JP6237972B1 - 蒸着マスク用基材、蒸着マスク用基材の製造方法、および、蒸着マスクの製造方法 - Google Patents

蒸着マスク用基材、蒸着マスク用基材の製造方法、および、蒸着マスクの製造方法 Download PDF

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JP6237972B1
JP6237972B1 JP2017541417A JP2017541417A JP6237972B1 JP 6237972 B1 JP6237972 B1 JP 6237972B1 JP 2017541417 A JP2017541417 A JP 2017541417A JP 2017541417 A JP2017541417 A JP 2017541417A JP 6237972 B1 JP6237972 B1 JP 6237972B1
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metal plate
mask
width direction
vapor deposition
deposition mask
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JPWO2017179719A1 (ja
Inventor
幹大 新納
幹大 新納
玲爾 寺田
玲爾 寺田
清明 西辻
清明 西辻
真嗣 倉田
真嗣 倉田
憲太 武田
憲太 武田
菜穂子 三上
菜穂子 三上
純香 秋山
純香 秋山
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Toppan Inc
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Toppan Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/38—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling sheets of limited length, e.g. folded sheets, superimposed sheets, pack rolling
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B2261/00—Product parameters
    • B21B2261/02—Transverse dimensions
    • B21B2261/06—Width
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
JP2017541417A 2016-04-14 2017-04-14 蒸着マスク用基材、蒸着マスク用基材の製造方法、および、蒸着マスクの製造方法 Active JP6237972B1 (ja)

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JP2017212942A JP6939431B2 (ja) 2016-04-14 2017-11-02 蒸着マスク用基材、蒸着マスク用基材の製造方法、および、蒸着マスクの製造方法

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JP2016081362 2016-04-14
JP2016081362 2016-04-14
PCT/JP2017/015357 WO2017179719A1 (ja) 2016-04-14 2017-04-14 蒸着マスク用基材、蒸着マスク用基材の製造方法、および、蒸着マスクの製造方法

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JP2017212942A Active JP6939431B2 (ja) 2016-04-14 2017-11-02 蒸着マスク用基材、蒸着マスク用基材の製造方法、および、蒸着マスクの製造方法

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US (2) US10767266B2 (cg-RX-API-DMAC7.html)
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KR (2) KR101931902B1 (cg-RX-API-DMAC7.html)
CN (2) CN107849682B (cg-RX-API-DMAC7.html)
DE (1) DE112017002022B4 (cg-RX-API-DMAC7.html)
TW (2) TWI639720B (cg-RX-API-DMAC7.html)
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US11499235B2 (en) 2017-10-13 2022-11-15 Toppan Printing Co., Ltd. Vapor deposition mask substrate, vapor deposition mask substrate manufacturing method, vapor deposition mask manufacturing method, and display device manufacturing method

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JP6237972B1 (ja) 2016-04-14 2017-11-29 凸版印刷株式会社 蒸着マスク用基材、蒸着マスク用基材の製造方法、および、蒸着マスクの製造方法
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JP6984529B2 (ja) * 2017-09-08 2021-12-22 凸版印刷株式会社 蒸着マスク用基材、蒸着マスク用基材の製造方法、蒸着マスクの製造方法および表示装置の製造方法
JP6319505B1 (ja) 2017-09-08 2018-05-09 凸版印刷株式会社 蒸着マスク用基材、蒸着マスク用基材の製造方法、蒸着マスクの製造方法および表示装置の製造方法
KR102153870B1 (ko) * 2017-09-15 2020-09-09 도판 인사츠 가부시키가이샤 증착 마스크의 제조 방법, 표시 장치의 제조 방법, 및 증착 마스크
JP6981302B2 (ja) * 2017-10-13 2021-12-15 凸版印刷株式会社 蒸着マスク用基材、蒸着マスク用基材の製造方法、蒸着マスクの製造方法、および、表示装置の製造方法
JP6299922B1 (ja) * 2017-10-13 2018-03-28 凸版印刷株式会社 蒸着マスク用基材、蒸着マスク用基材の製造方法、蒸着マスクの製造方法、および、表示装置の製造方法
JP6988565B2 (ja) * 2017-10-13 2022-01-05 凸版印刷株式会社 蒸着マスク用基材、蒸着マスク用基材の製造方法、蒸着マスクの製造方法、および、表示装置の製造方法
KR102700135B1 (ko) * 2017-11-16 2024-08-29 엘지이노텍 주식회사 증착용 마스크 및 이의 제조 방법
JP6597920B1 (ja) * 2018-04-11 2019-10-30 凸版印刷株式会社 蒸着マスク用基材、蒸着マスク用基材の製造方法、蒸着マスクの製造方法、および、表示装置の製造方法
JP7317816B2 (ja) * 2018-06-08 2023-07-31 大日本印刷株式会社 金属板の巻回体、巻回体を備える梱包体、巻回体の梱包方法、巻回体の保管方法、巻回体の金属板を用いた蒸着マスクの製造方法及び金属板
WO2020012862A1 (ja) * 2018-07-09 2020-01-16 大日本印刷株式会社 蒸着マスクの良否判定方法、蒸着マスクの製造方法、蒸着マスク装置の製造方法、蒸着マスクの選定方法および蒸着マスク
KR102188948B1 (ko) * 2019-02-12 2020-12-09 주식회사 오럼머티리얼 프레임 일체형 마스크의 제조 방법
KR20200074341A (ko) * 2018-12-14 2020-06-25 삼성디스플레이 주식회사 금속 마스크, 이의 제조 방법, 및 표시 패널 제조 방법
JP7449485B2 (ja) * 2019-03-28 2024-03-14 大日本印刷株式会社 蒸着マスク及び蒸着マスクの製造方法
JP2021042439A (ja) * 2019-09-11 2021-03-18 株式会社ジャパンディスプレイ 蒸着マスク及び蒸着マスクの製造方法
CN112126893B (zh) * 2020-09-29 2023-05-12 京东方科技集团股份有限公司 掩膜板，掩膜板组件及其制造方法
KR102501481B1 (ko) 2022-07-12 2023-02-21 (주)세우인코퍼레이션 초고해상도 급 증착용 fmm 제조 방법
TW202513177A (zh) * 2023-09-13 2025-04-01 日商大日本印刷股份有限公司 金屬板及其製造方法、以及金屬遮罩之製造方法
US20250222500A1 (en) * 2024-01-10 2025-07-10 Dai Nippon Printing Co., Ltd. Metal plate, method for manufacturing metal plate, and method for manufacturing metal mask

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