6678128 B2 JP6678128 B2 JP 6678128B2 JP 2017099698 A JP2017099698 A JP 2017099698A JP 2017099698 A JP2017099698 A JP 2017099698A JP 6678128 B2 JP6678128 B2 JP 6678128B2
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- 239000011342 resin composition Substances 0.000 title claims description 49
- -1 hydroxyethyl group Chemical group 0.000 claims description 90
- 150000001875 compounds Chemical class 0.000 claims description 87
- 229920005989 resin Polymers 0.000 claims description 73
- 239000011347 resin Substances 0.000 claims description 73
- 239000000126 substance Substances 0.000 claims description 34
- 239000003999 initiator Substances 0.000 claims description 32
- 125000006850 spacer group Chemical group 0.000 claims description 21
- 239000001257 hydrogen Substances 0.000 claims description 20
- 229910052739 hydrogen Inorganic materials 0.000 claims description 20
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 17
- 239000002904 solvent Substances 0.000 claims description 16
- 125000000524 functional group Chemical group 0.000 claims description 15
- 125000003545 alkoxy group Chemical group 0.000 claims description 12
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 11
- 125000003700 epoxy group Chemical group 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 11
- 239000007787 solid Substances 0.000 claims description 11
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 10
- 125000002723 alicyclic group Chemical group 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 9
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 125000005842 heteroatom Chemical group 0.000 claims description 7
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 7
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 claims description 6
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 6
- 125000006736 (C6-C20) aryl group Chemical group 0.000 claims description 6
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 125000004429 atom Chemical group 0.000 claims description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 5
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims description 5
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims description 5
- 229920000642 polymer Polymers 0.000 claims description 5
- 125000003161 (C1-C6) alkylene group Chemical group 0.000 claims description 4
- 125000006651 (C3-C20) cycloalkyl group Chemical group 0.000 claims description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 4
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 claims description 4
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 claims description 3
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 claims description 3
- 125000006267 biphenyl group Chemical group 0.000 claims description 3
