JP6650719B2 - 撮像装置、撮像システムおよび半導体装置の製造方法 - Google Patents

撮像装置、撮像システムおよび半導体装置の製造方法 Download PDF

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Publication number
JP6650719B2
JP6650719B2 JP2015194479A JP2015194479A JP6650719B2 JP 6650719 B2 JP6650719 B2 JP 6650719B2 JP 2015194479 A JP2015194479 A JP 2015194479A JP 2015194479 A JP2015194479 A JP 2015194479A JP 6650719 B2 JP6650719 B2 JP 6650719B2
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Prior art keywords
contact plug
transistor
diameter
imaging device
drain
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Japanese (ja)
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JP2017069430A (ja
JP2017069430A5 (enExample
Inventor
章宏 河野
章宏 河野
勉 丹下
勉 丹下
真男 石岡
真男 石岡
浩一 田添
浩一 田添
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Canon Inc
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Canon Inc
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Priority to JP2015194479A priority Critical patent/JP6650719B2/ja
Priority to US15/279,135 priority patent/US10096545B2/en
Publication of JP2017069430A publication Critical patent/JP2017069430A/ja
Publication of JP2017069430A5 publication Critical patent/JP2017069430A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/42—Vias, e.g. via plugs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/601—Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
    • H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
    • H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
    • H10D84/017—Manufacturing their source or drain regions, e.g. silicided source or drain regions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
    • H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
    • H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
    • H10D84/0188—Manufacturing their isolation regions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/02—Manufacture or treatment characterised by using material-based technologies
    • H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85—Complementary IGFETs, e.g. CMOS
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H10F39/182—Colour image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/811—Interconnections

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  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP2015194479A 2015-09-30 2015-09-30 撮像装置、撮像システムおよび半導体装置の製造方法 Active JP6650719B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015194479A JP6650719B2 (ja) 2015-09-30 2015-09-30 撮像装置、撮像システムおよび半導体装置の製造方法
US15/279,135 US10096545B2 (en) 2015-09-30 2016-09-28 Semiconductor apparatus, system, and method of manufacturing semiconductor apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015194479A JP6650719B2 (ja) 2015-09-30 2015-09-30 撮像装置、撮像システムおよび半導体装置の製造方法

Publications (3)

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JP2017069430A JP2017069430A (ja) 2017-04-06
JP2017069430A5 JP2017069430A5 (enExample) 2018-11-01
JP6650719B2 true JP6650719B2 (ja) 2020-02-19

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US (1) US10096545B2 (enExample)
JP (1) JP6650719B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019130702A1 (ja) * 2017-12-27 2019-07-04 ソニーセミコンダクタソリューションズ株式会社 撮像装置
JP7009529B2 (ja) * 2020-02-18 2022-01-25 キヤノン株式会社 光電変換装置、光電変換装置を備えた機器、光電変換装置の製造方法
CN117043952A (zh) * 2021-04-05 2023-11-10 松下知识产权经营株式会社 摄像装置及其制造方法
JP2023170727A (ja) * 2022-05-20 2023-12-01 ソニーセミコンダクタソリューションズ株式会社 半導体装置及び電子機器

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1012729A (ja) * 1996-06-27 1998-01-16 Nec Corp 半導体装置の製造方法
JP3624140B2 (ja) * 1999-08-05 2005-03-02 キヤノン株式会社 光電変換装置およびその製造方法、デジタルスチルカメラ又はデジタルビデオカメラ
JP4628531B2 (ja) 1999-08-31 2011-02-09 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2002299571A (ja) 2001-04-02 2002-10-11 Mitsubishi Electric Corp 半導体装置およびその製造方法
JP4284908B2 (ja) 2001-12-25 2009-06-24 ソニー株式会社 Ｍｏｓ型固体撮像装置およびその製造方法
JP4809596B2 (ja) 2003-08-04 2011-11-09 株式会社半導体エネルギー研究所 半導体装置及びその作製方法
JP2005101557A (ja) 2003-08-28 2005-04-14 Seiko Epson Corp 半導体装置の製造方法、電子デバイスの製造方法、電子デバイス、及び表示装置
JP4291197B2 (ja) * 2004-04-06 2009-07-08 エルピーダメモリ株式会社 半導体装置及びその製造方法
JP5305622B2 (ja) 2006-08-31 2013-10-02 キヤノン株式会社 光電変換装置の製造方法
JP2008282914A (ja) * 2007-05-09 2008-11-20 Sharp Corp 半導体装置の製造方法
JP2009278049A (ja) 2008-05-19 2009-11-26 Toshiba Mobile Display Co Ltd 配線構造及び表示装置
JP2010287798A (ja) * 2009-06-12 2010-12-24 Canon Inc 半導体集積回路
JP5558916B2 (ja) 2009-06-26 2014-07-23 キヤノン株式会社 光電変換装置の製造方法
KR20120047368A (ko) * 2010-11-02 2012-05-14 삼성전자주식회사 이미지 센서
JP5943577B2 (ja) * 2011-10-07 2016-07-05 キヤノン株式会社 光電変換装置および撮像システム
JP2013089652A (ja) * 2011-10-14 2013-05-13 Sony Corp 固体撮像装置およびその製造方法
JP5582170B2 (ja) 2012-06-04 2014-09-03 ソニー株式会社 半導体装置および表示装置
JP2014090051A (ja) 2012-10-30 2014-05-15 Renesas Electronics Corp 半導体装置およびその製造方法
JP6282109B2 (ja) 2013-12-26 2018-02-21 キヤノン株式会社 撮像装置の製造方法および撮像装置

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US20170092582A1 (en) 2017-03-30
JP2017069430A (ja) 2017-04-06

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