JP6584982B2 - 成膜装置 - Google Patents

成膜装置 Download PDF

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Publication number
JP6584982B2
JP6584982B2 JP2016046649A JP2016046649A JP6584982B2 JP 6584982 B2 JP6584982 B2 JP 6584982B2 JP 2016046649 A JP2016046649 A JP 2016046649A JP 2016046649 A JP2016046649 A JP 2016046649A JP 6584982 B2 JP6584982 B2 JP 6584982B2
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Japan
Prior art keywords
film forming
film
film formation
vacuum chamber
chamber
Prior art date
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Application number
JP2016046649A
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English (en)
Japanese (ja)
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JP2017025407A (ja
JP2017025407A5 (fr
Inventor
尚久 北見
尚久 北見
酒見　俊之
俊之 酒見
山本　哲也
哲也 山本
淳一 野本
淳一 野本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
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Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Priority to CN202010216059.XA priority Critical patent/CN111364008B/zh
Priority to KR1020187003080A priority patent/KR102565020B1/ko
Priority to PCT/JP2016/071438 priority patent/WO2017014278A1/fr
Priority to KR1020237029223A priority patent/KR20230129601A/ko
Priority to CN201680045499.5A priority patent/CN107849690B/zh
Priority to KR1020207008153A priority patent/KR102573358B1/ko
Publication of JP2017025407A publication Critical patent/JP2017025407A/ja
Publication of JP2017025407A5 publication Critical patent/JP2017025407A5/ja
Application granted granted Critical
Publication of JP6584982B2 publication Critical patent/JP6584982B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Vapour Deposition (AREA)
JP2016046649A 2015-07-21 2016-03-10 成膜装置 Active JP6584982B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
KR1020187003080A KR102565020B1 (ko) 2015-07-21 2016-07-21 성막장치
PCT/JP2016/071438 WO2017014278A1 (fr) 2015-07-21 2016-07-21 Appareil de formation de film
KR1020237029223A KR20230129601A (ko) 2015-07-21 2016-07-21 음이온생성장치
CN201680045499.5A CN107849690B (zh) 2015-07-21 2016-07-21 成膜装置
CN202010216059.XA CN111364008B (zh) 2015-07-21 2016-07-21 负离子生成装置
KR1020207008153A KR102573358B1 (ko) 2015-07-21 2016-07-21 음이온생성장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015143798 2015-07-21
JP2015143798 2015-07-21

Publications (3)

Publication Number Publication Date
JP2017025407A JP2017025407A (ja) 2017-02-02
JP2017025407A5 JP2017025407A5 (fr) 2018-07-05
JP6584982B2 true JP6584982B2 (ja) 2019-10-02

Family

ID=57945589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016046649A Active JP6584982B2 (ja) 2015-07-21 2016-03-10 成膜装置

Country Status (3)

Country Link
JP (1) JP6584982B2 (fr)
KR (1) KR102565020B1 (fr)
CN (1) CN107849690B (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7185487B2 (ja) * 2018-03-14 2022-12-07 住友重機械工業株式会社 負イオン生成装置
US20210305016A1 (en) 2018-06-14 2021-09-30 National University Corporation Kyoto Institute Of Technology Specific type ion source and plasma film forming apparatus
JP7120540B2 (ja) * 2018-06-26 2022-08-17 住友重機械工業株式会社 イオン照射装置、イオン照射方法、成膜装置、及び成膜方法
JP7246628B2 (ja) * 2018-06-26 2023-03-28 住友重機械工業株式会社 成膜・イオン照射システム、及び成膜・イオン照射方法
JP7316770B2 (ja) * 2018-09-03 2023-07-28 住友重機械工業株式会社 成膜装置、及び膜構造体の製造装置
JP7336863B2 (ja) * 2019-03-28 2023-09-01 住友重機械工業株式会社 負イオン生成装置
JP7209572B2 (ja) * 2019-03-28 2023-01-20 住友重機械工業株式会社 負イオン生成装置
JP7313929B2 (ja) * 2019-06-26 2023-07-25 住友重機械工業株式会社 負イオン照射装置
KR20210006108A (ko) 2019-07-08 2021-01-18 스미도모쥬기가이고교 가부시키가이샤 부이온생성장치
TWI700967B (zh) * 2019-07-09 2020-08-01 日商住友重機械工業股份有限公司 負離子生成裝置
TWI756742B (zh) * 2019-07-09 2022-03-01 日商住友重機械工業股份有限公司 負離子生成裝置
CN112226734A (zh) * 2019-07-15 2021-01-15 住友重机械工业株式会社 负离子生成装置
KR102180979B1 (ko) * 2019-08-19 2020-11-19 참엔지니어링(주) 처리 장치 및 방법
JP7349910B2 (ja) 2019-12-27 2023-09-25 住友重機械工業株式会社 負イオン生成装置、及び負イオン生成方法
JP7404119B2 (ja) * 2020-03-19 2023-12-25 住友重機械工業株式会社 負イオン生成装置
US11915910B2 (en) 2021-03-25 2024-02-27 Tokyo Electron Limited Fast neutral generation for plasma processing

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS571586B2 (fr) * 1974-05-22 1982-01-12
JPH0674767B2 (ja) * 1984-07-18 1994-09-21 富士重工業株式会社 エンジンのアイドル回転数制御方法
JPH0417669A (ja) * 1990-05-08 1992-01-22 Jeol Ltd プラズマを用いた成膜方法およびｒｆイオンプレーティング装置
JPH06128732A (ja) * 1992-10-15 1994-05-10 Ricoh Co Ltd 薄膜形成装置および薄膜形成方法
JPH0980200A (ja) * 1995-09-08 1997-03-28 Nissin Electric Co Ltd イオン発生装置
JP2823834B2 (ja) * 1996-03-28 1998-11-11 中外炉工業株式会社 蒸着装置におけるるつぼ部機構
JPH11273894A (ja) * 1998-03-23 1999-10-08 Jeol Ltd 薄膜形成装置
JP2000282226A (ja) 1999-04-01 2000-10-10 Nippon Sheet Glass Co Ltd 真空成膜装置及び方法
JP3765990B2 (ja) * 2001-03-16 2006-04-12 住友重機械工業株式会社 導体の形成方法及び装置
JP4339562B2 (ja) * 2002-09-06 2009-10-07 住友重機械工業株式会社 イオンプレーティング方法およびその装置
CN100564587C (zh) * 2003-01-31 2009-12-02 东京毅力科创株式会社 形成Ti膜的成膜方法
JP4613050B2 (ja) * 2004-11-04 2011-01-12 大日本印刷株式会社 圧力勾配型イオンプレーティング式成膜装置
CN203049026U (zh) * 2013-01-23 2013-07-10 中国科学院金属研究所 一种低温低损伤多功能复合镀膜的装置
JP5951542B2 (ja) * 2013-03-28 2016-07-13 住友重機械工業株式会社 成膜装置

Also Published As

Publication number Publication date
KR102565020B1 (ko) 2023-08-07
CN107849690B (zh) 2020-02-18
JP2017025407A (ja) 2017-02-02
CN107849690A (zh) 2018-03-27
KR20180034463A (ko) 2018-04-04

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