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 claims description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 claims description 3
- 125000001624 naphthyl group Chemical group 0.000 claims description 3
- 125000005561 phenanthryl group Chemical group 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 51
- 238000011084 recovery Methods 0.000 description 16
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 13
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 239000002253 acid Substances 0.000 description 9
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- 238000009826 distribution Methods 0.000 description 7
- 150000002431 hydrogen Chemical class 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 239000004793 Polystyrene Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229920002223 polystyrene Polymers 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- QYGBYAQGBVHMDD-XQRVVYSFSA-N (z)-2-cyano-3-thiophen-2-ylprop-2-enoic acid Chemical compound OC(=O)C(\C#N)=C/C1=CC=CS1 QYGBYAQGBVHMDD-XQRVVYSFSA-N 0.000 description 4
- 0 *C(C(OCC(COc(cccc1)c1-c1ccccc1)O)=O)=C Chemical compound *C(C(OCC(COc(cccc1)c1-c1ccccc1)O)=O)=C 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 3
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 3
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical class CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- 230000001588 bifunctional effect Effects 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 2
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 2
- 125000004066 1-hydroxyethyl group Chemical group [H]OC([H])([*])C([H])([H])[H] 0.000 description 2
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 2
- YTZSKPAYFHSKOL-UHFFFAOYSA-N 2-(2,3-dichlorophenyl)-2-[2-(2,3-dichlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=C(Cl)C=CC=2)Cl)=C1Cl YTZSKPAYFHSKOL-UHFFFAOYSA-N 0.000 description 2
- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 2
- OYUNTGBISCIYPW-UHFFFAOYSA-N 2-chloroprop-2-enenitrile Chemical compound ClC(=C)C#N OYUNTGBISCIYPW-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000008360 acrylonitriles Chemical class 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 2
- 125000006353 oxyethylene group Chemical group 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000005704 oxymethylene group Chemical group [H]C([H])([*:2])O[*:1] 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 1
- 125000000027 (C1-C10) alkoxy group Chemical group 0.000 description 1
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 description 1
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 description 1
- UTTWIIMGGLLUME-UHFFFAOYSA-N 1-[2-(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)imidazol-1-yl]-4,5-diphenylimidazole Chemical compound ClC1=C(C=CC=C1)C=1N(C(=CN=1)C1=CC(=C(C=C1)OC)OC)N1C=NC(=C1C1=CC=CC=C1)C1=CC=CC=C1 UTTWIIMGGLLUME-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 1
