JP6442860B2 - 前駆体ゾルゲル溶液、電気機械変換素子、液滴吐出ヘッド、及びインクジェット記録装置 - Google Patents
前駆体ゾルゲル溶液、電気機械変換素子、液滴吐出ヘッド、及びインクジェット記録装置 Download PDFInfo
- Publication number
- JP6442860B2 JP6442860B2 JP2014088836A JP2014088836A JP6442860B2 JP 6442860 B2 JP6442860 B2 JP 6442860B2 JP 2014088836 A JP2014088836 A JP 2014088836A JP 2014088836 A JP2014088836 A JP 2014088836A JP 6442860 B2 JP6442860 B2 JP 6442860B2
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- Prior art keywords
- gel solution
- precursor sol
- film
- ink
- dielectric film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002243 precursor Substances 0.000 title claims description 86
- 239000010408 film Substances 0.000 claims description 147
- 239000000243 solution Substances 0.000 claims description 109
- 238000006243 chemical reaction Methods 0.000 claims description 84
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 43
- 238000004519 manufacturing process Methods 0.000 claims description 27
- 239000010409 thin film Substances 0.000 claims description 26
- 230000007062 hydrolysis Effects 0.000 claims description 25
- 238000006460 hydrolysis reaction Methods 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 16
- 230000036961 partial effect Effects 0.000 claims description 14
- 230000001133 acceleration Effects 0.000 claims description 11
- 229910052726 zirconium Inorganic materials 0.000 claims description 11
- 229910052719 titanium Inorganic materials 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 6
- 229910052745 lead Inorganic materials 0.000 claims description 4
- 230000006641 stabilisation Effects 0.000 claims description 4
- 238000011105 stabilization Methods 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 230000008859 change Effects 0.000 claims description 3
- 239000000976 ink Substances 0.000 description 136
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 44
- 238000010438 heat treatment Methods 0.000 description 27
- 239000010410 layer Substances 0.000 description 26
- 239000000758 substrate Substances 0.000 description 24
- 239000002094 self assembled monolayer Substances 0.000 description 23
- 239000013545 self-assembled monolayer Substances 0.000 description 23
- 239000002904 solvent Substances 0.000 description 17
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 15
- 229910052710 silicon Inorganic materials 0.000 description 15
- 239000010703 silicon Substances 0.000 description 15
- 239000010936 titanium Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 12
- -1 zirconium alkoxide compound Chemical class 0.000 description 11
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 10
- 238000006068 polycondensation reaction Methods 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 229940046892 lead acetate Drugs 0.000 description 9
- 230000002209 hydrophobic effect Effects 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 238000009835 boiling Methods 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- JFWLFXVBLPDVDZ-UHFFFAOYSA-N [Ru]=O.[Sr] Chemical compound [Ru]=O.[Sr] JFWLFXVBLPDVDZ-UHFFFAOYSA-N 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 6
- 230000000875 corresponding effect Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 125000003158 alcohol group Chemical group 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000006104 solid solution Substances 0.000 description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- KQNKJJBFUFKYFX-UHFFFAOYSA-N acetic acid;trihydrate Chemical compound O.O.O.CC(O)=O KQNKJJBFUFKYFX-UHFFFAOYSA-N 0.000 description 3
- 229910052788 barium Inorganic materials 0.000 description 3
- 229910002113 barium titanate Inorganic materials 0.000 description 3
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
