JP6605871B2 - Substrate floating transfer device - Google Patents

Description

  The present invention relates to a substrate levitating and conveying apparatus that conveys a substrate while levitating, and in particular, conveys a substrate having a flatness with high accuracy even if the substrate has a larger dimension in the river width direction than a reference size substrate. The present invention relates to a substrate levitating and conveying apparatus.

  A flat panel display such as a liquid crystal display or a plasma display uses a substrate coated with a resist solution (referred to as a coated substrate). In the coated substrate, a coating film is formed by uniformly applying a resist solution onto the substrate by a coating apparatus while the substrate is being conveyed. Thereafter, the coating film is further transported by a substrate transporting device, and the coating film is dried by a drying device or the like to be produced.

  In recent substrate transport devices, in order to avoid damage to the back surface (the side opposite to the coating surface) of the coated substrate, a substrate floating transport device that transports the substrate while floating the substrate, such as air levitation or ultrasonic levitation, is used. Yes. As shown in FIG. 7, the substrate levitation transport apparatus includes a levitation stage unit 100 that levitates the substrate W and a substrate holding unit 102 that holds the substrate W in a floating state. By moving in the transport direction, the substrate W is transported in a state of being floated on the floating stage unit 100.

  For example, in the case of air levitation transport, as shown in FIG. 8A, a jet outlet for jetting air and a suction port for sucking air on the substrate floating surface 101 for floating the substrate W in the levitation stage unit 100; Are arranged at a certain ratio, and the air jet power and the air suction force are adjusted so that the substrate W can be floated to a predetermined height position from the substrate air bearing surface 101 (arrow in FIG. 8). Indicates air flow). Then, both end portions in a direction orthogonal to the transport direction of the substrate W (hereinafter referred to as the river width direction) are held by being sucked by the suction portion 102a of the substrate holding portion 102. In this state, the substrate holding portion 102 is held in the transport direction. , The substrate W is transported in the transport direction. That is, the floating stage unit 100 is formed small in the river width direction with respect to the substrate W. When the substrate W is placed on the substrate floating surface 101 of the floating stage unit 100, the substrate W is adsorbed to both ends of the river width direction. It is formed to such an extent that it has a sufficient amount of adsorption (excess region T). Then, by placing the substrate holding unit 102 close to the levitation stage unit 100 and reducing the region where air levitation does not act as much as possible, the substrate W can be evenly levitated across both ends in the river width direction. It is possible to carry W in a state where the plane orientation of W (hereinafter referred to as flatness) is maintained with high accuracy. As a result, in the coating device 103 and the drying device combined with the substrate floating transport device, it is possible to suppress coating unevenness and drying unevenness due to the influence of the posture of the substrate W.

JP2013-115125A

  In recent years, with various types of substrates W, coated substrates W having different sizes may be required. That is, there is a case where a substrate W having a larger dimension in the river width direction than usual (hereinafter referred to as a wide substrate W) is required due to diversification of the substrate size of the final product. However, if an attempt is made to transport the wide substrate W with the above-described substrate levitation transport apparatus, as shown in FIG. 8B, the substrate effective region α to be applied extends over the substrate stage 102 beyond the levitation stage unit 100. As a result, there is a problem that the flatness of the substrate W cannot be maintained. That is, when the substrate effective region α extends over the substrate holding unit 102, the floating stage unit 100 and the substrate holding unit 102 have different floating states in the substrate effective region α. In the apparatus, there is a problem that uneven coating or uneven drying due to a change in the posture of the substrate W occurs.

  In such a case, the wide substrate W having a small size in the river width direction cannot be transported by the substrate floating transport device, and a new substrate floating transport device is used to transport the wide substrate W. There was a problem that it was necessary to prepare separately.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a substrate levitation transport apparatus that can transport a wide substrate having a large dimension in the river width direction while maintaining the flatness with high accuracy. It is said.

