JP6328766B2 - 有機材料用の蒸発源、真空チャンバの中で有機材料を堆積させるための堆積装置、及び有機材料を蒸発させるための方法 - Google Patents
有機材料用の蒸発源、真空チャンバの中で有機材料を堆積させるための堆積装置、及び有機材料を蒸発させるための方法 Download PDFInfo
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- 238000001704 evaporation Methods 0.000 title claims description 244
- 230000008020 evaporation Effects 0.000 title claims description 227
- 239000011368 organic material Substances 0.000 title claims description 116
- 238000000151 deposition Methods 0.000 title claims description 103
- 230000008021 deposition Effects 0.000 title claims description 88
- 238000000034 method Methods 0.000 title claims description 15
- 239000000758 substrate Substances 0.000 claims description 288
- 238000009826 distribution Methods 0.000 claims description 125
- 238000012545 processing Methods 0.000 claims description 58
- 238000012546 transfer Methods 0.000 claims description 51
- 238000012423 maintenance Methods 0.000 claims description 41
- 230000033001 locomotion Effects 0.000 claims description 37
- 238000013519 translation Methods 0.000 claims description 13
- 239000012530 fluid Substances 0.000 claims description 7
- 238000004891 communication Methods 0.000 claims description 6
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- 230000001939 inductive effect Effects 0.000 claims description 4
- 230000008054 signal transmission Effects 0.000 claims description 3
- 238000005096 rolling process Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 27
- 239000000463 material Substances 0.000 description 20
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- 238000004519 manufacturing process Methods 0.000 description 11
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- 239000011248 coating agent Substances 0.000 description 6
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- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000001965 increasing effect Effects 0.000 description 5
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
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- OOYGSFOGFJDDHP-KMCOLRRFSA-N kanamycin A sulfate Chemical group OS(O)(=O)=O.O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CN)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O[C@@H]2[C@@H]([C@@H](N)[C@H](O)[C@@H](CO)O2)O)[C@H](N)C[C@@H]1N OOYGSFOGFJDDHP-KMCOLRRFSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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- H10K71/10—Deposition of organic active material
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- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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Description
Claims (14)
- 有機材料用の蒸発源であって、
前記有機材料を蒸発させるように構成された蒸発るつぼと、
前記蒸発るつぼと流体連通しており、蒸発中に軸周囲を回転可能である、一又は複数の排出口を有する分配管と、
第1のドライバと連結可能であり又は前記第1のドライバを含む、前記分配管の支持体であって、前記第1のドライバが前記支持体及び前記分配管の並進運動のために構成される、支持体と、
前記有機材料の蒸発を遮蔽するための少なくとも1つのサイドシールドと、
を備える蒸発源。 - 前記分配管が、前記一又は複数の排出口を含む蒸気分配シャワーヘッドであり、前記蒸気分配シャワーヘッドが、直線的蒸気分配シャワーヘッドである、請求項1に記載の蒸発源。
- 前記分配管が、本質的に垂直に延びる線源を提供し、及び/又は前記分配管を回転させる前記軸が、本質的に垂直に延びる、請求項1又は2に記載の蒸発源。
