JP6614471B1 - モリブデン硫化物、その製造方法及び水素発生触媒 - Google Patents
モリブデン硫化物、その製造方法及び水素発生触媒 Download PDFInfo
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- JP6614471B1 JP6614471B1 JP2019546934A JP2019546934A JP6614471B1 JP 6614471 B1 JP6614471 B1 JP 6614471B1 JP 2019546934 A JP2019546934 A JP 2019546934A JP 2019546934 A JP2019546934 A JP 2019546934A JP 6614471 B1 JP6614471 B1 JP 6614471B1
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- molybdenum
- molybdenum sulfide
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- sulfide
- temperature
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Abstract
Description
2.モリブデン酸化物を用いて、
(1)硫黄源の存在下、温度200〜1000℃で加熱するか、または
(2)硫黄源の不存在下で、温度100〜800℃で加熱してから、次いで硫黄源の存在下、温度200〜1000℃で加熱する
ことを特徴とする上記1記載のリボン状モリブデン硫化物の製造方法。
3.上記1記載のモリブデン硫化物を含有してなる水素発生触媒。
本発明におけるモリブデン硫化物はリボン状である。モリブデン硫化物の縦(長さ)、横(幅)及び厚さは、それぞれ、走査型電子顕微鏡(SEM)の観察またはその画像写真にて測定できる。SEMの特徴は、電子線の走査が直線的だが、走査軸を順次ずらしていくことで、主にモリブデン硫化物の形状を微細に観察することができる。SEMの倍率は、目視観察又は画像写真において、一視野に少なくともモリブデン硫化物50個が含まれる様な倍率であれば良いが、後記する、平均で、縦(長さ)×横(幅)×厚さの範囲に基づけば、1000〜200000倍の範囲から適切な倍率を選択することが好ましい。
また、モリブデン硫化物は、リボン状六面体の集合体であり、一つの、縦(長さ)×横(幅)×厚さしか有さないモリブデン硫化物のみを選択的に得ることは困難であるので、統計的に見て、50個の形状が、平均で、縦(長さ)×横(幅)×厚さ=500〜10000nm × 10〜1000nm × 3〜200nmを、中でも好ましくは、900〜5000nm × 30〜500nm × 3〜20nmを、さらに満足している必要がある。
硫化モリブデンは、上記した形状の範囲内において、それをどの様な用途に用いるかによって、表面や内部の構造に基づき、適宜、取捨選択して用いることができる。例えば、それ自体を触媒として用いる場合には、意図する化学反応をより効果的に進行させるために、反応原料の分子との接触面積を極力高めることが有効である。上記した様な、表面に面内部に向けた空孔入口を有し、内部に、独立した空孔及び/又はその他の面に連通する空孔を有する構造、例えば多孔質構造のモリブデン硫化物は、中密構造のそれに比べて、触媒活性を発揮させることができる。硫化モリブデンの六面体内部の空孔の大きさや多少については、ミクロ孔、メソ孔或いはマクロ孔のそれぞれに対応して、適宜、公知慣用の手法により測定することができる。具体的には、メソ孔及びマクロ孔を中心とした細孔分布や細孔容積に関しては、水銀圧入法による粉体(固体)の細孔径分布及び細孔特性に関する測定方法である、日本工業規格(JIS)Z8831を、ミクロ孔を中心とした細孔内部の表面大小に関しては、窒素ガス吸着法によるBET比表面積に関する測定方法である、日本工業規格(JIS)Z8830を、測定方法として挙げることができる。勿論、必要であれば、これらを組み合わせて測定を行っても良い。
本発明において、モリブデン硫化物とは、モリブデン原子と硫黄原子とから構成される化合物の総称である。この様なモリブデン硫化物としては、例えば、MoSx(x=1〜3)で表されるものが挙げられる。このMoSxは、例えば、三酸化モリブデン(MoO3)の様なモリブデン源と硫黄源との反応を行うに当たっての仕込みモル比率により、調整することができる。モリブデン源と硫黄源の仕込みモル比のバランスにより、二硫化モリブデン(MoS2)を必須成分として、その他のモリブデン硫化物をも含むMoSxが得られる。具体的には、二硫化モリブデンのみ、三硫化モリブデンのみ或いはこれらの混合物が挙げられる。
