JP6364150B2 - 自動化された鉱物分類 - Google Patents

自動化された鉱物分類 Download PDF

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Publication number
JP6364150B2
JP6364150B2 JP2015539608A JP2015539608A JP6364150B2 JP 6364150 B2 JP6364150 B2 JP 6364150B2 JP 2015539608 A JP2015539608 A JP 2015539608A JP 2015539608 A JP2015539608 A JP 2015539608A JP 6364150 B2 JP6364150 B2 JP 6364150B2
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mineral
ray spectrum
data points
library
rules
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JP2015536457A (ja
JP2015536457A5 (https=
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マイケル・ジェイムズ・オーウェン
マイケル・ビュオー
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エフ・イ−・アイ・カンパニー
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/418—Imaging electron microscope
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2441—Semiconductor detectors, e.g. diodes
    • H01J2237/24415—X-ray
    • H01J2237/2442—Energy-dispersive (Si-Li type) spectrometer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2441—Semiconductor detectors, e.g. diodes
    • H01J2237/24415—X-ray
    • H01J2237/24425—Wavelength-dispersive spectrometer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2804—Scattered primary beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2807—X-rays

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2015539608A 2012-10-26 2013-09-30 自動化された鉱物分類 Expired - Fee Related JP6364150B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/662,072 2012-10-26
US13/662,072 US9778215B2 (en) 2012-10-26 2012-10-26 Automated mineral classification
PCT/US2013/062637 WO2014065992A1 (en) 2012-10-26 2013-09-30 Automated mineral classification

Publications (3)

Publication Number Publication Date
JP2015536457A JP2015536457A (ja) 2015-12-21
JP2015536457A5 JP2015536457A5 (https=) 2016-12-15
JP6364150B2 true JP6364150B2 (ja) 2018-07-25

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JP2015539608A Expired - Fee Related JP6364150B2 (ja) 2012-10-26 2013-09-30 自動化された鉱物分類

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Country Link
US (1) US9778215B2 (https=)
EP (1) EP2912443A4 (https=)
JP (1) JP6364150B2 (https=)
CN (1) CN104755914B (https=)
AU (1) AU2013335211B2 (https=)
WO (1) WO2014065992A1 (https=)
ZA (1) ZA201502427B (https=)

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Publication number Publication date
JP2015536457A (ja) 2015-12-21
US20140117231A1 (en) 2014-05-01
ZA201502427B (en) 2015-12-23
CN104755914A (zh) 2015-07-01
CN104755914B (zh) 2017-12-05
AU2013335211A1 (en) 2015-04-30
EP2912443A1 (en) 2015-09-02
EP2912443A4 (en) 2015-11-04
AU2013335211B2 (en) 2017-09-07
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