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- 238000005259 measurement Methods 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
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- 229910052712 strontium Inorganic materials 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 230000032258 transport Effects 0.000 description 3
- 239000013598 vector Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910004121 SrRuO Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- PQLVXDKIJBQVDF-UHFFFAOYSA-N acetic acid;hydrate Chemical compound O.CC(O)=O PQLVXDKIJBQVDF-UHFFFAOYSA-N 0.000 description 2
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- 238000005452 bending Methods 0.000 description 2
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- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
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- 230000000694 effects Effects 0.000 description 2
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- 239000000203 mixture Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- IKNCGYCHMGNBCP-UHFFFAOYSA-N propan-1-olate Chemical compound CCC[O-] IKNCGYCHMGNBCP-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 241000877463 Lanio Species 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B43/00—Machines, pumps, or pumping installations having flexible working members
- F04B43/12—Machines, pumps, or pumping installations having flexible working members having peristaltic action
- F04B43/14—Machines, pumps, or pumping installations having flexible working members having peristaltic action having plate-like flexible members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
- B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/46—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
- C04B35/462—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates
- C04B35/472—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on lead titanates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B19/00—Machines or pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B1/00 - F04B17/00
- F04B19/006—Micropumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B43/00—Machines, pumps, or pumping installations having flexible working members
- F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
- F04B43/04—Pumps having electric drive
- F04B43/043—Micropumps
- F04B43/046—Micropumps with piezoelectric drive
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K99/00—Subject matter not provided for in other groups of this subclass
- F16K99/0001—Microvalves
- F16K99/0003—Constructional types of microvalves; Details of the cutting-off member
- F16K99/0015—Diaphragm or membrane valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K99/00—Subject matter not provided for in other groups of this subclass
- F16K99/0001—Microvalves
- F16K99/0034—Operating means specially adapted for microvalves
- F16K99/0042—Electric operating means therefor
- F16K99/0048—Electric operating means therefor using piezoelectric means
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
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Description
[薄膜]
まず、第1の実施の形態に係る薄膜製造装置及び薄膜製造方法で製造される薄膜の一例として、電気機械変換素子を構成する電気機械変換膜について説明する。なお、第1の実施の形態に係る薄膜製造装置及び薄膜製造方法で製造可能な薄膜が電気機械変換膜に限定されないことは言うまでもない。
次に、第1の実施の形態に係る薄膜製造装置の構造について説明する。図3は、第1の実施の形態に係る薄膜製造装置を例示する斜視図である。図3を参照するに、薄膜製造装置3において、架台60上には、Y軸駆動手段61が設置されている。Y軸駆動手段61上には、基板63を搭載するステージ62が、Y軸方向に駆動できるように設置されている。
次に、第1の実施の形態に係る薄膜製造方法について説明する。ここでは、薄膜として図1に示す電気機械変換膜43を作製する例を示す。
第2の実施の形態では、薄膜製造装置3で製造した液滴吐出ヘッド1(図1参照)を搭載したインクジェット記録装置の例を示す。図7は、インクジェット記録装置を例示する斜視図である。図8は、インクジェット記録装置の機構部を例示する側面図である。
第3の実施の形態では、第1の実施の形態に係る電気機械変換膜を備える偏光ミラーの例を示す。図9は、圧電式MEMS(Micro Electro Mechanical Systems)ミラーを例示する斜視図である。