In order to solve the above problems, a substrate levitation transport apparatus according to the present invention includes a levitation stage unit that extends in the transport direction and levitates a substrate on the substrate air bearing surface, and a substrate holding unit that retains the substrate levitated on the substrate air bearing surface. And the substrate holding unit moves along the transport direction while holding the substrate floating on the substrate air bearing surface, so that the substrate is transported in a state of floating on the substrate air bearing surface. In the substrate levitation transfer apparatus, the substrate floating surface is provided between the levitation stage unit and the substrate holding unit when a wide substrate having a dimension in the river width direction perpendicular to the transfer direction is larger than that of a reference size substrate. and an auxiliary floating support unit for floating the protruding region of the wide substrate protruding in the river direction from the auxiliary floating support unit, the provided on the substrate holder, the auxiliary floating the support portion The suction surface on which the substrate of the reference size is sucked and held is provided on the inner side in the river width direction than the suction surface of the substrate holding unit, and when the substrate of the reference size is transported, the auxiliary levitation support portion The substrate of the reference size is sucked and held by the suction surface, and the wide substrate is sucked and held by the suction surface of the substrate holder when the wide substrate is transported .

  According to the substrate levitation transport apparatus, since the auxiliary levitation support portion is provided between the levitation stage portion and the substrate holding portion, even a wide substrate having a large dimension in the river width direction is transported while maintaining high flatness. be able to. That is, in the wide substrate, the region that protrudes in the river width direction from the levitation stage portion is set in the same levitation state as the substrate located on the levitation stage portion by the levitation mechanism by the auxiliary levitation support portion. The floating state can be made uniform. Therefore, compared to the conventional substrate levitation transfer device, the flatness of the wide substrate can be maintained with high accuracy, and the problem of uneven coating can be suppressed in the effective area of the substrate. Equipment costs for preparing the apparatus separately can be reduced.

  Further, the auxiliary levitation support part preferably has a structure in which the levitation mechanism has the same levitation mechanism as the levitation stage part.

  According to this configuration, since the auxiliary levitation support unit has the same levitation mechanism as the levitation stage unit (for example, air levitation, ultrasonic levitation, etc.), the levitation state in the auxiliary levitation support unit is changed to the levitation stage unit. The same state as the state can be obtained, and the floating state of the wide substrate can be made uniform over the river width direction.

In addition, regardless of whether a substrate of a reference size or a wide substrate is transported, the setup operation can be simplified without reconfiguring the apparatus configuration.

Further, the suction surface of the substrate holding unit is set to be higher in height than the suction surface of the auxiliary levitation support unit, and the auxiliary substrate is held in a state where the wide substrate is held by the suction surface of the substrate holding unit. A configuration may be adopted in which the levitation mechanism of the levitation support portion maintains the same levitation state as the levitation state in the levitation stage portion.

  According to this configuration, when the wide substrate is held, the floating state is maintained in the same state in both the floating stage unit and the auxiliary floating support unit, so that the flatness of the wide substrate is highly accurate over the river width direction. Can be maintained.

  According to the substrate floating conveyance device of the present invention, even a wide substrate having a large dimension in the river width direction can be conveyed while maintaining the flatness with high accuracy.

It is a perspective view which shows the coating device combined with the substrate floating conveyance apparatus in one Embodiment of this invention. It is a front view of the coating device combined with the substrate floating conveyance apparatus in the said one embodiment. It is an enlarged view which shows the state which hold | maintained the board | substrate in the substrate floating conveyance apparatus in the said one embodiment, (a) is a figure which shows the state holding the standard board | substrate, (b) is a floating stage part in order to hold | maintain a wide substrate. It is a figure which shows the state which attached the auxiliary | assistant levitation support part. It is a figure which shows the board | substrate holding part of the board | substrate levitation conveyance apparatus in the said one embodiment, (a) is a figure which shows the state holding the standard board | substrate, (b) is holding a wide board | substrate when attaching an auxiliary | assistant levitation support part. It is a figure which shows the state which carried out. It is a figure which shows the suction pad of the board | substrate holding | maintenance part of the substrate floating conveyance apparatus in the said one embodiment, (a) is a figure which shows the state before adsorb | sucking, (b) is a figure which shows the adsorbed state. It is a figure which shows the board | substrate holding | maintenance part of the substrate floating conveyance apparatus in other embodiment, (a) is a figure which shows the state holding the standard board | substrate, (b) is a figure which shows the state which hold | maintained the wide board | substrate. . It is a perspective view which shows the coating device combined with the conventional board | substrate floating conveyance apparatus. It is a figure which shows the holding state of the board | substrate in the conventional board | substrate floating conveyance apparatus, (a) is a figure which shows the state holding the standard board | substrate, (b) is a figure which shows the state which hold | maintained the wide board | substrate.

  DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments according to the present invention will be described with reference to the drawings.

  FIG. 1 is a perspective view schematically showing a coating apparatus 2 combined with the substrate floating conveyance apparatus 1 of the present invention, and FIG. 2 is a front view of the coating apparatus 2 combined with the substrate floating conveyance apparatus 1 in FIG. is there.

  In FIG. 1 and FIG. 2, a substrate floating transfer device 1 that transfers a substrate W is combined with a coating unit 21 of a coating device 2 that forms a coating film on the substrate W to be transferred to form a series of substrate processing devices. is doing. The substrate levitation transport apparatus 1 has a levitation stage portion 10 extending in one direction, and the substrate W is transported along the direction in which the levitation stage portion 10 extends. In the example of FIG. 1, the levitation stage unit 10 is formed to extend in the X-axis direction so that the substrate W is transported from the upstream side (pre-process side) to the downstream side (post-process side) in the X-axis direction. It has become. Then, a coating film is formed on the substrate W by discharging the coating liquid from the coating unit 21. Specifically, a coating film having a uniform thickness is formed on the substrate W by discharging the coating liquid from the coating unit 21 while being transported in the X-axis direction while the substrate W is floated on the floating stage unit 10. It is supposed to be formed. In the following description, the direction in which the substrate W is transported is the X-axis direction, and the X-axis direction corresponds to the transport direction. In addition, a direction orthogonal to the X-axis direction (conveying direction) on the horizontal plane is referred to as a Y-axis direction, and in particular, the Y-axis direction is also referred to as a river width direction. The description will be made with the direction orthogonal to both the X-axis direction and the Y-axis direction as the Z-axis direction.

  The coating unit 21 applies a coating solution to the substrate W, and has a frame portion 22 and a base portion 23. The frame portion 22 has support columns 22a disposed on both sides in the Y-axis direction of the levitation stage unit 10, and a base portion 23 is provided on the support column 22a. Specifically, the support columns 22a are fixedly provided on both sides in the Y-axis direction (river width direction), so that the travel of the substrate holding unit 30 to be described later is prevented from being hindered. Is also arranged on the outside. And the base part 23 is provided so that it may span over these support | pillars 22a, and the base part 23 is attached in the state which crosses the floating stage part 10. FIG. The support 22a is provided with an elevating mechanism, and the base 23 can be moved in the Z direction by operating the elevating mechanism. That is, the base portion 23 can be moved toward and away from the floating stage portion 10 by the lifting mechanism.

  The base part 23 is for discharging the coating liquid and is formed extending in one direction. The base part 23 is formed with a slit nozzle 23a (see FIG. 2) extending in one direction so that the coating liquid stored in the base part 23 can be discharged from the slit nozzle 23a. Specifically, the slit nozzle 23a is formed on a surface facing the levitation stage unit 10, and the base unit 23 is installed in a state where the slit nozzle 23a extends in the river width direction. Then, the base 23 is moved up and down with respect to the substrate W to be transported, and the coating liquid is discharged from the slit nozzle 23a in a state where the distance between the substrate W and the slit nozzle 23a is adjusted to a predetermined distance. A uniform coating film is continuously formed in the transport direction.