- 前記分配管が、少なくとも160度回転可能である、請求項1から3の何れか一項に記載の蒸発源。
- 前記分配管が、前記支持体に対して前記分配管を回転させ、更に前記支持体に対して前記蒸発るつぼも回転させる第2のドライバによって、前記軸周囲を回転可能である、請求項1から4の何れか一項に記載の蒸発源。
- 前記支持体が、内部で大気圧を維持するように構成された支持体ハウジングを含み、前記支持体が、回転可能な真空フィードスルーを介して、前記分配管を支持する、請求項5に記載の蒸発源。
- 前記分配管が、ループ状トラックに沿って進行することによって、前記軸周囲を回転可能である、請求項1から4の何れか一項に記載の蒸発源。
- 内部で大気圧を維持するように構成された蒸発器制御ハウジングであって、前記支持体によって支持され、スイッチ、バルブ、コントローラ、冷却ユニット及び冷却制御ユニットから成るグループから選択された少なくとも1つの要素を収納するように構成されたハウジングを更に備える、請求項1から7の何れか一項に記載の蒸発源。
- 誘導性電力伝送及び誘導性信号伝送のうちの少なくとも1つのためのコイルを更に備える、請求項1から8の何れか一項に記載の蒸発源。
- 前記支持体によって支持されている少なくとも1つの第2の蒸発るつぼと、
前記少なくとも1つの第2の蒸発るつぼと流体連通している、前記支持体によって支持されている少なくとも1つの第2の分配管とを更に備える、請求項1から9の何れか一項に記載の蒸発源。 - 真空チャンバの中で有機材料を堆積させるための堆積装置であって、
処理真空チャンバと、
前記処理真空チャンバの中で前記有機材料を蒸発させる、請求項1から10の何れか一項に記載の蒸発源と、
前記真空チャンバの中に配置され、少なくとも2つのトラックを有する基板支持体システムであって、前記基板支持体システムの前記少なくとも2つのトラックが、前記基板、又は前記真空チャンバの中で前記基板を運ぶキャリアの本質的に垂直な支持のために構成される、基板支持体システムと
を備える堆積装置。 - 前記処理真空チャンバと連結した保守真空チャンバと、
前記処理真空チャンバと前記保守真空チャンバとの間の真空密閉を開閉するための真空バルブであって、前記蒸発源を前記処理真空チャンバから前記保守真空チャンバへ及び前記保守真空チャンバから前記処理真空チャンバへ移送することができる、真空バルブと
を更に備える、請求項11に記載の堆積装置。 - 有機材料を蒸発させるための方法であって、
本質的に垂直な第1の処理位置で第1の基板を移動させることと、
蒸発源が前記有機材料を蒸発させる間に、少なくとも並進運動で前記第1の基板に沿って前記蒸発源を移動させることと、
前記第1の処理位置と異なる本質的に垂直な第2の処理位置で第2の基板を移動させることと、
蒸発中に軸周囲で前記蒸発源の分配管を回転させることと、
前記蒸発源が前記有機材料を蒸発させる間に、少なくとも更なる並進運動で前記第2の基板に沿って前記蒸発源を移動させることと
を含み、
前記蒸発源は、
前記有機材料を蒸発させるように構成された蒸発るつぼと、
前記蒸発るつぼと流体連通しており、蒸発中に軸周囲を回転可能である、一又は複数の排出口を有する分配管と、
第1のドライバと連結可能であり又は前記第1のドライバを含む、前記分配管の支持体であって、前記第1のドライバが前記支持体及び前記分配管の並進運動のために構成される、支持体と、
前記有機材料の蒸発を遮蔽するための少なくとも1つのサイドシールドと、
を備える
方法。 - 前記第2の基板は、前記蒸発源が前記第1の基板に沿って移動される間に、前記本質的に垂直な第2の処理位置で移動される、請求項13に記載の方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2013/076120 WO2015086049A1 (en) | 2013-12-10 | 2013-12-10 | Evaporation source for organic material, apparatus having an evaporation source for organic material, system having an evaporation deposition apparatus with an evaporation source for organic materials, and method for operating an evaporation source for organic material |
Related Child Applications (1)
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WO2015086168A1 (en) | 2015-06-18 |
TW201528411A (zh) | 2015-07-16 |
CN106068334B (zh) | 2018-11-13 |
CN105814231B (zh) | 2020-03-06 |
TWI611497B (zh) | 2018-01-11 |
CN106068334A (zh) | 2016-11-02 |
WO2015086168A8 (en) | 2016-06-09 |
US20170022601A1 (en) | 2017-01-26 |
TWI604553B (zh) | 2017-11-01 |
KR101927925B1 (ko) | 2018-12-11 |
KR20160098333A (ko) | 2016-08-18 |
KR101903139B1 (ko) | 2018-10-01 |
JP6568853B2 (ja) | 2019-08-28 |
KR20170007545A (ko) | 2017-01-18 |
JP2017500447A (ja) | 2017-01-05 |
JP2017500446A (ja) | 2017-01-05 |
CN106995911A (zh) | 2017-08-01 |
WO2015086049A1 (en) | 2015-06-18 |
EP3187618A1 (en) | 2017-07-05 |
TW201802994A (zh) | 2018-01-16 |
US20190032194A2 (en) | 2019-01-31 |
US20170005297A1 (en) | 2017-01-05 |
CN105814231A (zh) | 2016-07-27 |
KR20160098342A (ko) | 2016-08-18 |
KR101920333B1 (ko) | 2018-11-20 |
EP3080327A1 (en) | 2016-10-19 |
CN106995911B (zh) | 2020-07-31 |
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