- RKYJPYDJNQXILT-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCCOC(=O)C=C RKYJPYDJNQXILT-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 1
- NMBXBBSVGZNJCE-UHFFFAOYSA-N 2-(dimethylamino)propyl prop-2-enoate Chemical compound CN(C)C(C)COC(=O)C=C NMBXBBSVGZNJCE-UHFFFAOYSA-N 0.000 description 1
- AAMTXHVZOHPPQR-UHFFFAOYSA-N 2-(hydroxymethyl)prop-2-enoic acid Chemical compound OCC(=C)C(O)=O AAMTXHVZOHPPQR-UHFFFAOYSA-N 0.000 description 1
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 1
- PTJWCLYPVFJWMP-UHFFFAOYSA-N 2-[[3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)COCC(CO)(CO)CO PTJWCLYPVFJWMP-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
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- UGIJCMNGQCUTPI-UHFFFAOYSA-N 2-aminoethyl prop-2-enoate Chemical compound NCCOC(=O)C=C UGIJCMNGQCUTPI-UHFFFAOYSA-N 0.000 description 1
- QMQCYMRBZCWBNI-UHFFFAOYSA-N 2-aminopropyl 2-methylprop-2-enoate Chemical compound CC(N)COC(=O)C(C)=C QMQCYMRBZCWBNI-UHFFFAOYSA-N 0.000 description 1
- OVENINIFSWEPGA-UHFFFAOYSA-N 2-aminopropyl prop-2-enoate Chemical compound CC(N)COC(=O)C=C OVENINIFSWEPGA-UHFFFAOYSA-N 0.000 description 1
- YBXYCBGDIALKAK-UHFFFAOYSA-N 2-chloroprop-2-enamide Chemical compound NC(=O)C(Cl)=C YBXYCBGDIALKAK-UHFFFAOYSA-N 0.000 description 1
- IJBSPUKPEDBNKQ-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-prop-1-en-2-ylphenyl)propan-1-one Chemical compound CC(=C)C1=CC=C(C(=O)C(C)(C)O)C=C1 IJBSPUKPEDBNKQ-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- FCYVWWWTHPPJII-UHFFFAOYSA-N 2-methylidenepropanedinitrile Chemical compound N#CC(=C)C#N FCYVWWWTHPPJII-UHFFFAOYSA-N 0.000 description 1
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Images
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13392—Gaskets; Spacers; Sealing of cells spacers dispersed on the cell substrate, e.g. spherical particles, microfibres
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
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Description
アルカリ可溶性樹脂は、通常、光や熱の作用による反応性を有し、且つアルカリ溶解性を有している。
本発明に係るアルカリ可溶性樹脂(A)は、前記化学式1および化学式2からなる群より選択される少なくとも1種の化合物に由来する繰り返し単位を有することによりバルキー(bulky)な側鎖を備え、硬化時のフィルム密度(film density)の上昇によって優れた弾性回復率を有しながらも、外部の圧力による変形が少ない高い硬度を有する光硬化パターンを形成することができ、高解像度のパターンを形成することができる。
メチル(メタ)アクリレート、エチル(メタ)アクリレート、ブチル(メタ)アクリレート、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシ−o−フェニルフェノールプロピルアクリレート、アミノエチル(メタ)アクリレートなどの不飽和カルボン酸の非置換または置換のアルキルエステル化合物、
シクロペンチル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、メチルシクロヘキシル(メタ)アクリレート、シクロヘプチル(メタ)アクリレート、シクロオクチル(メタ)アクリレート、メンチル(メタ)アクリレート、シクロペンテニル(メタ)アクリレート、シクロヘキセニル(メタ)アクリレート、シクロヘプテニル(メタ)アクリレート、シクロオクテニル(メタ)アクリレート、メンタジエニル(メタ)アクリレート、イソボルニル(メタ)アクリレート、ピナニル(メタ)アクリレート、アダマンチル(メタ)アクリレート、ノルボルニル(メタ)アクリレート、ピネニル(メタ)アクリレートなどの脂環式置換基を含む不飽和カルボン酸エステル化合物、