  Further, the substrate levitation transport apparatus 1 transports the substrate W in a specific direction while floating. The substrate levitation transport apparatus 1 includes a levitation stage unit 10 that levitates the substrate W, and a substrate transport unit 3 that holds and transports the substrate W levitated on the levitation stage unit 10.

  The levitation stage unit 10 levitates the substrate W, and has an air levitation mechanism in the present embodiment. The levitation stage unit 10 is formed by providing a flat plate portion 12 on a base 11, and is formed by arranging a plurality of flat plate portions 12 along the X-axis direction. That is, the flat plate portion 12 has a smooth substrate air bearing surface 12a (see FIG. 3), and the substrate air bearing surfaces 12a are arranged so as to have a uniform height. An air layer is formed between the substrate floating surface 12a and the substrate W to be transported, so that the substrate W can be floated to a predetermined height position. Specifically, the flat plate portion 12 is formed with a fine jet port (not shown) and a suction port (not shown) that open to the substrate floating surface 12a, and the jet port and the compressor are connected by a pipe. The suction port and the vacuum pump are connected by piping. Then, by balancing the air ejected from the ejection port and the suction force generated at the suction port, the substrate W can be floated in a horizontal posture at a predetermined height from the substrate air bearing surface 12a. . As a result, the substrate W can be transported in a state in which the planar posture (referred to as flatness) is maintained with high accuracy.

  Further, the flat plate portion 12 of the levitation stage unit 10 is formed such that the dimension in the Y-axis direction is smaller than the dimension in the Y-axis direction of the reference-size substrate W (standard substrate W), and the substrate W is placed on the substrate floating surface 12a. When placed, the end of the substrate W in the Y-axis direction protrudes from the substrate air bearing surface 12a. By holding the protruding portion (protruding region T) by the substrate transfer unit 3 described later, the substrate W can be transferred. The dimension of the flat plate portion 12 in the Y-axis direction is set so that the protruding region T has a minimum necessary size that can be held by the substrate holding portion 30. That is, the protruding amount of the protruding region T is such that a slight gap that does not contact each other is formed between the substrate holding unit 30 and the flat plate portion 12 when the substrate holding unit 30 holds the protruding region T of the substrate W. It is set to the extent to be. Note that the reference-size substrate W refers to a substrate W having a reference size when designing the substrate floating transfer apparatus 1, and is different from the standard substrate W with respect to the wide substrate W having a large size in the river width direction described later. I will call it.

  The flat plate portion 12 can be attached with the auxiliary levitation support portion 4. The auxiliary levitation support portion 4 is configured to maintain the posture of the wide substrate W horizontally across the river width direction when the wide substrate W having a large dimension in the river width direction with respect to the standard substrate W is transported.

  The auxiliary levitation support portion 4 of the present embodiment is an auxiliary block 40, and is attached and fixed to the side surface in the Y-axis direction (river width direction) of the flat plate portion 12 when the wide substrate W is transported. Specifically, the auxiliary block 40 has a rectangular parallelepiped shape, the transport direction dimension is the same as that of the flat plate portion 12, and the river width direction dimension is such that the wide substrate W is placed on the substrate floating surface 12a. In this case, the Y-axis direction end portion of the wide substrate W is formed in a dimension that protrudes in the river width direction. In other words, the amount of protrusion is the minimum required for the substrate holding unit 30 to travel without contacting the auxiliary block 40 when the substrate holding unit 30 holds the substrate W, like the standard substrate W, that is, The dimension is set such that a slight gap is formed between the substrate holder 30 and the auxiliary block 40 without contacting each other. In addition, when the auxiliary block 40 is attached, the upper surface of the auxiliary block 40 is set to be the same height as the substrate floating surface 12 a of the flat plate portion 12. Thereby, the flat plate portion 12 and the auxiliary block 40 form a flat and uniform substrate floating surface 12a that is slightly larger.

