JP6604833B2 - プラズマエッチング方法 - Google Patents
プラズマエッチング方法 Download PDFInfo
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- JP6604833B2 JP6604833B2 JP2015236624A JP2015236624A JP6604833B2 JP 6604833 B2 JP6604833 B2 JP 6604833B2 JP 2015236624 A JP2015236624 A JP 2015236624A JP 2015236624 A JP2015236624 A JP 2015236624A JP 6604833 B2 JP6604833 B2 JP 6604833B2
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- 238000000034 method Methods 0.000 title claims description 52
- 238000001020 plasma etching Methods 0.000 title claims description 46
- 239000007789 gas Substances 0.000 claims description 82
- 238000005530 etching Methods 0.000 claims description 41
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 38
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 38
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 38
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 37
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 claims description 23
- 230000008569 process Effects 0.000 claims description 17
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 14
- 229910052731 fluorine Inorganic materials 0.000 claims description 14
- 239000011737 fluorine Substances 0.000 claims description 14
- 229910000042 hydrogen bromide Inorganic materials 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 8
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 8
- 229910052794 bromium Inorganic materials 0.000 claims description 8
- 238000010586 diagram Methods 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000003507 refrigerant Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000012267 brine Substances 0.000 description 3
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
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Description
まず、本発明の一実施形態のプラズマエッチング装置について、図1に基づき説明する。図1は、本実施形態のプラズマエッチング装置の縦断面の一例を示す図である。
次に、フッ素含有ガスを用いたシリコン酸化膜(SiO2)とシリコン窒化膜(SiN)との積層膜のエッチングについて、図2に基づき説明する。図2はエッチング前後の積層膜の断面形状を説明する図であり、図2(a)はエッチング前の積層膜の概略断面を示し、図2(b)はエッチング後の積層膜の概略断面を示している。
・チラーユニットの設定温度:−60℃
・ガス:水素(H2)/四フッ化炭素(CF4)/トリフルオロメタン(CHF3)
・圧力:60mTorr(8.0Pa)
・第1高周波電力HF:2500W、連続波
・第2高周波電力LF:4000W、パルス波、周波数0.3kHz、デューティ比55%
図3は、シリコン酸化膜とシリコン窒化膜との界面に生じる段差を説明する図であり、下図は上図における領域Aを拡大した断面を示している。
第1実施形態のプラズマエッチング方法について、図4に基づき説明する。図4は、第1実施形態のプラズマエッチング方法の一例を示すフローチャートである。
(第1の工程)
・チラーユニットの設定温度:−60℃
・ガス:H2/CF4/CHF3
・圧力:60mTorr(8.0Pa)
・第1高周波電力HF:2500W、連続波
・第2高周波電力LF:4000W、パルス波、周波数0.3kHz、デューティ比55%
(第2の工程)
・チラーユニットの設定温度:−60℃
・ガス:H2/CF4/CHF3/HBr
・圧力:60mTorr(8.0Pa)
