JP2015536457A - 自動化された鉱物分類 - Google Patents
自動化された鉱物分類 Download PDFInfo
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- 229910052500 inorganic mineral Inorganic materials 0.000 title claims abstract description 155
- 239000011707 mineral Substances 0.000 title claims abstract description 155
- 238000004458 analytical method Methods 0.000 claims abstract description 54
- 239000000203 mixture Substances 0.000 claims abstract description 52
- 238000000034 method Methods 0.000 claims abstract description 44
- 238000002083 X-ray spectrum Methods 0.000 claims description 45
- 238000001228 spectrum Methods 0.000 claims description 28
- 238000010894 electron beam technology Methods 0.000 claims description 22
- 238000003860 storage Methods 0.000 claims description 19
- 238000012549 training Methods 0.000 abstract description 2
- 239000000523 sample Substances 0.000 description 47
- 230000008569 process Effects 0.000 description 16
- 238000012545 processing Methods 0.000 description 11
- 230000008901 benefit Effects 0.000 description 9
- 238000000441 X-ray spectroscopy Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical compound [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052951 chalcopyrite Inorganic materials 0.000 description 2
- 229910052949 galena Inorganic materials 0.000 description 2
- XCAUINMIESBTBL-UHFFFAOYSA-N lead(ii) sulfide Chemical compound [Pb]=S XCAUINMIESBTBL-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 108010083687 Ion Pumps Proteins 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- UXNBTDLSBQFMEH-UHFFFAOYSA-N [Cu].[Zn].[Pb] Chemical compound [Cu].[Zn].[Pb] UXNBTDLSBQFMEH-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005136 cathodoluminescence Methods 0.000 description 1
- 238000000546 chi-square test Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000007405 data analysis Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
- G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
- H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/40—Imaging
- G01N2223/418—Imaging electron microscope
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2441—Semiconductor detectors, e.g. diodes
- H01J2237/24415—X-ray
- H01J2237/2442—Energy-dispersive (Si-Li type) spectrometer
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- H—ELECTRICITY
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- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2441—Semiconductor detectors, e.g. diodes
- H01J2237/24415—X-ray
- H01J2237/24425—Wavelength-dispersive spectrometer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2804—Scattered primary beam
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- H—ELECTRICITY
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- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2807—X-rays
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Abstract
Description
Claims (12)
- 試料の鉱物内容を決定する方法であって、
走査電子顕微鏡内に試料を置くこと、
前記試料のX線スペクトルおよび後方散乱電子強度値を得るために、前記試料上の点に電子ビームを導くことであり、前記X線スペクトルおよび前記後方散乱電子強度値が第1のデータ点に対応し、前記データ点が、関連した鉱物組成を有すること、
前記データ点を、規則の第1のセット内の、それぞれが鉱物組成に対応する判定基準と順番に比較し、前記データ点の前記鉱物組成を、満たされた最初の判定基準に対応する鉱物組成として同定すること、
前記データ点が、前記規則の第1のセット内の前記判定基準のいずれをも満たさなかった場合に、鉱物ライブラリ内の鉱物のうちのどの鉱物が前記データ点に対するベスト・マッチであるかを決定するために、前記データ点の前記X線スペクトルを、前記鉱物ライブラリ内の鉱物に対応するX線スペクトルと比較すること、ならびに