  Further, the auxiliary block 40 (auxiliary levitation support portion 4) has the same levitation mechanism as the levitation stage portion 10 (in this embodiment, an air levitation mechanism). Specifically, a jet port (not shown) and a suction port (not shown) are formed on the surface of the auxiliary block 40 on which the substrate floating surface 12a is formed, like the flat plate portion 12. Are formed in the same manner as the nozzle and suction port. That is, it is formed so as to have the same ratio and the same positional relationship as the outlet and the suction port of the flat plate portion 12, and the floating state of the substrate W in the flat plate portion 12 and the floating state of the substrate W in the auxiliary block 40 are the same state. Can be made. Therefore, in the state where the auxiliary block 40 is attached, even the wide substrate W can be floated uniformly over the river width direction, and the substrate W can be floated while maintaining the flatness of the substrate W with high accuracy. it can.

  The substrate transport unit 3 transports the substrate W in a floating state, and includes a substrate holding unit 30 that holds the substrate W and a transport driving unit 31 that runs the substrate holding unit 30.

  The transport driving unit 31 is configured to move the substrate holding unit 30 in the transport direction, and includes a transport rail unit 31a that extends in the transport direction along the floating stage unit 10, and a transport that travels on the transport rail unit 31a. The main body 31b is formed. Specifically, bases 11 provided so as to extend in the transport direction are arranged on both sides of the floating stage portion 10 in the river width direction, and transport rail portions 31 a are provided on the respective bases 11. That is, the conveyance rail part 31a is continuously provided along the levitation stage part 10 without interruption. Moreover, the conveyance main-body part 31b is a plate-shaped member formed in the concave shape, and as shown to Fig.4 (a), it is provided so that the upper surface of the conveyance rail part 31a may be covered. Specifically, the transport main body 31b is provided so as to cover the transport rail 31a via the air pad 32, and the transport main body 31b moves over the transport rail 31a by driving a linear motor (not shown). It is supposed to run. That is, by controlling the driving of the linear motor, the transport main body 31b can travel without contacting the transport rail 31a and can stop at an appropriate position.

  The substrate holding unit 30 holds the substrate W, and is attached to the transport main body 31b. Specifically, as shown in FIG. 4A, the substrate holding unit 30 is formed in a substantially rectangular parallelepiped block shape, and is attached through a gap that does not contact the flat plate portion 12 of the floating stage unit 10. It has been. Further, the substrate holding unit 30 is set so that the upper surface (suction surface 33) thereof is at the height position and the surface position of the lower surface of the substrate W that is levitated. As shown in FIG. 5, an opening 34 is formed in the suction surface 33, and an accordion-shaped suction pad 35 that can be elastically deformed is embedded in the opening 34. The suction pad 35 generates suction force and sucks and holds the substrate W. In a normal state (a state where there is no substrate W), the suction pad 35 waits with its tip slightly protruding from the opening 34. Has been set (see FIG. 5A). When the substrate W is placed on the substrate air bearing surface 12a, the portion protruding from the substrate air bearing surface 12a in the river width direction comes into contact with the suction pad 35. When a suction force is generated on the suction pad 35 in this state, the lower surface of the substrate W is sucked by the suction pad 35 while the suction pad 35 itself contracts into the opening 34 while maintaining the suction state. Is in contact with the suction surface 33 to hold the substrate W (see FIG. 5B). Thereby, the board | substrate W levitated by the levitating stage part 10 is hold | maintained in the state which maintained the same levitating height position over the river width direction.

  Further, the substrate holding unit 30 has a position adjusting mechanism. That is, the substrate holding unit 30 is provided on the transport main body 31b via the linear guide 36, and can move in the river width direction. Specifically, a linear guide 36 that can move in the river width direction is attached to the transport main body 31 b, and the substrate holder 30 is attached to the linear guide 36. Then, by driving and controlling the linear guide 36, the substrate holding part 30 moves in the river width direction and can be stopped at an appropriate position.