オリゴエチレングリコールモノアルキル(メタ)アクリレートなどのグリコール類のモノ飽和カルボン酸エステル化合物、ベンジル(メタ)アクリレート、フェノキシ(メタ)アクリレートなどの芳香環を有する置換基を含む不飽和カルボン酸エステル化合物、
スチレン、α−メチルスチレン、ビニルトルエン等の芳香族ビニル化合物、
酢酸ビニル、プロピオン酸ビニルなどのカルボン酸ビニルエステル、(メタ)アクリロニトリル、α−クロロアクリロニトリルなどのシアン化ビニル化合物、
N−シクロヘキシルマレイミド、N−フェニルマレイミドなどのマレイミド化合物、
などが挙げられる。これらは、それぞれ単独で、または、2種以上を組み合わせて、用いることができる。なお、本明細書で(メタ)アクリレートとは、アクリレートおよび(または)メタクリレートを意味する。
水素;
メチル、エチル、n−プロピル、イソプロピル、n−ブチル、sec−ブチル、tert−ブチルなどのアルキル基;
ヒドロキシメチル、1−ヒドロキシエチル、2−ヒドロキシエチル、1−ヒドロキシ−n−プロピル、2−ヒドロキシ−n−プロピル、3−ヒドロキシ−n−プロピル、1−ヒドロキシ−イソプロピル、2−ヒドロキシ−イソプロピル、1−ヒドロキシ−n−ブチル、2−ヒドロキシ−n−ブチル、3−ヒドロキシ−n−ブチル、4−ヒドロキシ−n−ブチルなどのヒドロキシ含有アルキル基;
から選択される原子または官能基であってもよい。中でも、前記R7およびR8は、それぞれ独立して、水素、メチル基、ヒドロキシメチル基、1−ヒドロキシエチル基、または、2−ヒドロキシエチル基から選択される原子または官能基であることが好ましく、特に水素またはメチル基であることがさらに好ましい。
単結合;
メチレン、エチレン、プロピレンなどのアルキレン基;
オキシメチレン、オキシエチレン、オキシプロピレン、チオメチレン、チオエチレン、チオプロピレン、アミノメチレン、アミノエチレン、アミノプロピレンなどのヘテロ原子含有アルキレン基;
であってもよい。中でも、Xは、単結合、メチレン基、エチレン基、オキシメチレン基、または、オキシエチレン基であることが好ましく、特に単結合またはオキシエチレン基であることがさらに好ましい。
2−アミノエチルアクリレート、2−アミノエチルメタクリレート、2−ジメチルアミノエチルアクリレート、2−ジメチルアミノエチルメタクリレート、2−アミノプロピルアクリレート、2−アミノプロピルメタクリレート、2−ジメチルアミノプロピルアクリレート、2−ジメチルアミノプロピルメタクリレート、3−アミノプロピルアクリレート、3−アミノプロピルメタクリレート、3−ジメチルアミノプロピルアクリレート、3−ジメチルアミノプロピルメタクリレートなどの不飽和カルボン酸アミノアルキルエステル類;
酢酸ビニル、プロピオン酸ビニル、酪酸ビニル、安息香酸ビニル等のカルボン酸ビニルエステル類;
ビニルメチルエーテル、ビニルエチルエーテル、アリルグリシジルエーテルなどの不飽和エーテル類;
アクリロニトリル、メタクリロニトリル、α−クロロアクリロニトリル、シアン化ビニリデン等のシアン化ビニル化合物;
アクリルアミド、メタクリルアミド、α−クロロアクリルアミド、N−2−ヒドロキシエチルアクリルアミド、N−2−ヒドロキシエチルメタクリルアミドなどの不飽和アミド類;
マレイミド、ベンジルマレイミド、N−フェニルマレイミド、N−シクロヘキシルマレイミド等の不飽和イミド類;
1,3−ブタジエン、イソプレン、クロロプレン等の脂肪族共役ジエン類;
および、
ポリスチレン、ポリメチルアクリレート、ポリメチルメタクリレート、ポリ−n−ブチルアクリレート、ポリ−n−ブチルメタクリレート、ポリシロキサンの重合体分子鎖の末端にモノアクリロイル基、または、モノメタクリロイル基を有するマクロ単量体類;
などとも共重合することができる。
本発明は、本発明の光重合開始剤として、下記化学式3で表される化合物を含む。
本発明の感光性樹脂組成物に含有される光重合性化合物(C)は、前記光重合開始剤(B)の作用で重合できる化合物であり、単官能単量体、2官能単量体、その他の多官能単量体などが挙げられる。
溶剤(D)は、当該分野で通常使用されるものであれば、いずれでも制限なく用いることができる。
本発明に係る感光性樹脂組成物は、必要に応じて、充填剤、他の高分子化合物、硬化剤、レベリング剤、密着促進剤、酸化防止剤、紫外線吸収剤、凝集防止剤、連鎖移動剤、などの添加剤をさらに含んでもよい。
本発明は、前記感光性樹脂組成物で製造される光硬化パターンおよび該光硬化パターンを備える画像表示装置を提供することを目的とする。
製造例1および2において、重量平均分子量(Mw)および数平均分子量(Mn)の測定は、GPC法を用いて以下の条件で行った。なお、重量平均分子量および数平均分子量の比を分子量分布(Mw/Mn)とした。
カラム:TSK−GELG4000HXL+TSK−GELG2000HXL(直列接続)
カラム温度:40℃
移動相溶媒:テトラヒドロフラン
流速:1.0mL/分
注入量:50μL
検出器:RI
測定試料濃度:0.6重量%(溶媒=テトラヒドロフラン)
校正用標準物質:TSK STANDARD POLYSTYRENE F−40、F−4、F−1、A−2500、A−500(東ソー株式会社製)
攪拌機、温度計、還流冷却管、滴下ロート、および、窒素導入管、を備えたフラスコに、プロピレングリコールモノメチルエーテルアセテート182gを投入し、フラスコ内の雰囲気を空気から窒素にした後、100℃に昇温した。その後、ビニルトルエン35.4g(0.30モル)、アクリル酸36.0g(0.50モル)、2−ヒドロキシ−o−フェニルフェノールプロピルアクリレート59.6g(0.2モル)、および、プロピレングリコールモノメチルエーテルアセテート136g、を含む混合物に、アゾビスイソブチロニトリル3.6gを添加した溶液を、滴下ロートから2時間かけてフラスコに滴下し、100℃で5時間攪拌を続けた。次いで、フラスコ内の雰囲気を窒素から空気にし、グリシジルメタクリレート22.5g[0.15モル、(本反応に使用したアクリル酸に対して50モル%)]、トリスジメチルアミノメチルフェノール0.9g、および、ヒドロキノン0.145gをフラスコ内に投入し、110℃で6時間反応を継続した。これにより、固形分酸価が121.1mgKOH/gである不飽和基含有の第1樹脂A−1を得た。GPCにより測定したポリスチレン換算の重量平均分子量は31,000であり、分子量分布(Mw/Mn)は2.2であった。