前記データ点の前記X線スペクトルと前記ライブラリ内の前記X線スペクトルとの一致の程度が所定のしきい値を満たす場合に、前記データ点の前記鉱物組成を、前記ベスト・マッチであるライブラリ・スペクトルに対応する前記鉱物組成として同定すること
を含む方法。 - 前記データ点の前記X線スペクトルと前記ライブラリ内の前記X線スペクトルとの一致の程度が前記所定のしきい値を満たさない場合に、前記データ点を、規則の第2のセット内の、それぞれが鉱物組成に対応する判定基準と順番に比較し、前記データ点の前記鉱物組成を、前記規則の第2のセット内の満たされた最初の判定基準に対応する前記鉱物組成として同定することをさらに含む、請求項1に記載の方法。
- 鉱物ライブラリ内の鉱物のうちのどの鉱物が前記データ点に対するベスト・マッチであるかを決定するために、前記データ点の前記X線スペクトルを、前記鉱物ライブラリ内の鉱物に対応するX線スペクトルと比較することが、前記データ点の後方散乱電子強度を後方散乱電子強度と比較することをさらに含む、請求項1または2に記載の方法。
- 前記データ点を、規則の第1のセット内の判定基準と順番に比較することが、不良なデータ点を識別し、または詳細な分析を必要としない前記試料の部分を識別する、請求項1から3のいずれか一項に記載の方法。
- 鉱物ライブラリ内の鉱物のうちのどの鉱物が前記データ点に対するベスト・マッチであるかを決定するために、前記データ点の前記X線スペクトルを、前記鉱物ライブラリ内の鉱物に対応するX線スペクトルと比較することが、前記データ点と前記ライブラリ内の前記鉱物のうちのそれぞれの鉱物との間の類似距離を計算することを含む、請求項1から4のいずれか一項に記載の方法。
- 類似距離を計算することが、前記データ点に対して観察される値を前記ライブラリ鉱物が生成する確率を決定することを含む、請求項5に記載の方法。
- 類似距離を計算することが、カイ2乗値を計算することを含む、請求項5または6に記載の方法。
- 試料の鉱物内容を決定する走査電子顕微鏡システムであって、
鉱物試料に向かって電子ビームを導く電子ビーム・カラムと、
前記電子ビーム中の電子の衝突に反応して前記鉱物試料から放出されたX線のエネルギーまたは波長を測定する検出器と、
前記試料中に存在する鉱物を決定するために、コンピュータ命令を実行する処理装置と、
前記データ点を、規則の第1のセット内の、それぞれが鉱物組成に対応する判定基準と順番に比較し、前記データ点の前記鉱物組成を、満たされた最初の判定基準に対応する前記鉱物組成として同定するコンピュータ命令、
前記データ点が、前記規則の第1のセット内の前記判定基準のいずれをも満たさなかった場合に、鉱物ライブラリ内の鉱物のうちのどの鉱物が前記データ点に対するベスト・マッチであるかを決定するために、前記データ点の前記X線スペクトルを前記鉱物ライブラリ内の鉱物に対応するX線スペクトルと比較するコンピュータ命令、ならびに
前記データ点の前記X線スペクトルと前記ライブラリ内の前記X線スペクトルとの一致の程度が所定のしきい値を満たす場合に、前記データ点の前記鉱物組成を、前記ベスト・マッチであるライブラリ・スペクトルに対応する前記鉱物組成として同定するコンピュータ命令
を含むコンピュータ記憶装置と
を備える走査電子顕微鏡システム。 - 前記コンピュータ命令が、前記データ点の前記X線スペクトルと前記ライブラリ内の前記X線スペクトルとの一致の程度が前記所定のしきい値を満たさない場合に、前記データ点を、規則の第2のセット内の、それぞれが鉱物組成に対応する判定基準と順番に比較し、前記データ点の前記鉱物組成を、前記規則の第2のセット内の満たされた最初の判定基準に対応する前記鉱物組成として同定する命令をさらに含む、請求項8に記載の走査電子顕微鏡システム。
- 鉱物ライブラリ内の鉱物のうちのどの鉱物が前記データ点に対するベスト・マッチであるかを決定するために、前記データ点の前記X線スペクトルを前記鉱物ライブラリ内の鉱物に対応するX線スペクトルと比較する前記コンピュータ命令が、前記データ点の後方散乱電子強度を後方散乱電子強度と比較するコンピュータ命令をさらに含む、請求項8または9に記載の走査電子顕微鏡システム。
- 前記データ点を、規則の第1のセット内の判定基準と順番に比較する前記コンピュータ命令が、不良なデータ点を識別するコンピュータ命令、または詳細な分析を必要としない前記試料の部分を識別するコンピュータ命令を含む、請求項8から10のいずれか一項に記載の走査電子顕微鏡システム。
- 鉱物ライブラリ内の鉱物のうちのどの鉱物が前記データ点に対するベスト・マッチであるかを決定するために、前記データ点の前記X線スペクトルを、前記鉱物ライブラリ内の鉱物に対応するX線スペクトルと比較する前記コンピュータ命令が、前記データ点と前記ライブラリ内の前記鉱物のうちのそれぞれの鉱物との間の類似距離を計算するコンピュータ命令を含む、請求項8から11のいずれか一項に記載の走査電子顕微鏡システム。
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US13/662,072 US9778215B2 (en) | 2012-10-26 | 2012-10-26 | Automated mineral classification |
US13/662,072 | 2012-10-26 | ||
PCT/US2013/062637 WO2014065992A1 (en) | 2012-10-26 | 2013-09-30 | Automated mineral classification |
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JP2015536457A true JP2015536457A (ja) | 2015-12-21 |
JP2015536457A5 JP2015536457A5 (ja) | 2016-12-15 |
JP6364150B2 JP6364150B2 (ja) | 2018-07-25 |
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US (1) | US9778215B2 (ja) |
EP (1) | EP2912443A4 (ja) |
JP (1) | JP6364150B2 (ja) |
CN (1) | CN104755914B (ja) |
AU (1) | AU2013335211B2 (ja) |
WO (1) | WO2014065992A1 (ja) |
ZA (1) | ZA201502427B (ja) |
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CN104755914B (zh) | 2017-12-05 |
AU2013335211B2 (en) | 2017-09-07 |
CN104755914A (zh) | 2015-07-01 |
JP6364150B2 (ja) | 2018-07-25 |
US9778215B2 (en) | 2017-10-03 |
EP2912443A4 (en) | 2015-11-04 |
ZA201502427B (en) | 2015-12-23 |
US20140117231A1 (en) | 2014-05-01 |
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