モリブデン硫化物中の他の原子の含有量は、10mol%以下であることが好ましく、5mol%以下であることがより好ましく、2mol%以下であることが最も好ましい。
上記した本発明の特定のモリブデン硫化物は、どの様な製造方法で得ても良いが、例えば、二酸化モリブデンの中間体を経由させ、水素と硫化水素と反応させ水が生じる、二段反応、三酸化モリブデンと硫黄自体を反応させ、二酸化硫黄が生じる一段反応、或いは、二酸化モリブデンの中間体を経由させ、硫黄と反応させ二酸化硫黄が生じる、二段反応等、任意の製造方法が挙げられる。
(1)硫黄源の存在下、温度200〜1000℃で加熱する〔第一の製造方法〕、
または
(2)硫黄源の不存在下で、温度100〜800℃で加熱して(第一工程を行って)から、次いで硫黄源の存在下、温度200〜1000℃で加熱する(第二工程を行う)
〔第二の製造方法〕といった、
二つの製造方法のいずれかを採用することすることが好ましい。
上記した第一又は第二のそれぞれの製造方法においては、いずれも原料として、モリブデン酸化物と、硫黄源とが共通して用いられる。
モリブデン酸化物としては、例えば、二酸化モリブデン、三酸化モリブデン等が挙げられ、これらは単独でも二種を併用しても良い。硫黄源としては、例えば、硫黄、硫化水素等が挙げられ、これらは単独でも二種を併用しても良い。硫黄も、反応に当たり固体で用いても良いし、高温で液体や気体にして用いても良い。モリブデン酸化物は、反応に当たり固体で用いても良いし、高温で液体や気体にして用いても良い。
しかしながら、三酸化モリブデンを融剤として用いて、アルミナ、スピネル、その他金属複合酸化物等の無機充填剤やルビー、サファイア、レッドスピネルといった宝石等の粒子を、高温でのフラックス法にて製造する場合は、その途中過程で、三酸化モリブデンを主成分とするガスが反応系から蒸発することから、この蒸気を回収してガスや液体のまま、或いは必要に応じて冷却して固体として、本発明のモリブデン硫化物の製造に再利用することもできる。この様な方法によれば、上記した無機充填剤や宝石の製造と、例えば触媒として有用なモリブデン硫化物を、並行して製造することができ、前者のみの製造において必要とされるモリブデン酸化物を回収する設備も不要となり、それぞれを別個独立して製造する場合に比べて、環境負荷や設備費用や設置スペースを抑制した上で、両者の生産性を著しく高めることができる。
勿論、上記した相変化に伴い系内が減圧状態となる場合には、外部から継続的に冷媒を導入することで圧力を平衡状態に保つたまま、冷却を行うこともできるし、系内圧力の平衡状態を保たず、冷媒を加圧して系内に導入して冷却しても良い。
本発明の特定のモリブデン硫化物は、例えば、合金鋼や潤滑油の添加剤、脱硫触媒、脱炭酸触媒、半導体材料、太陽電池材料、燃料電池材料等の公知慣用の各種用途に適用することができる。中でも、リボン状六面体であって、特定BET比表面積を有するモリブデン硫化物の粉体は、厚さに相当する面に多くの孔を有していることから、そこが活性部位となって、触媒活性が著しく高いという特異な性質を有する。
本発明の触媒能を評価するにあたっては、本発明を光励起しうる波長範囲の光を照射すればよい。光源の種類としては、光触媒材に正孔、電子を生成させるものであればよく、蛍光灯、殺菌灯、ブラックライト等の蛍光ランプ、キセノンランプ、銀ランプ等の放電ランプ、白熱灯などのフィラメントランプ、発光ダイオード(LED)、レーザー光などの人工光源、太陽光などが使用できる。
耐熱容器に相当する焼成炉と、外気供給口を設けた冷却配管と、モリブデン酸化物を回収する集塵機を準備し、三酸化モリブデン(太陽鉱工株式会社製)1kgと水酸化アルミニウム(和光製薬株式会社)2Kgとの混合物をサヤに仕込んで、焼成炉と冷却配管と集塵機とを連結し、焼成炉にて1300℃まで昇温後10時間保持し、α−アルミナを得ると共に、三酸化モリブデンを焼成炉内で気化させた。次に、焼却炉の排気口から気化した三酸化モリブデンに対して、冷却配管の外気供給口を通じて三酸化モリブデンの量に比べて大過剰の空気を、冷却速度が2000℃/秒となる様に送風、200℃以下まで急速冷却することで粉体化し、集塵機にて900gの三酸化モリブデンM−1を得た。
合成例1の酸化モリブデンM−1の3.0gを坩堝に入れ、AMF−2P型温度コントローラ付きセラミック電気炉ARF−100K型の焼成炉(セラミック電気炉、株式会社アサヒ理化製作所製)にて400℃で10時間焼成を行った。室温まで放冷した後、坩堝を取り出し、2.95gの三酸化モリブデンM−2を得た。