第4の実施の形態では、第1の実施の形態に係る電気機械変換膜を備える加速度センサの例を示す。図10は、加速度センサを例示する断面図である。
第5の実施の形態では、第1の実施の形態に係る電気機械変換膜を備えるHDD(Hard Disk Drive)ヘッド用微調整装置の例を示す。図11は、HDDヘッド用微調整装置800を例示する斜視図である。
第6の実施の形態では、第1の実施の形態に係る電気機械変換膜を備える角速度センサの例を示す。図12は、振動ジャイロ型の角速度センサ900を例示する斜視図である。
第7の実施の形態では、第1の実施の形態に係る電気機械変換膜を備えるマイクロポンプの例を示す。図13は、マイクロポンプ950を例示する斜視図である。
第8の実施の形態では、第1の実施の形態に係る電気機械変換膜を備えるマイクロバルブの例を示す。図14は、マイクロバルブ960を例示する断面図である。
本実施例では、第1の実施の形態に係る前駆体ゾルゲル溶液、機能性インク、電気機械変換膜、及び電気機械変換素子を実際に作製した。
まず、PZT前駆体ゾルゲル溶液の合成について、図15を用いて説明する。本実施例では、水の添加量の異なる5個のPZT前駆体ゾルゲル溶液を作製した(表1参照)。各PZT前駆体ゾルゲル溶液を、サンプルA〜Eとした。実施例のサンプルとして、サンプルA、サンプルB、サンプルCを用いた。比較例のサンプルとして、サンプルD、サンプルEを用いた。
続いて、合成した前駆体ゾルゲル溶液(サンプルA〜E)に含まれる水分量を測定した。本実施例では、サンプルA〜Eに含まれる水分量を、カールフィッシャー水分計を用いて測定した。
続いて、5個のPZT前駆体ゾルゲル溶液(サンプルA〜E)に対して、インク化調製を行った。各PZT前駆体ゾルゲル溶液に対して、主溶媒及び副溶媒を添加し、該溶液に分散する固形分の濃度を調整することで、インクジェットヘッド69で使用する機能性インクを作製した。作製した機能性インクをサンプルA〜Eに対応させてサンプル1〜5とした(表2参照)。実施例のサンプルとして、サンプル1、サンプル2、サンプル3を用いた。比較例のサンプルとして、サンプル4、サンプル5を用いた。
続いて、インクジェット方式により、作製した機能性インクを、親水性領域に塗布した。下部電極に対して表面処理を施し、下部電極の表面を親水性領域と疎水性領域に分けることで、機能性インクの塗り分けを行った。
続いて、インクジェットヘッドのノズルから吐出する液滴(機能性インク)の様子、液滴の安定吐出時間、電気機械変換膜(PZT膜)の着弾パターン、から、インクジェットヘッドの吐出信頼性を調べた。
なお、水分量が10倍より大きいPZT前駆体ゾルゲル溶液を使用した機能性インク(比較例のサンプルとして、本実施例では挙げていない)は、保存安定性の問題で実用的ではなかった。
続いて、良質なPZT膜に上部電極(白金)を成膜し、電気機械変換素子を作製し、電気的特性、電気機械変換能(圧電定数)の評価を行った。
3 薄膜製造装置
4 インクジェット記録装置
11 ノズル
40 電気機械変換素子
42 電極
43 電気機械変換膜
51 機能性インク
600 偏向ミラー
700 加速度センサ
800 HDD用微調整装置
900 角速度センサ
950 マイクロポンプ
960 マイクロバルブ
Claims (15)
- 一般式ABO3で記述されるペロブスカイト構造の酸化物誘電体膜を形成する際に使用する、部分加水分解処理がなされた前駆体ゾルゲル溶液であって、
前記前駆体ゾルゲル溶液に含まれる水分量が、前記前駆体ゾルゲル溶液に含まれるBサイトを構成する原子に対するモル比で0.59倍以上1.0倍以下であり、
前記前駆体ゾルゲル溶液が、A=Pb、B=ZrおよびTiの両方である、前駆体ゾルゲル溶液。 - 前記部分加水分解処理に対して粘度変化が5割以下となる安定化処理がなされる、請求項1記載の前駆体ゾルゲル溶液。
- 薄膜製造装置に備えられる液滴吐出装置のノズルから吐出する、請求項1又は2記載の前駆体ゾルゲル溶液。
- 請求項1から3の何れか一つに記載の前駆体ゾルゲル溶液を塗布して形成される酸化物誘電体膜。
- 請求項4記載の酸化物誘電体膜を電気機械変換素子として備えた液滴吐出ヘッド。
- 請求項5記載の液滴吐出ヘッドを備えたインクジェット記録装置。
- 請求項4記載の酸化物誘電体膜を電気機械変換素子として備えた偏向ミラー。
- 請求項4記載の酸化物誘電体膜を電気機械変換素子として備えた加速度センサ。
- 請求項4記載の酸化物誘電体膜を電気機械変換素子として備えたHDDヘッド用微調整装置。
- 請求項4記載の酸化物誘電体膜を電気機械変換素子として備えた角速度センサ。
- 請求項4記載の酸化物誘電体膜を電気機械変換素子として備えたマイクロポンプ。
- 請求項4記載の酸化物誘電体膜を電気機械変換素子として備えたマイクロバルブ。
- 一般式ABO3で記述されるペロブスカイト構造の酸化物誘電体膜を形成する際に使用する前駆体ゾルゲル溶液の製造方法であって、
部分加水分解工程での粘度変化を抑制する安定化処理工程と、
部分加水分解工程を有し、
前記部分加水分解工程後の前記前駆体ゾルゲル溶液に含まれる水分量が、前記前駆体ゾルゲル溶液に含まれるBサイトを構成する原子に対するモル比で0.59倍以上1.0倍以下であり、
前記前駆体ゾルゲル溶液が、A=Pb、B=ZrおよびTiの両方である、前駆体ゾルゲル溶液の製造方法。 - 前記部分加水分解工程は、工程前後での粘度変化が5割以下である、請求項13に記載の前駆体ゾルゲル溶液の製造方法。
- 前記部分加水分解工程は、前記前駆体ゾルゲル溶液に、水又は水溶液を加えることにより行われる、請求項13又は14記載の前駆体ゾルゲル溶液の製造方法。
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JP2014088836A JP6442860B2 (ja) | 2014-04-23 | 2014-04-23 | 前駆体ゾルゲル溶液、電気機械変換素子、液滴吐出ヘッド、及びインクジェット記録装置 |
US14/689,138 US20150307403A1 (en) | 2014-04-23 | 2015-04-17 | Precursor sol-gel solution, electromechanical transducer element, liquid droplet discharge head, and inkjet recording apparatus |
US15/695,769 US9969651B2 (en) | 2014-04-23 | 2017-09-05 | Precursor sol-gel solution, electromechanical transducer element, liquid droplet discharge head, and inkjet recording apparatus |
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JP5526810B2 (ja) | 2010-01-28 | 2014-06-18 | 株式会社リコー | ゾルゲル液、電気−機械変換素子、液体吐出ヘッド及びインクジェット記録装置 |
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JP2014030008A (ja) * | 2012-07-02 | 2014-02-13 | Ricoh Co Ltd | 圧電体素子の製造方法、圧電体素子、液滴吐出ヘッド、画像形成装置、偏向ミラー、加速度センサ、ヘッド位置調整装置、強誘電体メモリ素子、角速度センサ、マイクロポンプ、マイクロバルブ及び高周波スイッチ |
JP6060582B2 (ja) * | 2012-09-18 | 2017-01-18 | 株式会社リコー | 電気機械変換膜の形成方法、電気機械変換素子の製造方法、液滴吐出ヘッドの製造方法及び画像形成装置の製造方法 |
JP2015005568A (ja) | 2013-06-19 | 2015-01-08 | 株式会社リコー | 前駆体ゾルゲル溶液、電気機械変換素子、液滴吐出ヘッド、及びインクジェット記録装置 |
JP6442860B2 (ja) * | 2014-04-23 | 2018-12-26 | 株式会社リコー | 前駆体ゾルゲル溶液、電気機械変換素子、液滴吐出ヘッド、及びインクジェット記録装置 |
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