還流冷却器、滴下漏斗、および、攪拌機、を備えた1Lのフラスコ内に、窒素を0.02L/分で流入して窒素雰囲気とし、ジエチレングリコールエチルメチルエーテル150gを入れ、撹拌しながら70℃まで加熱した。次いで、前記化学式6および化学式20の混合物(モル比は50:50)198.2g(0.90mol)、および、メタクリル酸8.6g(0.10mol)、をジエチレングリコールエチルメチルエーテル150gに溶解して溶液を調製した。
下記表1の組成および含有量(単位:重量部)にて実施例1〜10と比較例1〜5の感光性樹脂組成物を調製した。
2インチ角のガラス基板(EAGLE2000、Corning社製)を中性洗剤、水、および、アルコールで順次洗浄した後、乾燥した。このガラス基板上に、前記実施例および比較例で調製した感光性樹脂組成物をそれぞれスピンコートした後、クリーンオーブン中で90℃で3分間プリベークを行った。前記プリベークを行った基板を常温に冷却後、石英硝子製のフォトマスクとの間隔を150μmにして露光機(TME−150RSK、TOPCON社製)を用いて60mJ/cm2の露光量(405nm基準)で光照射した。このとき、超高圧水銀灯からの放射光を光学フィルター(LU0400、朝日分光株式会社製)を用いて400nm以下の光をカットした光を重合性樹脂組成物へ照射した。このとき、フォトマスクとしては、直径20μmの円形の透光部(パターン)を有し、当該パターンの間隔が100μmであるパターンが同一平面上に形成されたフォトマスクを用いた。
(1)Bottom CDの測定
前記で得られた硬化膜について、パターンの高さとBottom CDとを3次元形状測定装置(SIS−2000 Systems、SNU PRECISION社製)を用いて測定した。測定対象とするパターンは、フォトマスクサイズの透光部の直径の基準が20μm、そのときの塗膜厚さの基準が3.0μmのとき、2.85μm以上の塗膜厚さを有するパターンのうち最も小さいサイズのパターンとした。
前記(1)で得られたDotパターンについて、3次元形状測定装置(SIS−2000 Systems、SNU PRECISION社製)を用いて、パターンの底面から全体高さの5%の箇所をBottom CD(a)と、床面から全体高さの95%の箇所をTop CD(b)と、それぞれ定義し、(b)の長さを(a)の長さで割った後100を乗じた値(=b/a×100)をT/B比と定義した。
現像密着性は、円形パターンがそれぞれ1000個あるフォトマスクを用いて膜厚を3μmとして形成されたパターンについて、欠落したパターンの数を顕微鏡観察により数え、下記数学式1のようにして現像密着力(%)を算出した。その結果を下記表2に記する。
現像密着力(%)=[1000−(欠落したパターンの数)]/1000×100
(4)機械特性(回復率)
前記で得られた硬化膜について、ダイナミック超微小硬度計(DUH−W201、株式会社島津製作所製)を用いて、その総変位量(μm)および弾性変位量(μm)を、以下の測定条件により測定した。測定した数値を用いて下記数学式2のようにして回復率(%)を算出した。回復率が大きいと、硬いと判断した。
回復率(%)=[弾性変位量(μm)]/[総変位量(μm)]×100
試験モード:負荷−除荷試験
試験力:5gf[SI単位換算値49.0mN]
負荷速度:0.45gf/sec[SI単位換算値4.41mN/sec]
保持時間:5sec
圧子:円錐台の圧子(直径50μm)
Claims (10)
- アルカリ可溶性樹脂(A)、光重合開始剤(B)、光重合性化合物(C)、および、溶剤(D)を含み、
前記アルカリ可溶性樹脂(A)は、下記化学式1および化学式2からなる群より選択される少なくとも1種の化合物を含んで重合された第1樹脂と、脂環式エポキシ基を有する化合物を含んで重合された第2樹脂とを含み、
前記光重合開始剤(B)は、下記化学式3で表される化合物を含むことを特徴とする感光性樹脂組成物。
R3およびR4は、それぞれ独立して、水素またはニトロ基であり、但し、R3およびR4の少なくとも一つはニトロ基であり、
R5およびR6は、それぞれ独立して(C1−C20)アルキル基、(C6−C20)アリール基、(C6−C20)アリール(C1−C20)アルキル基、ヒドロキシ(C1−C20)アルキル基、ヒドロキシ(C1−C20)アルコキシ(C1−C20)アルキル基、または、(C3−C20)シクロアルキル基から選択される官能基である。) - 前記R6は、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、フェニル基、ナフチル基、ビフェニル基、ターフェニル基、アントリル基、インデニル基、フェナントリル基、ベンジル基、ヒドロキシメチル基、ヒドロキシエチル基、ヒドロキシプロピル基、ヒドロキシブチル基、ヒドロキシペンチル基、ヒドロキシヘキシル基、ヒドロキシメトキシメチル基、ヒドロキシメトキシエチル基、ヒドロキシメトキシプロピル基、ヒドロキシメトキシブチル基、ヒドロキシエトキシメチル基、ヒドロキシエトキシエチル基、ヒドロキシエトキシプロピル基、ヒドロキシエトキシブチル基、ヒドロキシエトキシペンチル基、ヒドロキシエトキシヘキシル基、シクロプロピル基、シクロペンチル基、または、シクロヘキシル基、から選択される官能基である請求項1に記載の感光性樹脂組成物。
- 前記光重合開始剤(B)は、アセトフェノン誘導体化合物、および、ビイミダゾール誘導体化合物の少なくとも1種をさらに含む請求項1に記載の感光性樹脂組成物。
- 前記光重合開始剤(B)は、光重合開始剤の全重量に対して、前記化学式3の化合物を40〜90重量%含む請求項4に記載の感光性樹脂組成物。
- 前記アルカリ可溶性樹脂(A)は、アルカリ可溶性樹脂の固形分100重量部を基準として、第1樹脂10〜95重量部および第2樹脂5〜90重量部を含む請求項1に記載の感光性樹脂組成物。
- 前記アルカリ可溶性樹脂(A)は、感光性樹脂組成物の固形分を基準として5〜90重量%含まれる請求項1に記載の感光性樹脂組成物。
- 請求項1〜7のいずれか1項に記載の感光性樹脂組成物で製造された光硬化パターン。
- 前記光硬化パターンは、アレイ平坦化膜パターン、保護膜パターン、絶縁膜パターン、フォトレジストパターン、ブラックマトリックスパターン、および、スペーサパターン、からなる群より選択される請求項8に記載の光硬化パターン。
- 請求項8に記載の光硬化パターンを備えた画像表示装置。
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