磁性るつぼ中へ、合成例1で作成した三酸化モリブデンM−1の1.00g(6.94mmmol)、硫黄粉末(関東化学製)1.56g(48.6mmol)を加え、粉末が均一になるように攪拌棒にて混合した。混合後、るつぼへ蓋を載せ、高温管状炉(山田電機株式会社製、TSS型)へ投入し、焼成を行った。焼成条件は、25℃の室温条件から、5℃/minの速度で昇温し、400℃に到達した後に4時間保持した。焼成工程中は、窒素ガスを0.2ml/minにて送風した。その後、炉内を自然放冷により降温させ、硫化モリブデンS−1を1.12g得た。
使用する三酸化モリブデンをM−1からM−2の同量へ変更したことを除いては、実施例1と同様の操作を行い、硫化モリブデンS−2を1.12g得た。
使用する硫黄粉末の量を1.56g(48.6mmol)から3.12g(97.2mmol)へ変更させたことを除いては、実施例1と同様の操作を行い、硫化モリブデンS−3を1.13g得た。
昇温速度を5℃/minから2℃/minへ変更したことを除いては、実施例1と同様の操作を行い、硫化モリブデンS−4を1.14g得た。
るつぼに蓋を載せないことへ変更したことを除いては、実施例1と同様の操作を行い、硫化モリブデンS−5を1.13g得た。
実施例1において、使用する三酸化モリブデンを上記M−1から、太陽鉱工株式会社製P−Mo(汎用三酸化モリブデン、平均粒子径5−10μm)の同量へ変更したことを除いては、実施例1と同様の操作を行い、硫化モリブデンS−6を1.13g得た。
評価する硫化モリブデンを、関東化学株式会社製硫化モリブデン(市販試薬)に変更する以外は、実施例1と同様の評価を行った。
上記実施例1〜2及び比較例1〜2で得られた、硫化モリブデンS−1、S−2及び同S−6、S−7をそれぞれ用いて、光触媒能の評価を行った。この評価における水素発生量から、水素発生触媒としての機能の優劣を定めることができる。
生成した水素の定量は、前記反応系に接続した株式会社島津製作所製ガスクロマトグラフ(Shimazu;GC−8A、MS−5A column、TCD、Ar carrier)にて行い、水素発生量の高い順に、◎、○、△、▲で格付けした。
上記実施例1及び比較例2で得られた、硫化モリブデンS−1及びS−7をそれぞれ用いて、公知の方法(J.Am.Chem.Soc.2016,138,14962)に従って光触媒能の評価を行った。この評価における水素発生量から、水素発生触媒としての機能の優劣を定めることができる。
上記実施例1および比較例2のモリブデン硫化物40mgと、硫化カドミウム(CdS、和光純薬)1.96mgをエタノール中で超音波分散させた。この分散液のエタノールを留去し、アルゴン雰囲気下で400℃、4時間焼成し、2wt%の硫化モリブデン/硫化カドミウム複合体を得た。
硫化モリブデン/硫化カドミウム複合体0.2gを、pH=5に調整した300mlの乳酸水溶液(濃度30vol%)にけん濁させ、反応溶液とした。光源として300Wのキセノンランプを用いて、カットオフフィルター(L42、HOYA)により420nmより長波長側の可視光を照射して光触媒反応を行った。生成した水素の定量はガスクロマトグラフ(GC−8A、島津製作所)にて行った。
Claims (6)
- 走査型電子顕微鏡(SEM)の観察にて測定される50個の形状が、平均で、縦(長さ)×横(幅)×厚さ=500〜10000nm × 10〜1000nm × 3〜200nmであり、かつBET法による比表面積が、25〜100m 2 /gであるリボン状モリブデン硫化物。
- モリブデン硫化物が、高周波誘導結合プラズマ(ICP)発光分光分析法の測定に基づきMoSx(x=1〜3)で表されるモリブデン硫化物である請求項1 記載のリボン状モリブデン硫化物。
- モリブデン酸化物を用いて、
(1)硫黄源の存在下、温度200〜1000℃で加熱するか、または
(2)硫黄源の不存在下で、温度100〜800℃で加熱してから、次いで硫黄源の存在下、温度200〜1000℃で加熱する
ことを特徴とする請求項1記載のリボン状モリブデン硫化物の製造方法。 - モリブデン酸化物として、透過型電子顕微鏡写真の二次元画像の視野内50個の平均1次粒子径が5〜1000nmのモリブデン酸化物を用いる請求項3記載のリボン状モリブデン硫化物の製造方法。
- 硫黄源の不存在下で、温度100〜800℃で加熱してリボン状モリブデン酸化物を得て、次いで硫黄源の存在下、当該リボン状モリブデン酸化物を温度200〜1000℃で加熱する請求項4記載のリボン状モリブデン硫化物の製造方法。
- 請求項1または2記載のモリブデン硫化物を含有してなる水素発生触媒。
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