  In the present embodiment, when the standard substrate W is transported, the substrate holding unit 30 is moved and fixed to a position close to the floating stage unit 10 (see FIG. 4A). In other words, the substrate holding unit has a gap between the substrate holding unit 30 and the floating stage unit 10 so that the substrate holding unit 30 does not contact the flat plate part 12 of the floating stage unit 10 even when the substrate holding unit 30 travels in the transport direction. 30 is fixed to a position as close as possible to the levitation stage unit 10. Thereby, the area | region where a floating mechanism does not act on the board | substrate W can be decreased as much as possible, and the floating state of the board | substrate W can be made uniform over a river width direction.

  Further, when transporting the wide substrate W, the substrate moves to the outside in the river width direction as much as the auxiliary block 40 exists, and the substrate holding unit 30 is fixed at a position close to the auxiliary block 40 (see FIG. 4B). ). Even in this case, the substrate holding unit 30 is fixed so as to have a gap that does not come into contact with the auxiliary block 40 even when the substrate holding unit 30 travels in the transport direction, and floats on the substrate W. The region where the mechanism does not act is reduced as much as possible, and the floating state of the substrate W can be made uniform over the river width direction.

  As described above, in the substrate levitation transfer apparatus 1 according to the present embodiment, the auxiliary levitation support portion 4 (auxiliary block 40) is provided between the levitation stage portion 10 and the substrate holding portion 30, so that the size is large in the river width direction. Even the wide substrate W can be transported while maintaining the flatness with high accuracy. That is, the region of the wide substrate W that protrudes in the river width direction from the levitation stage unit 10 is set to the same levitation state as the substrate W located on the levitation stage unit 10 by the levitation mechanism by the auxiliary levitation support unit 4. The levitation state can be made uniform over the river width direction. Therefore, compared with the conventional substrate floating transfer apparatus 1, the flatness of the wide substrate W can be maintained with high accuracy and the problem of uneven coating can be suppressed in the effective region of the substrate W. The equipment cost for preparing a separate substrate levitation transfer apparatus 1 can be reduced.

  Further, since the auxiliary block 40 uses the same air levitation mechanism as the levitation stage unit 10, the levitation state in the auxiliary block 40 can be made the same as the levitation state in the levitation stage unit 10, so that the wide substrate The floating state of W can be made uniform over the river width direction.

  Moreover, although the said embodiment demonstrated the case where the auxiliary levitation support part 4 was the auxiliary block 40 attached to the levitation stage part 10, the auxiliary levitation support part 4 may be provided in the board | substrate holding part 30. . In the example shown in FIG. 6, the suction surface 33 a of the substrate holding unit 30 is configured to form a part of the auxiliary levitation support unit 4. That is, the substrate holding unit 30 is provided with the suction block 37, the auxiliary levitation support unit 4 is formed on the inner side in the river width direction, and the substrate holding unit 30 is formed on the outer side in the river width direction, which are integrally configured. . Specifically, the suction surface 33 a of the substrate holding unit 30 is located on the outer side in the river width direction and is formed at a position higher than the suction surface 33 b of the auxiliary levitation support portion 4. Each of the suction surfaces 33 (the suction surface 33a and the suction surface 33b) has an opening 34, and the suction pad 35 described above is embedded in the opening 34 so that the substrate W can be sucked and held. It is like that. That is, the auxiliary levitation support portion 4 in the suction block 37 is disposed at a position close to the flat plate portion 12 of the levitation stage portion 10, and when the standard substrate W is placed on the levitation stage portion 10, the substrate levitation surface 12 a The protruding area T that protrudes can be sucked by the suction pad 35 (FIG. 6A). That is, the auxiliary levitation support portion 4 of the suction block 37 has a gap that does not contact the flat plate portion 12 of the levitation stage portion 10 even when the substrate holding portion 30 travels in the transport direction, as in the above embodiment. It is arranged and can be floated uniformly over the river width direction, and can be floated while maintaining the flatness of the substrate W with high accuracy.

