JP6667166B2 - 改質液生成装置および改質液生成方法 - Google Patents

改質液生成装置および改質液生成方法 Download PDF

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Publication number
JP6667166B2
JP6667166B2 JP2017056161A JP2017056161A JP6667166B2 JP 6667166 B2 JP6667166 B2 JP 6667166B2 JP 2017056161 A JP2017056161 A JP 2017056161A JP 2017056161 A JP2017056161 A JP 2017056161A JP 6667166 B2 JP6667166 B2 JP 6667166B2
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Prior art keywords
liquid
electrode
processing tank
swirling
reforming
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JP2017056161A
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English (en)
Japanese (ja)
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JP2017225965A (ja
Inventor
岳 三宅
岳 三宅
崇博 北井
崇博 北井
南尾　匡紀
匡紀 南尾
芳生 山田
芳生 山田
源一郎 松田
源一郎 松田
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Panasonic Intellectual Property Management Co Ltd
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Panasonic Intellectual Property Management Co Ltd
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Priority to PCT/JP2017/018438 priority Critical patent/WO2017217170A1/ja
Priority to US15/750,685 priority patent/US10875790B2/en
Priority to CN201780002805.1A priority patent/CN107922223B/zh
Priority to EP17813073.8A priority patent/EP3473601B1/en
Publication of JP2017225965A publication Critical patent/JP2017225965A/ja
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Publication of JP6667166B2 publication Critical patent/JP6667166B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/247—Generating plasma using discharges in liquid media
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3468—Vortex generators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C02F2201/4611—Fluid flow
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C02F2201/4616—Power supply
    • C02F2201/46175—Electrical pulses
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2301/00—General aspects of water treatment
    • C02F2301/02—Fluid flow conditions
    • C02F2301/026—Spiral, helicoidal, radial
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/02—Odour removal or prevention of malodour
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/04—Disinfection
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00—Use of specific compounds during water treatment
    • C02F2305/02—Specific form of oxidant
    • C02F2305/023—Reactive oxygen species, singlet oxygen, OH radical
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/15—Ambient air; Ozonisers

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
JP2017056161A 2016-06-15 2017-03-22 改質液生成装置および改質液生成方法 Active JP6667166B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
PCT/JP2017/018438 WO2017217170A1 (ja) 2016-06-15 2017-05-17 改質液生成装置および改質液生成方法
US15/750,685 US10875790B2 (en) 2016-06-15 2017-05-17 Apparatus for producing reforming liquid and method for producing reforming liquid
CN201780002805.1A CN107922223B (zh) 2016-06-15 2017-05-17 重整液生成装置及重整液生成方法
EP17813073.8A EP3473601B1 (en) 2016-06-15 2017-05-17 Apparatus for producing reforming liquid and method for producing reforming liquid

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016118903 2016-06-15
JP2016118903 2016-06-15

Related Child Applications (1)

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JP2019237101A Division JP6861378B2 (ja) 2016-06-15 2019-12-26 改質液生成装置

Publications (2)

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JP2017225965A JP2017225965A (ja) 2017-12-28
JP6667166B2 true JP6667166B2 (ja) 2020-03-18

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JP2019237101A Active JP6861378B2 (ja) 2016-06-15 2019-12-26 改質液生成装置

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US (1) US10875790B2 (https=)
EP (1) EP3473601B1 (https=)
JP (2) JP6667166B2 (https=)
CN (1) CN107922223B (https=)

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* Cited by examiner, † Cited by third party
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JP6678336B2 (ja) * 2017-05-11 2020-04-08 パナソニックＩｐマネジメント株式会社 洗濯機すすぎ水浄化装置及び洗濯装置
JP6653478B2 (ja) * 2017-05-30 2020-02-26 パナソニックＩｐマネジメント株式会社 脱臭装置
JP6722903B2 (ja) * 2017-06-01 2020-07-15 パナソニックＩｐマネジメント株式会社 空間改質装置
JP6587159B2 (ja) * 2017-06-26 2019-10-09 パナソニックＩｐマネジメント株式会社 液体処理装置
JP6854427B2 (ja) 2018-03-22 2021-04-07 パナソニックＩｐマネジメント株式会社 液体処理装置
JP7113349B2 (ja) * 2018-05-15 2022-08-05 パナソニックＩｐマネジメント株式会社 液体処理装置
JP6990866B2 (ja) * 2018-05-15 2022-01-12 パナソニックＩｐマネジメント株式会社 液体処理装置
JP6799824B2 (ja) * 2018-05-16 2020-12-16 パナソニックＩｐマネジメント株式会社 液体処理装置
JP7190696B2 (ja) * 2019-01-22 2022-12-16 パナソニックＩｐマネジメント株式会社 液体処理方法及び液体処理装置
NL2024131B1 (en) * 2019-10-31 2021-07-19 Joining Minds Solutions Waste water cleaning apparatus and system

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Also Published As

Publication number Publication date
JP2020049486A (ja) 2020-04-02
US20180230027A1 (en) 2018-08-16
CN107922223A (zh) 2018-04-17
JP2017225965A (ja) 2017-12-28
EP3473601B1 (en) 2023-02-08
US10875790B2 (en) 2020-12-29
EP3473601A1 (en) 2019-04-24
CN107922223B (zh) 2020-10-09
JP6861378B2 (ja) 2021-04-21
EP3473601A4 (en) 2019-05-15

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