・第1高周波電力HF:2500W、連続波
・第2高周波電力LF:5500W、連続波
このとき、比較例として、第2の工程において、HBrを添加しなかった以外は、第1実施形態と同様の工程により、プラズマエッチングを行った。プロセス条件は以下の通りである。
(第1の工程)
・チラーユニットの設定温度:−60℃
・ガス:H2/CF4/CHF3
・圧力:60mTorr(8.0Pa)
・第1高周波電力HF:2500W、連続波
・第2高周波電力LF:4000W、パルス波、周波数0.3kHz、デューティ比55%
(第2の工程)
・チラーユニットの設定温度:−60℃
・ガス:H2/CF4/CHF3
・圧力:60mTorr(8.0Pa)
・第1高周波電力HF:2500W、連続波
・第2高周波電力LF:5500W、連続波
図5は、第1実施形態のプラズマエッチングの効果を説明する図であり、下図は上図における領域Aを拡大した断面を示している。具体的には、図5(a)は第1の工程の後に本実施形態の第2の工程のエッチングを行った後の積層膜200の断面を示し、図5(b)は第1の工程の後に比較例の第2の工程のエッチングを行った後の積層膜200の断面を示している。
第2実施形態のプラズマエッチング方法について説明する。第1実施形態では、第2の工程において使用する第2の処理ガスが、第1の工程で使用する第1の処理ガスに臭素含有ガスを添加した処理ガスである形態について説明した。これに対して、第2実施形態では、第2の工程において使用する第2の処理ガスが、第1の工程で使用する第1の処理ガスとは異なる処理ガスに臭素含有ガスを添加する形態について説明する。
(第1の工程)
・チラーユニットの設定温度:−60℃
・ガス:H2/CF4/CHF3
・圧力:60mTorr(8.0Pa)
・第1高周波電力HF:2500W、連続波
・第2高周波電力LF:4000W、パルス波、周波数0.3kHz、デューティ比55%
(第2の工程)
・チラーユニットの設定温度:−60℃
・ガス:ジフルオロメタン(CH2F2)/メタン(CH4)/三フッ化窒素(NF3)/HBr
・圧力:60mTorr(8.0Pa)
・第1高周波電力HF:2500W、連続波
・第2高周波電力LF:5500W、連続波
図6は、第2実施形態のプラズマエッチングの効果を説明する図であり、下図は上図における領域Aを拡大した断面を示している。具体的には、図6は第1の工程の後に本実施形態の第2の工程のエッチングを行った後の積層膜200の断面を示している。
31 第1高周波電源
32 第2高周波電源
200 積層膜
201 シリコン酸化膜
202 シリコン窒化膜
HF 第1高周波電力
LF 第2高周波電力
Claims (10)
- 開口を有するエッチングマスクを用いてシリコン酸化膜とシリコン窒化膜との積層膜をエッチングするプラズマエッチング方法であって、
プラズマ生成用の高周波電力を用いて、臭素含有ガスを含まず、フッ素含有ガス及び水素含有ガスを含む第1の処理ガスからプラズマを生成し、生成されたプラズマにより前記積層膜をエッチングする第1の工程と、
前記第1の工程の後、プラズマ生成用の高周波電力を用いて、フッ素含有ガス、水素含有ガス及びHBrを含む第2の処理ガスからプラズマを生成し、生成されたプラズマにより前記積層膜をエッチングする第2の工程と、
を有し、
前記第1の工程において、バイアス電圧発生用の高周波電力を印加し、
前記第1の工程において、前記シリコン酸化膜と前記シリコン窒化膜との界面に前記シリコン酸化膜が凹部を形成し且つ前記シリコン窒化膜が凸部を形成する段差が生じ、
前記第2の工程において、前記段差を除去する、
プラズマエッチング方法。 - 前記第1の工程及び前記第2の工程は、−30℃以下において実行される、請求項1に記載のプラズマエッチング方法。
- 前記第2の処理ガスは、前記第1の処理ガスを含む、請求項1又は2に記載のプラズマエッチング方法。
- 前記第2の処理ガスは、前記第1の処理ガスとは異なる処理ガスを含む、請求項1又は2に記載のプラズマエッチング方法。
- 前記第1の工程及び前記第2の工程の少なくとも一方において、前記プラズマ生成用の高周波電力よりも大きいバイアス電圧発生用の高周波電力をさらに印加する、請求項1から4のいずれか一項に記載のプラズマエッチング方法。
- 前記フッ素含有ガスはCF4であり、前記水素含有ガスはH2である、請求項1乃至5のいずれか一項に記載のプラズマエッチング方法。
- 前記第2の工程において、バイアス電圧発生用の高周波電力を印加する、
請求項1から6のいずれか一項に記載のプラズマエッチング方法。 - 前記第1の工程では、バイアス電圧発生用の高周波電力をパルス波で印加し、
前記第2の工程では、バイアス電圧発生用の高周波電力を連続波で印加する、
請求項7に記載のプラズマエッチング方法。 - 前記第1の工程及び前記第2の工程を1回ずつ行う、
請求項1から8のいずれか一項に記載のプラズマエッチング方法。 - 開口を有するエッチングマスクを用いてシリコン酸化膜とシリコン窒化膜との積層膜をエッチングする方法であって、
臭素を含まず、フッ素及び水素を含むプラズマにより前記積層膜をエッチングする第1の工程と、
フッ素、水素及びHBrを含むプラズマにより前記積層膜をエッチングする第2の工程と、
を有し、
前記第1の工程において、バイアス電圧発生用の高周波電力を印加し、
前記第1の工程において、前記シリコン酸化膜と前記シリコン窒化膜との界面に前記シリコン酸化膜が凹部を形成し且つ前記シリコン窒化膜が凸部を形成する段差が生じ、
前記第2の工程において、前記段差を除去する、
方法。
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