  Further, the suction pad 35 in the substrate holding unit 30 is arranged at a position where the protruding region T of the wide substrate W placed on the floating stage unit 10 can be sucked. Further, the suction surface 33b of the auxiliary levitation support portion 4 is formed with a jet port (not shown) and a suction port (not shown), which are formed in the same manner as the jet port and the suction port of the flat plate portion 12. Yes. That is, when the wide substrate W is placed on the levitation stage unit 10, the portion protruding from the levitation stage unit 10 is levitated by the levitation mechanism provided on the auxiliary levitation support unit 4 of the suction block 37. The height positions of the suction surface 33b and the substrate floating surface 12a are set to a common height. As a result, the protruding region T of the wide substrate W can be levitated by the levitating mechanism having the same configuration as the levitating mechanism provided in the levitating stage unit 10, so that the substrate holding unit 30 moves outward from the levitating stage unit 10 in the river width direction. Even if they are arranged at distant positions, the floating state of the substrate W can be made uniform over the river width direction. And in this embodiment, since the auxiliary block 40 does not need to be replaced when transporting the standard substrate W and the wide substrate W as in the above embodiment, the setup work is simplified compared to the above embodiment. be able to.

  In the above embodiment, an example in which an air levitation mechanism is used as the levitation mechanism of the levitation stage unit 10 has been described. However, other levitation mechanisms such as ultrasonic levitation may be used.

  In the above-described embodiment, an example in which the same levitation mechanism as that of the levitation stage unit 10 is used in the auxiliary levitation support unit 4 has been described. However, a different levitation mechanism may be used. For example, an ultrasonic levitation mechanism may be used for the levitation stage unit 10, and an air levitation mechanism may be used for the auxiliary levitation support unit 4. Regardless of which levitation mechanism is used, it is only necessary that the levitation heights of the levitation stage unit 10 and the auxiliary levitation support unit 4 are made common to form a uniform levitation state in the river width direction.

  Moreover, although the said embodiment demonstrated the example which combines the substrate levitation conveyance apparatus 1 with the coating device 2, you may combine the substrate levitation conveyance apparatus 1 with a drying apparatus, and it can be used in combination with various substrate processing apparatuses. it can.

DESCRIPTION OF SYMBOLS 1 Substrate floating conveyance apparatus 2 Coating apparatus 3 Substrate conveyance unit 4 Auxiliary levitation support part 10 Levitation stage part 12 Flat plate part 12a Substrate floating surface 30 Substrate holding part 33 Adsorption surface 37 Adsorption block 40 Auxiliary block

Claims (3)

A levitation stage that extends in the transport direction and levitates the substrate on the substrate levitation surface;
A substrate holding unit for holding the substrate levitated on the substrate air bearing surface;
The substrate is transported in a state where the substrate is floated on the substrate air bearing surface by moving the substrate holding portion along the transport direction in a state where the substrate floated on the substrate air bearing surface is retained In the levitation transport device,
In the case of transporting a wide substrate having a larger dimension in the river width direction perpendicular to the transport direction than the substrate of the standard size between the levitation stage unit and the substrate holding unit, the wide projecting from the substrate floating surface in the river width direction is carried out. It has an auxiliary levitation support that levitates the protruding area of the substrate,
The auxiliary levitation support part is provided integrally with the substrate holding part, and the auxiliary levitation support part has an adsorption surface on which the substrate of the reference size is adsorbed and held by the adsorption surface of the substrate holding part. Than the river width direction inside,
When the substrate of the reference size is transported, the substrate of the reference size is sucked and held by the suction surface of the auxiliary levitation support portion, and when the wide substrate is transported, the suction surface of the substrate holding portion. A substrate floating transfer apparatus, wherein the wide substrate is held by suction . The suction surface of the substrate holding part is set to be higher than the suction surface of the auxiliary levitation support part, and the auxiliary levitation support is supported in a state where a wide substrate is held by the suction surface of the substrate holding part. 2. The substrate levitation transfer apparatus according to claim 1 , wherein the levitation state is maintained in the same levitation state as the levitation state in the levitation stage portion . 3. The substrate levitation transport apparatus according to claim 1, wherein the auxiliary levitation support portion has the same levitation mechanism as the levitation stage portion .

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